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1. 发明申请

WO2008028051A1 HIGH-INDEX UV OPITCAL MATERIALS FOR IMMERSION LITHOGRAPHY 审中-公开
标题翻译：高指数紫外线光学材料
公开(公告)号：WO2008028051A1
公开(公告)日：2008-03-06
申请号：PCT/US2007/077259
申请日：2007-08-30
申请人： CRYSTAL PHOTONICS, INCORPORATED , JEN, Shen , FEI, Yi-Ting , CHAI, Bruce
发明人： JEN, Shen , FEI, Yi-Ting , CHAI, Bruce
IPC分类号： C30B9/00 , C30B15/00 , C30B29/22 , G03F7/20
CPC分类号： G03F7/70958 , C30B15/00 , C30B29/22 , G02B1/02 , G03F7/70341
摘要： This invention is related to material for use as an ultraviolet (UV) optical element and particularly for use as a 193 nm immersion lens element. The material for use as a UV optical element includes a Lithium Magnesium Aluminate (LMAO) body. The specific compound for this application is the disordered lithium magnesium spinel, having the general composition of Li x Mg 2(1-x) AI 4+x O 8 where x = 0 to 1 as the high-index UV transparent material for immersion lithography. The LMAO body may include a disordered spinel, such as, for example, a single crystal that may be cubic in symmetry, optically isotropic, and having cation disorder within the structure to reduce the intrinsic birefringence (IBR). The LMAO body has certain desired material properties and may be readily made in relatively large sizes suitable for use as the UV optical element for photolithography.
摘要翻译：本发明涉及用作紫外线（UV）光学元件并且特别用作193nm浸没透镜元件的材料。用作UV光学元件的材料包括铝酸锂铝（LMAO）铝体。用于该应用的具体化合物是无序的锂镁尖晶石，其具有一般组成为Li x2 Mg 2（1-x）3 Al + 4 + x < 其中x = 0至1作为用于浸渍光刻的高折射率UV透明材料。 LMAO体可以包括无序尖晶石，例如可以是对称的立方体，光学各向同性的并且在结构内具有阳离子障碍以降低固有双折射（IBR）的单晶。 LMAO体具有一定的期望的材料性质，并且可以容易地制成适合用作光刻的UV光学元件的相对大的尺寸。

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