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    • 6. 发明申请
    • SINGLE STEP PENDEO- AND LATERAL EPITAXIAL OVERGROWTH OF GROUP III-NITRIDE LAYERS
    • 第III组氮化物层的单步和侧向外延生长
    • WO0127980A9
    • 2002-09-26
    • PCT/US0028056
    • 2000-10-11
    • CREE INCKONG HUA-SHUANGEDMOND JOHN ADAMHABERERN KEVIN WARDEMERSON DAVID TODD
    • KONG HUA-SHUANGEDMOND JOHN ADAMHABERERN KEVIN WARDEMERSON DAVID TODD
    • H01L21/20H01L21/205H01S5/02
    • H01L21/0265H01L21/0237H01L21/02458H01L21/0254H01L21/02639H01L21/02647H01S5/32341H01S2304/12
    • A method of fabricating a gallium nitride-based semiconductor structure on a substrate includes the steps of forming a mask (14) having at least one opening (6) therein directly on the substrate (18), growing a buffer layer (12) through the opening, and growing a layer of gallium nitride (20) upwardly from the buffer layer and laterally across the mask. During growth of the gallium nitride from the mask, the vertical and horizontal growth rates of the gallium nitride layer are maintained at rates sufficient to prevent polycrystalline material (30) nucleating on said mask from interrupting the lateral growth of the gallium nitride layer. In an alternative embodiment, the method includes forming at least one raised portion (15) defining adjacent trenches (18) in the substrate and forming a mask (14) on the substrate (10), the mask having at least one opening (16) over the upper surface of the raised portion. A buffer layer (12) may be grown from the upper surface of the raised portion. The gallium nitride layer (26) is then grown laterally by pendeoepitaxy over the trenches.
    • 在衬底上制造氮化镓基半导体结构的方法包括以下步骤:在衬底(18)上直接形成具有至少一个开口(6)的掩模(14),通过该衬底生长缓冲层(12) 打开并从缓冲层向上生长一层氮化镓(20)并横向穿过掩模。 在从掩模生长氮化镓期间,氮化镓层的垂直和水平生长速率保持在足以防止在所述掩模上成核的多晶材料(30)中断氮化镓层的横向生长的速率。 在替代实施例中,该方法包括形成在衬底中限定相邻沟槽(18)的至少一个凸起部分(15),并在衬底(10)上形成掩模(14),所述掩模具有至少一个开口(16) 在凸起部分的上表面上。 缓冲层(12)可以从凸起部分的上表面生长。 然后通过在沟槽上的外延生长横向生长氮化镓层(26)。