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1. 发明授权

US08637602B2 Stabilization of vinyl ether materials 有权
标题翻译：乙烯基醚材料的稳定化
公开(公告)号：US08637602B2
公开(公告)日：2014-01-28
申请号：US12335575
申请日：2008-12-16
申请人： Frances Anne Houle , Hiroshi Ito
发明人： Frances Anne Houle , Hiroshi Ito
IPC分类号： C08L83/00 , C07D279/18
CPC分类号： G03F7/027 , B29C59/002 , C09D4/00 , G03F7/0041 , G03F7/0755 , C08F216/125
摘要： A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and at least one stabilizer.
摘要翻译：公开了稳定粘度涂料组合物，形成稳定粘度涂料组合物的方法和在微型成型压印光刻工艺中使用稳定粘度涂料组合物的方法，例如步骤和闪光印记平版印刷术。稳定粘度涂料组合物可以包括至少一种具有至少一个乙烯基醚基（-OCR = CR 2）的乙烯基醚和稳定剂，其中稳定剂可以是9-蒽基甲醇，取代的9-蒽基甲醇，吩噻嗪或取代的吩噻嗪。涂料组合物可以包括辐射敏感光致酸产生剂（PAG）。形成涂料组合物的方法包括组合至少一种具有至少一个乙烯基醚基团（-OCR = CR 2）的乙烯基醚和至少一种稳定剂。

2. 发明授权

US07875873B2 Phase change materials and associated memory devices 有权
标题翻译：相变材料和相关的存储器件
公开(公告)号：US07875873B2
公开(公告)日：2011-01-25
申请号：US12336497
申请日：2008-12-16
申请人： Yi-Chou Chen , Frances Anne Houle , Simone Raoux , Charles Rettner , Alejandro Gabriel Schrott
发明人： Yi-Chou Chen , Frances Anne Houle , Simone Raoux , Charles Rettner , Alejandro Gabriel Schrott
IPC分类号： H01L45/00
CPC分类号： G11B7/2433 , G11B7/00454 , G11B7/2437 , G11B2007/24312 , G11B2007/24314 , G11B2007/24316 , G11B2007/24322 , H01L27/2463 , H01L45/06 , H01L45/1226 , H01L45/1233 , H01L45/144 , H01L45/148 , H01L45/1625
摘要： A memory device utilizes a phase change material as the storage medium. The phase change material includes at least one of Ge, Sb, Te, Se, As, and S, as well as a nitride compound as a dopant. The memory device can be a solid-state memory cell with electrodes in electrical communication with the phase change medium, an optical phase change storage device in which data is read and written optically, or a storage device based on the principle of scanning probe microscopy.
摘要翻译：存储器件利用相变材料作为存储介质。相变材料包括Ge，Sb，Te，Se，As和S中的至少一种，以及作为掺杂剂的氮化物化合物。存储器件可以是具有与相变介质电连通的电极的固态存储单元，其中以光学方式读取和写入数据的光学相变存储装置，或者基于扫描探针显微镜原理的存储装置。

3. 发明授权

US07501648B2 Phase change materials and associated memory devices 有权
标题翻译：相变材料和相关的存储器件
公开(公告)号：US07501648B2
公开(公告)日：2009-03-10
申请号：US11465077
申请日：2006-08-16
申请人： Yi-Chou Chen , Frances Anne Houle , Simone Raoux , Charles Thomas Rettner , Alejandro Gabriel Schrott
发明人： Yi-Chou Chen , Frances Anne Houle , Simone Raoux , Charles Thomas Rettner , Alejandro Gabriel Schrott
IPC分类号： H01L47/00
CPC分类号： G11B7/2433 , G11B7/00454 , G11B7/2437 , G11B2007/24312 , G11B2007/24314 , G11B2007/24316 , G11B2007/24322 , H01L27/2463 , H01L45/06 , H01L45/1226 , H01L45/1233 , H01L45/144 , H01L45/148 , H01L45/1625
摘要： A memory device utilizes a phase change material as the storage medium. The phase change material includes at least one of Ge, Sb, Te, Se, As, and S, as well as a nitride compound as a dopant. The memory device can be a solid-state memory cell with electrodes in electrical communication with the phase change medium, an optical phase change storage device in which data is read and written optically, or a storage device based on the principle of scanning probe microscopy.
摘要翻译：存储器件利用相变材料作为存储介质。相变材料包括Ge，Sb，Te，Se，As和S中的至少一种，以及作为掺杂剂的氮化物化合物。存储器件可以是具有与相变介质电连通的电极的固态存储单元，其中以光学方式读取和写入数据的光学相变存储装置，或者基于扫描探针显微镜原理的存储装置。

