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1. 发明授权

US06798498B2 Apparatus for evaluating polysilicon film 失效
标题翻译：多晶硅膜评估装置
公开(公告)号：US06798498B2
公开(公告)日：2004-09-28
申请号：US10050542
申请日：2002-01-18
申请人： Hiroyuki Wada , Koichi Tatsuki , Nobuhiko Umezu , Eiji Isomura , Tetsuo Abe , Tadashi Hattori , Akifumi Ooshima , Makoto Uragaki , Yoshiyuki Noguchi , Hiroyuki Tamaki , Masataka Ebe , Tomohiro Ishiguro , Yasuyuki Kato
发明人： Hiroyuki Wada , Koichi Tatsuki , Nobuhiko Umezu , Eiji Isomura , Tetsuo Abe , Tadashi Hattori , Akifumi Ooshima , Makoto Uragaki , Yoshiyuki Noguchi , Hiroyuki Tamaki , Masataka Ebe , Tomohiro Ishiguro , Yasuyuki Kato
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： A polysilicon film evaluation apparatus is provided which enables objective automatic evaluation of the status of a polysilicon film, as formed to a high accuracy in a contact-free fashion. To this end, there is provided a polysilicon film evaluation apparatus 1 including a stage 25 on which to set a substrate W carrying a polysilicon film, an optical system for observation with the visible light 4, 8, 12, 40a for illuminating the visible light on a substrate W on the stage to photograph a surface image of the polysilicon film on the substrate W to effect auto-focusing, an optical system for observation with UV light 6, 10, 40b for illuminating the UV light on the substrate on the stage to acquire a surface image of the polysilicon film of the substrate, auto-focused using the optical system for observation with the visible light, and an evaluating unit 51 for evaluating the linearity and periodicity of a spatial structure of the film surface of the polysilicon film, from a surface image of the polysilicon film obtained by the optical system for observation with UV light, to evaluate the status of the polysilicon film based on the results of evaluation of the linearity and periodicity.
摘要翻译：提供了一种多晶硅膜评价装置，其能够以无接触的方式高精度地形成，从而能够客观地自动评估多晶硅膜的状态。为此，提供了一种多晶硅膜评价装置1，其包括载置多晶硅膜的基板W，载置多晶硅膜的基板W的阶段25，用于照射可见光的可见光4,8,12,4a的观察用光学系统在台面上的基板W上拍摄基板W上的多晶硅膜的表面图像以实现自动聚焦，用于用紫外光6,10,40b观察的光学系统用于照射台上的基板上的UV光获取使用可见光观察用光学系统自动聚焦的基板的多晶硅膜的表面像，以及用于评价多晶硅膜的膜表面的空间结构的线性和周期性的评估单元51 从由用于用UV光观察的光学系统获得的多晶硅膜的表面图像，基于线性度的评估结果来评估多晶硅膜的状态a 周期性

2. 发明授权

US6094263A Visual examination apparatus and visual examination method of semiconductor device 失效
标题翻译：半导体器件目视检查仪器及目视检查方法
公开(公告)号：US6094263A
公开(公告)日：2000-07-25
申请号：US83540
申请日：1998-05-22
申请人： Hiroshi Tomiya , Eiji Isomura
发明人： Hiroshi Tomiya , Eiji Isomura
IPC分类号： G01B11/24 , G01N21/88 , G01N21/956 , G01R31/308 , G06T1/00 , H01L21/66 , G01N21/00 , G01J4/00
CPC分类号： G01N21/95684 , G01R31/308
摘要： A visual examination apparatus for a semiconductor device for optically reading an image of a semiconductor device having a substantially rectangular package is disclosed, comprising:four polarized light sources which are disposed so as to confront the four side surfaces of said package;four reflection means each of which is disposed between each of said four polarized light sources and the corresponding side surface of said package, and reflects a projection image at each side surface side which is formed from polarized light emitted to said package from a polarized light source which said reflection means confronts through said package; andimage reading means for collectively picking up projection images at the respective side surface sides which are reflected from said four reflection means and an image at the flat surface side of said package.A visual examination method for a semiconductor device for optically reading an image of a semiconductor device having a substantially rectangular package is also disclosed.
摘要翻译：公开了一种用于光学读取具有大致矩形封装的半导体器件的图像的半导体器件的目视检查装置，包括：四个偏振光源，其被设置为面对所述封装的四个侧表面; 四个反射装置，每个反射装置设置在所述四个偏振光源中的每一个和所述包装的相应侧表面之间，并且将由从偏振光源发射到所述封装的偏振光形成的每个侧表面侧反射投影图像所述反射装置通过所述包装面对; 以及图像读取装置，用于在从所述四个反射装置反射的各个侧表面侧共同拾取投影图像和在所述包装的平坦表面侧的图像。还公开了一种用于光学读取具有大致矩形封装的半导体器件的图像的半导体器件的目视检查方法。

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