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1. 发明申请

WO2012005717A2 SAMPLE CARRIER 审中-公开
标题翻译：样品载体
公开(公告)号：WO2012005717A2
公开(公告)日：2012-01-12
申请号：PCT/US2010040277
申请日：2010-06-29
申请人： ANALOGIC CORP , MCKENNA GILBERT W , EIRIKSSON ARI
发明人： MCKENNA GILBERT W , EIRIKSSON ARI
IPC分类号： B01L3/00
CPC分类号： G01N1/28 , B01L3/502715 , B01L3/50273 , B01L2200/027 , B01L2200/141 , B01L2300/087 , B01L2300/10 , B01L2300/105 , B01L2400/0487 , B01L2400/0694 , Y10T137/0318
摘要： A micro channel device includes at least one sample processing region (108) that supports a sample for processing by a sample processing apparatus, at least one chamber (120, 126) that stores a fluid, at least one channel (202, 204, 206, 302, 402), and an interface (116) configured to interface with the processing apparatus. Moisture removed from compressed air, which is employed to move the sample and/or a processing agent through the at least one channel, is received by the interface and routed via the at least one channel to the at least one chamber.
摘要翻译：微通道装置包括至少一个样品处理区域（108），该样品处理区域（108）支持用于样品处理装置处理的样品，存储流体的至少一个室（120,126），至少一个通道（202,204,206 ，302,402）和被配置为与所述处理设备接口的接口（116）。用于将样品和/或处理剂通过至少一个通道移动的压缩空气中的水分被界面接收并经由至少一个通道传送至至少一个室。

2. 发明申请

WO2006020645A1 MAGNETIC SUPPORT STRUCTURE FOR AN ELEVATOR TUBE OF A VERTICLE RAPID THERMAL PROCESSING UNIT 审中-公开
标题翻译：用于快速热处理装置的电梯管的磁支撑结构
公开(公告)号：WO2006020645A1
公开(公告)日：2006-02-23
申请号：PCT/US2005/028280
申请日：2005-08-08
申请人： AXCELIS TECHNOLOGIES, INC. , PHARAND, Michel , NORMANDIN, Dennis , EIRIKSSON, Ari
发明人： PHARAND, Michel , NORMANDIN, Dennis , EIRIKSSON, Ari
IPC分类号： H01L21/00
CPC分类号： H01L21/68792
摘要： A vertical rapid thermal processing system includes a processing chamber and an elevator structure providing for vertical movement of a workpiece within the processing chamber. The elevator structure includes a workpiece support for supporting the workpiece and an elevator shaft coupled to the workpiece support and extending externally from the processing chamber. An end portion of the elevator shaft, external to the processing chamber, has a selected magnetic polarity. The elevator structure also includes moveable carriage coupled to the shaft to provide vertical movement of the workpiece within the processing chamber. The carriage includes a shaft support having the selected polarity. The shaft support is positioned adjacent the polarized end portion of the elevator shaft such that repulsive magnetic forces maintain a gap between the end portion of the elevator shaft and the shaft support as the shaft support and elevator shaft move vertically along a path of travel.
摘要翻译：垂直快速热处理系统包括处理室和提供工件在处理室内的垂直移动的升降机结构。电梯结构包括用于支撑工件的工件支撑件和联接到工件支撑件并从处理室外部延伸的升降机轴。电梯井的在处理室外部的端部具有选定的磁极性。电梯结构还包括联接到轴的可移动的托架，以提供工件在处理室内的垂直移动。托架包括具有所选极性的轴支撑件。轴支撑件邻近电梯井的极化端部定位，使得当轴支撑件和电梯井沿行进路径垂直移动时，排斥磁力在电梯井的端部与轴支撑件之间保持间隙。

3. 发明申请

WO2005020296A2 UNIFORM GAS CUSHION WAFER SUPPORT 审中-公开
标题翻译：均匀气垫圈支撑
公开(公告)号：WO2005020296A2
公开(公告)日：2005-03-03
申请号：PCT/US2004/027337
申请日：2004-08-23
申请人： AXCELIS TECHNOLOGIES INC. , PHARAND, Michael , DURANT, Thomas , EIRIKSSON, Ari , GUELER, Richard
发明人： PHARAND, Michael , DURANT, Thomas , EIRIKSSON, Ari , GUELER, Richard
IPC分类号： H01L21/00
CPC分类号： H01L21/6838
摘要： A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.
摘要翻译：工件被支撑在气垫上，以减少加工过程中工件的机械应力。具有用于接收工件的工件支撑凸缘的气室连接到气体供应。当气体流入增压室并且压力增加到足以提升工件时，工件被提升，并且气体在凸缘和工件边缘之间流出增压室。因此，工件在加工过程中被气体支撑在法兰上方。