4. 发明申请

US20080174051A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY 有权
标题翻译：基于芳族乙烯基的反向色调和闪光曝光
公开(公告)号：US20080174051A1
公开(公告)日：2008-07-24
申请号：US12055513
申请日：2008-03-26
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B29C35/08 , B29C39/02 , C08F2/46
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

5. 发明申请

US20080169268A1 PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY 有权
标题翻译：用于步进和闪光印刷的方法和材料
公开(公告)号：US20080169268A1
公开(公告)日：2008-07-17
申请号：US12051584
申请日：2008-03-19
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： C03C25/68
CPC分类号： G03F7/0755 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045
摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
摘要翻译：一种形成图像的方法。该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。还描述了反向色调处理。

6. 发明授权

US08759415B2 Aromatic vinyl ether based reverse-tone step and flash imprint lithography 有权
标题翻译：基于芳族乙烯基醚的反相色阶和闪光印迹光刻
公开(公告)号：US08759415B2
公开(公告)日：2014-06-24
申请号：US13564812
申请日：2012-08-02
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B41J2/16 , C08F2/46 , C08G61/04
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming a pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

7. 发明授权

US08262961B2 Aromatic vinyl ether based reverse-tone step and flash imprint lithography 有权
标题翻译：基于芳族乙烯基醚的反相色阶和闪光印迹光刻
公开(公告)号：US08262961B2
公开(公告)日：2012-09-11
申请号：US12055513
申请日：2008-03-26
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B29C41/20 , B29C41/22 , B29C59/02 , B29C59/16
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

8. 发明授权

US08128832B2 Processes and materials for step and flash imprint lithography 有权
标题翻译：步进和闪光压印光刻的工艺和材料
公开(公告)号：US08128832B2
公开(公告)日：2012-03-06
申请号：US12051584
申请日：2008-03-19
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： H01L21/302
CPC分类号： G03F7/0755 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0045
摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
摘要翻译：一种形成图像的方法。该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。还描述了反向色调处理。

9. 发明申请

US20090092767A1 STABILIZATION OF VINYL ETHER MATERIALS 有权
标题翻译：乙烯基材料的稳定性
公开(公告)号：US20090092767A1
公开(公告)日：2009-04-09
申请号：US12335575
申请日：2008-12-16
申请人： Frances Anne Houle , Hiroshi Ito
发明人： Frances Anne Houle , Hiroshi Ito
IPC分类号： B05D3/06 , C08F2/50 , C08L29/10
CPC分类号： G03F7/027 , B29C59/002 , C09D4/00 , G03F7/0041 , G03F7/0755 , C08F216/125
摘要： A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and at least one stabilizer.
摘要翻译：公开了稳定粘度涂料组合物，形成稳定粘度涂料组合物的方法和在微型成型压印光刻工艺中使用稳定粘度涂料组合物的方法，例如步骤和闪光印记平版印刷术。稳定粘度涂料组合物可以包括至少一种具有至少一个乙烯基醚基（-OCR-CR 2）的乙烯基醚和稳定剂，其中稳定剂可以是9-蒽甲醇，取代的9-蒽甲醇，吩噻嗪或取代的吩噻嗪。涂料组合物可以包括辐射敏感光致酸产生剂（PAG）。形成涂料组合物的方法包括组合至少一种具有至少一个乙烯基醚基（-OCR-CR 2）的乙烯基醚和至少一种稳定剂。

10. 发明申请

US20070298176A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY 审中-公开
标题翻译：基于芳族乙烯基的反向色调和闪光曝光
公开(公告)号：US20070298176A1
公开(公告)日：2007-12-27
申请号：US11426363
申请日：2006-06-26
申请人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
发明人： Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
IPC分类号： B05D3/12 , C08F2/46
CPC分类号： C08F2/50 , B82Y10/00 , B82Y40/00 , C08F216/125 , G03F7/0002 , G03F7/0045 , G03F7/038
摘要： A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.
摘要翻译：成型组合物和形成图案的方法。该方法包括在基材上形成芳族二乙烯基醚的模塑组合物的模塑层; 将模板压入成型层，模板具有浮雕图案，成型层在浮雕图案中填充空隙，模板不接触基板; 将成型层暴露于光化辐射，光化辐射将成型层转化成具有对应于浮雕图案的厚而薄的区域的固化模塑层; 删除模板; 用填充材料填充浮雕图案的薄区域; 除去未被回填材料保护的成型层的区域以暴露基底的区域; 在衬底的暴露区域中形成沟槽; 并移除任何剩余的成型层和回填材料。可以在模塑层和基材之间使用转移层。

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