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1. 发明专利

CA2107756C IMPROVED BISTABLE DMD ADDRESSING METHOD 未知
公开(公告)号：CA2107756C
公开(公告)日：2004-02-03
申请号：CA2107756
申请日：1993-10-05
申请人： GALE RICHARD O JR
发明人： GALE RICHARD O JR
IPC分类号： G02B26/02 , G02B26/08 , G06K15/12 , G09G3/34 , H04N9/31 , G09G3/00
摘要： A preferred embodiment of the present invention provides a method of addressing a digital micromirror device (DMD) having an array of electromechanical pixels (20) comprising deflectable beams (30) wherein each of the pixels (20) assume one of two or more selected stable states accordin g to a set of selective address voltages. A first step of the preferred method is electromechanically latching, by applying a bias voltage with an AC and a DC component to the array of pixels (20), each of the pixels (20) in one of the selected stable states. A second step is applying a new set of selective address voltages to all the pixels (20) in the array. A third step is electromechanically unlatching, by removing the bias voltage from the array, the pixels (20) fro m their previously addressed state. A fourth step is allowing the array of pixels (20) to assume a new state in accordance with the new set of selectiv e address voltages. A fifth step is electromechanically latching, by reestablishing the bias voltage with the AC component and the DC component, each of the pixels (20). Other devices, systems and methods are also disclosed.

2. 发明专利

CA2107756A1 IMPROVED BISTABLE DMD ADDRESSING METHOD 未知
公开(公告)号：CA2107756A1
公开(公告)日：1994-04-16
申请号：CA2107756
申请日：1993-10-05
申请人： GALE RICHARD O
发明人： GALE RICHARD O JR
IPC分类号： G02B26/02 , G02B26/08 , G06K15/12 , G09G3/34 , H04N9/31 , G09G3/00
摘要： A preferred embodiment of the present invention provides a method of addressing a digital micromirror device (DMD) having an array of electromechanical pixels (20) comprising deflectable beams (30) wherein each of the pixels (20) assume one of two or more selected stable states according to a set of selective address voltages. A first step of the preferred method is electromechanically latching, by applying a bias voltage with an AC and a DC component to the array of pixels (20), each of the pixels (20) in one of the selected stable states. A second step is applying a new set of selective address voltages to all the pixels (20) in the array. A third step is electromechanically unlatching, by removing the bias voltage from the array, the pixels (20) from their previously addressed state. A fourth step is allowing the array of pixels (20) to assume a new state in accordance with the new set of selective address voltages. A fifth step is electromechanically latching, by reestablishing the bias voltage with the AC component and the DC component, each of the pixels (20). Other devices, systems and methods are also disclosed.

3. 发明专利

CA2086464A1 MEMORY CIRCUIT FOR SPATIAL LIGHT MODULATOR 未知
公开(公告)号：CA2086464A1
公开(公告)日：1993-07-01
申请号：CA2086464
申请日：1992-12-30
申请人： GALE RICHARD O , PERRONE BENJAMIN
发明人： GALE RICHARD O , PERRONE BENJAMIN
IPC分类号： G02B26/08 , G06T1/00 , G09F9/37 , G09G3/34 , G11C13/04 , G11C23/00 , H04N3/12 , H04N5/74 , G11C8/00 , G02B26/10
摘要： TI-16021 19 PATENT APPLICATION MEMORY CIRCUIT FOR SPATIAL LIGHT MODULATOR A memory circuit (11) for use with a spatial light modulator (10) having an array of electrically addressable, micro-mechanical, modulating elements, whose address electrodes determine how that element will affect incident light. The memory circuit has at least one static memory cell in communication with the address electrodes of each modulating element. Each memory cell receives data for determining its micro-mechanical movement via a bit-line down each column of memory cells. A row select signal (15) determines whether the data will be written to that row. A two-level voltage line supplies power to each memory cell, with one level being used for writing to the cell and another level being used for operating the modulating element. Ll693/1601/0lFT01

4. 发明专利

CA2143079C OPTIMIZED ELECTRONIC OPERATION OF DIGITAL MICROMIRROR DEVICES 未知
公开(公告)号：CA2143079C
公开(公告)日：2005-08-23
申请号：CA2143079
申请日：1995-02-21
申请人： GALE RICHARD O , LAWSON RANDALL S , CLEVELAND HARLAN P , CHU HENRY , DAVIS CARL W , HEIMBUCH SCOTT D , TEW CLAUDE E
发明人： GALE RICHARD O , LAWSON RANDALL S , CLEVELAND HARLAN P , CHU HENRY , DAVIS CARL W , HEIMBUCH SCOTT D , TEW CLAUDE E
IPC分类号： G02B26/08 , G02B26/00 , G02B26/02
摘要： A method for controlling a digital micromirror device resulting in decreas ed mechanical stress, longer device lifetimes, decreased incidence of spontaneo us bit reset, and increased pulse-width modulation accuracy. To reduce the device stress, the bias voltage applied to the mirror may be reduced after the mirror has been latched. To prevent premature mirror changes, the address electrode bias voltage may be reduced after the mirror is driven to the desired position. To ensure that the mirror returns to the neutral position during reset, the mirror bias voltage may be raised from ground potential to approximately halfway between the two addressing voltages during the reset period. To reduce the effects of hinge memory and to ensure that the mirror rotates toward the proper address electrode, the mirror bias voltage may be gradually increased to allow the mirror time to rotate towards the proper address electrode.

