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1. 发明授权

US08235002B2 Plasma assisted apparatus for organic film deposition 有权
标题翻译：用于有机膜沉积的等离子体辅助设备
公开(公告)号：US08235002B2
公开(公告)日：2012-08-07
申请号：US12046042
申请日：2008-03-11
申请人： Guo-Shing Huang , Tung-Ying Lin , Chun-Hao Chang , Herrison Wang , Teng-Yen Wabg
发明人： Guo-Shing Huang , Tung-Ying Lin , Chun-Hao Chang , Herrison Wang , Teng-Yen Wabg
IPC分类号： C23C16/00
CPC分类号： H01L51/0008 , B05D1/62 , H01L51/5253 , H01L51/56
摘要： A plasma assisted apparatus for organic film deposition, comprising: a plasma chamber, capable of thermally cracking a precursor in the plasma chamber; and a deposition chamber, being channeled with the plasma chamber for receiving the thermally cracked precursor. In an exemplary embodiment, the deposition chamber further comprises a substrate device, being provided for the thermally cracked precursor to deposit thereon to form an organic film. As the plasma chamber is separated from the deposition chamber in the aforesaid apparatus, a low-temperature film deposition process can be used for forming organic films while preventing the substrate device from being bombarded directly by plasma. In addition, as there is a flow guiding device arranged at the outlet of the plasma chamber, the thermally cracked precursor is guided or disturbed and thus is prevented from overly concentrating at the outlet or the center of the substrate device. Thereby, surface roughness as well as uniformity of the organic film can be effectively improved.
摘要翻译：一种用于有机膜沉积的等离子体辅助装置，包括：等离子体室，其能够热裂解等离子体室中的前体; 以及沉积室，其与等离子体室一起引导以接收热裂化的前体。在示例性实施例中，沉积室还包括衬底装置，其被设置用于使热裂化的前体沉积在其上以形成有机膜。由于在上述装置中等离子体室与沉积室分离，所以可以使用低温膜沉积工艺来形成有机膜，同时防止基板装置被等离子体直接轰击。此外，由于在等离子体室的出口处设置有引流装置，所以热裂化的前体被引导或干扰，从而防止过度集中在基板装置的出口或中心。由此，可以有效地提高表面粗糙度以及有机膜的均匀性。

2. 发明申请

US20070148911A1 Wafer bonding method 有权
标题翻译：晶圆接合法
公开(公告)号：US20070148911A1
公开(公告)日：2007-06-28
申请号：US11432632
申请日：2006-05-12
申请人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
发明人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
IPC分类号： H01L21/30
CPC分类号： H01L21/187 , H01L33/0079
摘要： A wafer bonding method, comprising steps of: coating a medium layer respectively on the surfaces of two wafers; removing impurities formed on the surface of each medium layer; laminating the two wafers while enabling the surface coated with the medium layer of one of the two wafers to face the surface coated with the medium layer of another wafer; and applying an ultra-sonic oscillation and a bonding pressure upon the laminated wafers for bonding the two wafers.
摘要翻译：一种晶片接合方法，包括以下步骤：分别在两个晶片的表面上涂覆介质层; 去除形成在每个介质层表面上的杂质; 层压两个晶片同时使得涂覆有两个晶片之一的介质层的表面面对涂覆有另一晶片的介质层的表面; 以及在层叠的晶片上施加超声波振荡和接合压力以接合两个晶片。

3. 发明申请

US20050091971A1 Balancing vertical load device for a motor 失效
标题翻译：平衡电机的垂直负载装置
公开(公告)号：US20050091971A1
公开(公告)日：2005-05-05
申请号：US10702163
申请日：2003-11-04
申请人： Guo-Shing Huang , Chun-Ming Li , Gia-Hung Hung , Hung-I Lin , Ching-Guo Huang
发明人： Guo-Shing Huang , Chun-Ming Li , Gia-Hung Hung , Hung-I Lin , Ching-Guo Huang
IPC分类号： F15B1/02 , F15B11/028 , F16D31/02
CPC分类号： F15B11/028 , F15B1/02 , F15B2211/20538 , F15B2211/212 , F15B2211/50554 , F15B2211/5152 , F15B2211/625 , F15B2211/7052 , F15B2211/76 , F15B2211/765
摘要： A balancing vertical load device for a motor, to be used in conjunction with a vertical driving device with a force- and position-controlled motor, comprising a motor assembly and a sealed air pressure system. The motor assembly has a motor, and a load weight which, driven by the motor, performs a vertical movement. The sealed air pressure system has an air cylinder, a piston, gliding inside the air cylinder with low friction and being connected with the load weight, an air container, storing a relatively large air volume, and an air pressure source. The sealed air pressure system balances a load of the load weight, so that precise control of force and position of a vertically moving object, as if moving horizontally, is achieved.
摘要翻译：用于电动机的平衡垂直负载装置，与具有力和位置控制的电动机的垂直驱动装置结合使用，包括电动机组件和密封空气压力系统。电动机组件具有电动机，并且由电动机驱动的负载重量进行垂直运动。密封空气压力系统具有气缸，活塞，摩擦力低的气缸内滑动，并与负载重量相连接，存放较大空气量的空气容器和空气压力源。密封的空气压力系统平衡负载重量的负载，从而实现垂直移动的物体的力和位置的精确控制，就好像水平移动一样。

