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1. 发明授权

US08045786B2 Waferless recipe optimization 有权
标题翻译：无晶圆配方优化
公开(公告)号：US08045786B2
公开(公告)日：2011-10-25
申请号：US11552471
申请日：2006-10-24
申请人： Amir Widmann , Mark Ghinovker , Dror Francis
发明人： Amir Widmann , Mark Ghinovker , Dror Francis
IPC分类号： G06K9/00
CPC分类号： G03F7/70633 , G03F7/70508 , G03F7/70625
摘要： Disclosed are apparatus and methods for optimizing a metrology tool, such as an optical or scanning electron microscope so that minimum human intervention is achievable during the optimization. In general, a set of specifications and an initial input data are initially provided for a particular target. The specifications provide limits for characteristics of images that are to be measured by the metrology tool. The metrology tool is then automatically optimized for measuring the particular target so as to meet one or more of the provided specifications without further significant human intervention with respect to the metrology tool. In one aspect, the input data provided prior to the automated optimization procedure includes a plurality of target locations and a synthetic image of the particular target.
摘要翻译：公开了用于优化诸如光学或扫描电子显微镜的计量工具的装置和方法，使得在优化期间可以实现最小的人为干预。通常，最初为特定目标提供一组规范和初始输入数据。这些规格对由计量工具测量的图像的特性提供了限制。然后，度量工具自动优化用于测量特定目标，以满足一个或多个所提供的规格，而不会对计量工具进行更多的人为干预。在一个方面，在自动优化过程之前提供的输入数据包括多个目标位置和特定目标的合成图像。

2. 发明申请

US20080094639A1 WAFERLESS RECIPE OPTIMIZATION 有权
标题翻译：无轮胎优化
公开(公告)号：US20080094639A1
公开(公告)日：2008-04-24
申请号：US11552471
申请日：2006-10-24
申请人： Amir Widmann , Mark Ghinovker , Dror Francis
发明人： Amir Widmann , Mark Ghinovker , Dror Francis
IPC分类号： G01B11/24
CPC分类号： G03F7/70633 , G03F7/70508 , G03F7/70625
摘要： Disclosed are apparatus and methods for optimizing a metrology tool, such as an optical or scanning electron microscope so that minimum human intervention is achievable during the optimization. In general, a set of specifications and an initial input data are initially provided for a particular target. The specifications provide limits for characteristics of images that are to be measured by the metrology tool. The metrology tool is then automatically optimized for measuring the particular target so as to meet one or more of the provided specifications without further significant human intervention with respect to the metrology tool. In one aspect, the input data provided prior to the automated optimization procedure includes a plurality of target locations and a synthetic image of the particular target.
摘要翻译：公开了用于优化诸如光学或扫描电子显微镜的计量工具的装置和方法，使得在优化期间可以实现最小的人为干预。通常，最初为特定目标提供一组规范和初始输入数据。这些规格对由计量工具测量的图像的特性提供了限制。然后，度量工具自动优化用于测量特定目标，以满足一个或多个所提供的规格，而不会对计量工具进行更多的人为干预。在一个方面，在自动优化过程之前提供的输入数据包括多个目标位置和特定目标的合成图像。

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