5. 发明专利

CA2107753C METHOD OF MITIGATING THE EFFECTS OF A DEFECTIVE ELECTROMECHANICAL PIXEL 未知
公开(公告)号：CA2107753C
公开(公告)日：2004-02-03
申请号：CA2107753
申请日：1993-10-05
申请人： GALE RICHARD O JR , MCCORMACK BRIAN C
发明人： GALE RICHARD O JR , MCCORMACK BRIAN C
IPC分类号： G02B26/08 , G09F9/37 , G09G3/34 , G09G3/00
摘要： Methods are disclosed by which the effects of a defective electromechanical pixel 20 having a beam 30 and a hinge 32,34 are mitigated. These methods may damage the hinge 32,34 or the beam 30 and comprise the step of applying a voltage sufficient to damage the hinge 32,34 or beam 30 of said electromechanical pixel 20 by mechanical overstress, thermal overstress, electrochemical reaction, or thermally induced chemical reaction. Other methods are also disclosed.

6. 发明专利

CA2143079A1 OPTIMIZED ELECTRONIC OPERATION OF DIGITAL MICROMIRROR DEVICES 未知
公开(公告)号：CA2143079A1
公开(公告)日：1995-09-08
申请号：CA2143079
申请日：1995-02-21
申请人： GALE RICHARD O , LAWSON RANDALL S , CLEVELAND HARLAN P , CHU HENRY , DAVIS CARL W , HEIMBUCH SCOTT D , TEW CLAUDE E
发明人： GALE RICHARD O , LAWSON RANDALL S , CLEVELAND HARLAN P , CHU HENRY , DAVIS CARL W , HEIMBUCH SCOTT D , TEW CLAUDE E
IPC分类号： G02B26/08 , G02B26/00 , G02B26/02
摘要： A method for controlling a digital micromirror device 40 resulting in decreased mechanical stress, longer device lifetimes, decreased incidence of spontaneous bit reset, and increased pulse-width modulation accuracy. To reduce the device stress, the bias voltage 142 applied to the mirror 50 may be reduced after the mirror 50 has been latched. To prevent premature mirror changes, the address electrode bias voltage 140 may be reduced after the mirror is driven to the desired position. To ensure that the mirror 50 returns to the neutral position during reset, the mirror bias voltage 142 may be raised from ground potential to approximately halfway between the two addressing voltages during the reset period 152. To reduce the effects of hinge memory and to ensure that the mirror 50 rotates toward the proper address electrode, the mirror bias voltage 142 may be gradually increased to allow the mirror 50 time to rotate towards the proper address electrode.

7. 发明专利

CA2126111A1 WAFER-LIKE PROCESSING AFTER SAWING DMDS 未知
公开(公告)号：CA2126111A1
公开(公告)日：1994-12-25
申请号：CA2126111
申请日：1994-06-17
申请人： GALE RICHARD O , MIGNARDI MICHAEL A
发明人： GALE RICHARD O , MIGNARDI MICHAEL A
IPC分类号： G02B26/02 , B25B11/00 , B28D5/00 , B28D5/02 , B81C1/00 , G02B26/08 , H01L21/301 , H01L21/683 , H01L21/78 , H01L21/68
摘要： A processing fixture and method of fabricating micromechanical devices, such as digital micromirror devices, that allows fragile structures on wafer 22 to be protected from debris during the saw operation and subsequent cleaning operations. The wafer 22 is attached to a vacuum fixture 26 after partially sawing the water 22 to create saw kerfs. The backside of the wafer 22 is then ground down to the saw kerfs 24 to separate the devices 32. Each device 32 is held on the fixture by a vacuum in the headspace above the device 32. In an alternate embodiment the devices are separated by sawing completely through the wafer while in the fixture.

8. 发明专利

CA2107753A1 METHOD OF MITIGATING THE EFFECTS OF A DEFECTIVE ELECTROMECHANICAL PIXEL 未知
公开(公告)号：CA2107753A1
公开(公告)日：1994-04-24
申请号：CA2107753
申请日：1993-10-05
申请人： GALE RICHARD O , MCCORMACK BRIAN C
发明人： GALE RICHARD O JR , MCCORMACK BRIAN C
IPC分类号： G02B26/08 , G09F9/37 , G09G3/34 , G09G3/00
摘要： Methods are disclosed by which the effects of a defective electromechanical pixel 20 having a beam 30 and a hinge 32,34 are mitigated. These methods may damage the hinge 32,34 or the beam 30 and comprise the step of applying a voltage sufficient to damage the hinge 32,34 or beam 30 of said electromechanical pixel 20 by mechanical overstress, thermal overstress, electrochemical reaction, or thermally induced chemical reaction. Other methods are also disclosed. TI-17097 18

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