4. 发明授权

US07973646B2 Method and apparatus for inspecting radio frequency identification tags 有权
标题翻译：用于检查射频识别标签的方法和装置
公开(公告)号：US07973646B2
公开(公告)日：2011-07-05
申请号：US11944596
申请日：2007-11-23
申请人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
发明人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
IPC分类号： H04Q5/22
CPC分类号： G06K7/0008 , G01R31/2822 , G06K7/10079 , G06K7/10435
摘要： A method and an apparatus for inspecting radio frequency identification (RFID) tags which utilize a way of shielding for inspecting whether RFID tags function properly or not. The method of the present invention comprises steps of: reading a plurality of RFID tags in a readable zone; and determining whether there is any malfunctional RFID tag in the plurality of RFID tags. If all the plurality of RFID tags function properly, the method will check a next plurality of RFID tags. If there is at least one unreadable RFID tag, the at least one malfunctional RFID tag will be found by shielding one or the plurality of RFID tags. By means of the disclosure in the present invention, the present method and apparatus are capable of improving the efficiency during inspection and simplifying the design of a readable zone.
摘要翻译：一种用于检查射频识别（RFID）标签的方法和装置，其利用屏蔽方式来检查RFID标签是否正常工作。本发明的方法包括以下步骤：读取可读区域中的多个RFID标签; 以及确定所述多个RFID标签中是否存在任何故障的RFID标签。如果所有多个RFID标签正常工作，则该方法将检查下一个RFID标签。如果存在至少一个不可读RFID标签，则通过屏蔽一个或多个RFID标签来找到至少一个故障的RFID标签。通过本发明的公开内容，本发明的方法和装置能够提高检查期间的效率并简化可读区域的设计。

5. 发明申请

US20080174407A1 METHOD AND APPARATUS FOR INSPECTING RADIO FREQUENCY IDENTIFICATION TAGS 有权
标题翻译：检测无线电频率识别标签的方法和装置
公开(公告)号：US20080174407A1
公开(公告)日：2008-07-24
申请号：US11944596
申请日：2007-11-23
申请人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
发明人： Hui-Ta Chen , Guo-Shing Huang , Ching-Chih Lin , Chun-Hao Chang , Chuan-Sheng Zhuang , Ming-Hsien Ko , Chih-Hung Kao
IPC分类号： H04Q5/22
CPC分类号： G06K7/0008 , G01R31/2822 , G06K7/10079 , G06K7/10435
摘要： A method and an apparatus for inspecting radio frequency identification (RFID) tags which utilize a way of shielding for inspecting whether RFID tags function properly or not. The method of the present invention comprises steps of: reading a plurality of RFID tags in a readable zone; and determining whether there is any malfunctional RFID tag in the plurality of RFID tags. If all the plurality of RFID tags function properly, the method will check a next plurality of RFID tags. If there is at least one unreadable RFID tag, the at least one malfunctional RFID tag will be found by shielding one or the plurality of RFID tags. By means of the disclosure in the present invention, the present method and apparatus are capable of improving the efficiency during inspection and simplifying the design of a readable zone.
摘要翻译：一种用于检查射频识别（RFID）标签的方法和装置，其利用屏蔽方式来检查RFID标签是否正常工作。本发明的方法包括以下步骤：读取可读区域中的多个RFID标签; 以及确定所述多个RFID标签中是否存在任何故障的RFID标签。如果所有多个RFID标签正常工作，则该方法将检查下一个RFID标签。如果存在至少一个不可读RFID标签，则通过屏蔽一个或多个RFID标签来找到至少一个故障的RFID标签。通过本发明的公开内容，本发明的方法和装置能够提高检查期间的效率并简化可读区域的设计。

