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    • 1. 发明授权
    • Transistorised memory cell and an integrated memory using such a cell
    • 晶体管存储单元和使用这种单元的集成存储器
    • US3955182A
    • 1976-05-04
    • US560864
    • 1975-03-21
    • Georges Bert
    • Georges Bert
    • G11C11/412H03K3/356G11C11/40
    • H03K3/356017G11C11/412
    • A memory cell as required for use in the building of integrated memories, which contains bistable trigger stages formed by two transistors, with a high operational reliability, a low power consumption and an access time of less than 0.01 microseconds for a store of 64 elements, is provided. To this end, low-consumption field-effect transistors are chosen, obtained by the ion implantation of an N-type channel, in order, in each cell, to form, in addition to the two transistors of the trigger stage, a pair of transistors connected as amplifier-followers. The selection of a cell is effected by raising the potential on the word line connected to the sources of the transistors of the trigger stage.
    • 用于构建集成存储器所需的存储器单元,其包含由两个晶体管形成的双稳态触发级,具有高操作可靠性,低功耗和对于64个元件的存储小于0.01微秒的访问时间, 被提供。 为此,通过在每个单元中依次离子注入N型沟道来选择低功耗场效应晶体管,除了触发级的两个晶体管之外还形成一对 晶体管作为放大器跟随器连接。 通过提高连接到触发级的晶体管的源极的字线上的电位来实现电池的选择。