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    • 2. 发明申请
    • MANAGING DATA MOVEMENT IN A CELL BROADBAND ENGINE PROCESSOR
    • 在小区宽带发动机处理器中管理数据运动
    • US20120297092A1
    • 2012-11-22
    • US13557014
    • 2012-07-24
    • Zheng WangLiang ChenWenjun WangFeng Kuan
    • Zheng WangLiang ChenWenjun WangFeng Kuan
    • G06F3/00
    • G06F15/16
    • A cell broadband engine processor includes memory, a power processing element (PPE) coupled with the memory, and a plurality of synergistic processing elements. The PPE creates a SPE as a computing SPE for an application. The PPE determines idles ones of the plurality of SPEs, and creates a managing SPE from one of the idle SPEs. Each of the plurality of SPEs is associated with a local storage. The managing SPE informs the computing SPE of a starting effective address of the local storage of the managing SPE and an effective address for a command queue. The managing SPE manages movement of data associated with computing of the computing SPE based on one or more commands associated with the application. A computing SPE sends the one or more commands to the managing SPE for insertion into the command queue.
    • 小区宽带引擎处理器包括存储器,与存储器耦合的功率处理元件(PPE)以及多个协同处理元件。 PPE创建一个SPE作为应用程序的计算SPE。 PPE确定多个SPE中的空闲的SPE,并且从空闲SPE之一创建管理SPE。 多个SPE中的每一个与本地存储器相关联。 管理SPE将计算SPE通知管理SPE的本地存储的起始有效地址和命令队列的有效地址。 管理SPE基于与应用相关联的一个或多个命令来管理与计算SPE的计算相关联的数据的移动。 计算SPE将一个或多个命令发送到管理SPE以插入到命令队列中。
    • 4. 发明授权
    • Mask-shift-aware RC extraction for double patterning design
    • 面罩移位感知RC提取双图案设计
    • US08252489B2
    • 2012-08-28
    • US13167905
    • 2011-06-24
    • Ke-Ying SuChung-Hsing WangJui-Feng KuanHsiao-Shu ChaoYi-Kan Cheng
    • Ke-Ying SuChung-Hsing WangJui-Feng KuanHsiao-Shu ChaoYi-Kan Cheng
    • G03F9/00G06F17/50
    • G06F17/5081G03F1/70G03F7/70433G03F7/70466G06F17/5036
    • A method includes providing a layout of an integrated circuit design, and generating a plurality of double patterning decompositions from the layout, with each of the plurality of double patterning decompositions including patterns separated to a first mask and a second mask of a double patterning mask set. A maximum shift between the first and the second masks is determined, wherein the maximum shift is a maximum expected mask shift in a manufacturing process for implementing the layout on a wafer. For each of the plurality of double patterning decompositions, a worst-case performance value is simulated using mask shifts within a range defined by the maximum shift. The step of simulating the worst-case performance includes calculating capacitance values corresponding to mask shifts, and the capacitance values are calculated using a high-order equation or a piecewise equation.
    • 一种方法包括提供集成电路设计的布局,以及从布局生成多个双重图案化分解,多个双重图案化分解中的每一个包括分离到第一掩模的图案和双图案掩模组的第二掩模 。 确定第一和第二掩模之间的最大偏移,其中最大偏移是用于在晶片上实现布局的制造过程中的最大预期掩模移位。 对于多个双重图案化分解中的每一个,使用由最大偏移限定的范围内的掩模移位来模拟最坏情况的性能值。 模拟最坏情况性能的步骤包括计算与掩模移位相对应的电容值,并且使用高阶方程或分段方程计算电容值。