4. 发明申请

WO2012005717A3 SAMPLE CARRIER 审中-公开
公开(公告)号：WO2012005717A3
公开(公告)日：2012-01-12
申请号：PCT/US2010/040277
申请日：2010-06-29
申请人： ANALOGIC CORPORATION , MCKENNA, Gilbert, W. , EIRIKSSON, Ari
发明人： MCKENNA, Gilbert, W. , EIRIKSSON, Ari
IPC分类号： B01L3/00
摘要： A micro channel device includes at least one sample processing region (108) that supports a sample for processing by a sample processing apparatus, at least one chamber (120, 126) that stores a fluid, at least one channel (202, 204, 206, 302, 402), and an interface (116) configured to interface with the processing apparatus. Moisture removed from compressed air, which is employed to move the sample and/or a processing agent through the at least one channel, is received by the interface and routed via the at least one channel to the at least one chamber.

5. 发明申请

WO2008021340A3 WORKPIECE HANDLING SCAN ARM FOR ION IMPLANTATION SYSTEM 审中-公开
标题翻译：用于离子注入系统的工件处理扫描臂
公开(公告)号：WO2008021340A3
公开(公告)日：2008-07-17
申请号：PCT/US2007017942
申请日：2007-08-13
申请人： AXCELIS TECH INC , BECKEL DONOVAN , EIRIKSSON ARI , MITCHELL ROBERT , PHARAND MICHEL , LAFONTAINE MARVIN , PUROHIT ASHWIN , WEED STEVE , ARSENAULT WAYNE , PATHAK SHANTANU
发明人： EIRIKSSON ARI , MITCHELL ROBERT , PHARAND MICHEL , LAFONTAINE MARVIN , PUROHIT ASHWIN , WEED STEVE , ARSENAULT WAYNE , PATHAK SHANTANU
IPC分类号： H01L21/683 , H01L21/687
CPC分类号： H01L21/6831 , H01L21/68764
摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic fluid seals associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.
摘要翻译：提供了一种离子注入设备，系统和方法，用于连接和断开扫描臂上的工件支架。提供一种扭头，其中可操作地安装静电吸盘，其中与扭头和静电吸盘中的一个或多个相关联的一个或多个旋转和非旋转构件具有与其相关联的一个或多个动态流体密封件。静电吸盘可进一步操作以在不断开一个或多个动态流体密封件的情况下从扭动头部移除。

6. 发明申请

WO2008021340A2 WORKPIECE HANDLING SCAN ARM FOR ION IMPLANTATION SYSTEM 审中-公开
标题翻译：用于离子植入系统的工作处理扫描臂
公开(公告)号：WO2008021340A2
公开(公告)日：2008-02-21
申请号：PCT/US2007/017942
申请日：2007-08-13
申请人： AXCELIS TECHNOLOGIES, INC. , BECKEL, Donovan , EIRIKSSON, Ari , MITCHELL, Robert , PHARAND, Michel , LAFONTAINE, Marvin , PUROHIT, Ashwin , WEED, Steve , ARSENAULT, Wayne , PATHAK, Shantanu
发明人： EIRIKSSON, Ari , MITCHELL, Robert , PHARAND, Michel , LAFONTAINE, Marvin , PUROHIT, Ashwin , WEED, Steve , ARSENAULT, Wayne , PATHAK, Shantanu
CPC分类号： H01L21/6831 , H01L21/68764
摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic fluid seals associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.
摘要翻译：提供离子注入装置，系统和方法用于将工件保持器与扫描臂连接和断开。提供了一种扭转头，其中可操作地安装静电卡盘，其中与一个或多个扭转头和静电卡盘相关联的一个或多个旋转和非旋转构件具有与其相关联的一个或多个动态流体密封件。静电卡盘还可操作以从扭转头移除而不断开一个或多个动态流体密封件。

7. 发明申请

WO2005020296A3 UNIFORM GAS CUSHION WAFER SUPPORT 审中-公开
标题翻译：均匀气体缓冲器晶片支持
公开(公告)号：WO2005020296A3
公开(公告)日：2005-08-04
申请号：PCT/US2004027337
申请日：2004-08-23
申请人： AXCELIS TECH INC , PHARAND MICHAEL , DURANT THOMAS , EIRIKSSON ARI , GUELER RICHARD
发明人： PHARAND MICHAEL , DURANT THOMAS , EIRIKSSON ARI , GUELER RICHARD
IPC分类号： H01L21/683 , H01L21/00
CPC分类号： H01L21/6838
摘要： A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.
摘要翻译：工件被支撑在气垫上以减少加工期间工件上的机械应力。具有用于接收工件的工件支撑凸缘的气室连接到气体供应。当气体流入充气室并且压力增加到足以提升工件时，工件被抬起并且气体从法兰与工件边缘之间的气室流出。工件在加工过程中被气体支撑在法兰上方。

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