6. 发明申请

US20090133622A1 PLASMA ASSISTED APPARATUS FOR ORGANIC FILM DEPOSITION 有权
标题翻译：等离子体辅助设备有机膜沉积
公开(公告)号：US20090133622A1
公开(公告)日：2009-05-28
申请号：US12046042
申请日：2008-03-11
申请人： GUO-SHING HUANG , TUNG-YING LIN , CHUN-HAO CHANG , HERRISON WANG , TENG-YEN WANG
发明人： GUO-SHING HUANG , TUNG-YING LIN , CHUN-HAO CHANG , HERRISON WANG , TENG-YEN WANG
IPC分类号： B05C11/00 , C23C16/453
CPC分类号： H01L51/0008 , B05D1/62 , H01L51/5253 , H01L51/56
摘要： A plasma assisted apparatus for organic film deposition, comprising: a plasma chamber, capable of thermally cracking a precursor in the plasma chamber; and a deposition chamber, being channeled with the plasma chamber for receiving the thermally cracked precursor. In an exemplary embodiment, the deposition chamber further comprises a substrate device, being provided for the thermally cracked precursor to deposit thereon to form an organic film. As the plasma chamber is separated from the deposition chamber in the aforesaid apparatus, a low-temperature film deposition process can be used for forming organic films while preventing the substrate device from being bombarded directly by plasma. In addition, as there is a flow guiding device arranged at the outlet of the plasma chamber, the thermally cracked precursor is guided or disturbed and thus is prevented from overly concentrating at the outlet or the center of the substrate device. Thereby, surface roughness as well as uniformity of the organic film can be effectively improved.
摘要翻译：一种用于有机膜沉积的等离子体辅助装置，包括：等离子体室，其能够热裂解等离子体室中的前体; 以及沉积室，其与等离子体室一起引导以接收热裂化的前体。在示例性实施例中，沉积室还包括衬底装置，其被设置用于使热裂化的前体沉积在其上以形成有机膜。由于在上述装置中等离子体室与沉积室分离，所以可以使用低温膜沉积工艺来形成有机膜，同时防止基板装置被等离子体直接轰击。此外，由于在等离子体室的出口处设置有引流装置，所以热裂化的前体被引导或干扰，从而防止过度集中在基板装置的出口或中心。由此，可以有效地提高表面粗糙度以及有机膜的均匀性。

7. 发明授权

US07371661B2 Wafer bonding method 有权
标题翻译：晶圆接合法
公开(公告)号：US07371661B2
公开(公告)日：2008-05-13
申请号：US11432632
申请日：2006-05-12
申请人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
发明人： Chun-Hao Chang , Shih-Chieh Liao , Guo-Shing Huang , Wei-Yu Chen , Chuan-Sheng Zhuang
IPC分类号： H01L21/30
CPC分类号： H01L21/187 , H01L33/0079
摘要： A wafer bonding method, comprising steps of: coating a medium layer respectively on the surfaces of two wafers; removing impurities formed on the surface of each medium layer; laminating the two wafers while enabling the surface coated with the medium layer of one of the two wafers to face the surface coated with the medium layer of another wafer; and applying an ultra-sonic oscillation and a bonding pressure upon the laminated wafers for bonding the two wafers.
摘要翻译：一种晶片接合方法，包括以下步骤：分别在两个晶片的表面上涂覆介质层; 去除形成在每个介质层表面上的杂质; 层压两个晶片同时使得涂覆有两个晶片之一的介质层的表面面对涂覆有另一晶片的介质层的表面; 以及在层叠的晶片上施加超声波振荡和接合压力以接合两个晶片。

8. 发明授权

US07004060B2 Balancing vertical load device for a motor 失效
标题翻译：平衡电机的垂直负载装置
公开(公告)号：US07004060B2
公开(公告)日：2006-02-28
申请号：US10702163
申请日：2003-11-04
申请人： Guo-Shing Huang , Chun-Ming Li , Gia-Hung Hung , Hung-I Lin , Ching-Guo Huang
发明人： Guo-Shing Huang , Chun-Ming Li , Gia-Hung Hung , Hung-I Lin , Ching-Guo Huang
IPC分类号： F15B13/16
CPC分类号： F15B11/028 , F15B1/02 , F15B2211/20538 , F15B2211/212 , F15B2211/50554 , F15B2211/5152 , F15B2211/625 , F15B2211/7052 , F15B2211/76 , F15B2211/765
摘要： A balancing vertical load device for a motor, to be used in conjunction with a vertical driving device with a force- and position-controlled motor, comprising a motor assembly and a sealed air pressure system. The motor assembly has a motor, and a load weight which, driven by the motor, performs a vertical movement. The sealed air pressure system has an air cylinder, a piston, gliding inside the air cylinder with low friction and being connected with the load weight, an air container, storing a relatively large air volume, and an air pressure source. The sealed air pressure system balances a load of the load weight, so that precise control of force and position of a vertically moving object, as if moving horizontally, is achieved.
摘要翻译：用于电动机的平衡垂直负载装置，与具有力和位置控制的电动机的垂直驱动装置结合使用，包括电动机组件和密封空气压力系统。电动机组件具有电动机，并且由电动机驱动的负载重量进行垂直运动。密封空气压力系统具有气缸，活塞，摩擦力低的气缸内滑动，并与负载重量相连接，存放较大空气量的空气容器和空气压力源。密封的空气压力系统平衡负载重量的负载，从而实现垂直移动的物体的力和位置的精确控制，就好像水平移动一样。

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