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    • 8. 发明申请
    • Method for Decoding and Encoding a Video Signal
    • 视频信号的解码和编码方法
    • US20100246674A1
    • 2010-09-30
    • US11992763
    • 2006-10-09
    • Seung Wook ParkByeong Moon JeonDong Seok KimJi Ho Park
    • Seung Wook ParkByeong Moon JeonDong Seok KimJi Ho Park
    • H04N7/12
    • H04N19/59H04N19/103H04N19/105H04N19/11H04N19/159H04N19/176H04N19/187H04N19/30H04N19/61H04N19/82
    • A method for decoding/encoding a video signal using an inter-layer prediction process is disclosed. The method for decoding a video signal including several layer information includes: a) acquiring a first prediction signal for a current block of an enhancement layer and a residual signal based on at least a base layer block; b) smoothing the sum of the first prediction signal and the residual signal, and generating a second prediction signal for the current block; and c) reconstructing the current block based on the second prediction signal, wherein the step a) for generating the first prediction signal is based on prediction mode information of at least the current block. Therefore, the method for decoding/encoding a video signal uses a variety of inter layer prediction methods according to the macroblock types of macroblocks of the current and base layers, and removes inter layer redundancy, resulting in increased coding efficiency.
    • 公开了一种使用层间预测处理对视频信号进行解码/编码的方法。 用于解码包括若干层信息的视频信号的方法包括:a)基于至少一个基本层块获取增强层的当前块和剩余信号的第一预测信号; b)平滑第一预测信号和残差信号的和,并产生当前块的第二预测信号; 以及c)基于所述第二预测信号重新构建所述当前块,其中用于生成所述第一预测信号的步骤a)基于至少所述当前块的预测模式信息。 因此,视频信号的解码/编码方法根据当前和基层的宏块的宏块类型使用各种层间预测方法,并且消除层间冗余,从而提高编码效率。
    • 10. 发明申请
    • Semiconductor Device Having Saddle Fin Transistor and Method for Fabricating the Same
    • 具有鞍鳍晶体管的半导体器件及其制造方法
    • US20100163976A1
    • 2010-07-01
    • US12494567
    • 2009-06-30
    • Jin Yul LEEDong Seok KIM
    • Jin Yul LEEDong Seok KIM
    • H01L29/78H01L21/28
    • H01L29/66484H01L27/10876H01L27/10879H01L27/10894H01L29/66795H01L29/785
    • A method for fabricating a semiconductor device includes forming a pad nitride layer that exposes an isolation region over a cell region of a semiconductor substrate; forming a trench in the isolation region of the semiconductor substrate; forming an isolation layer within the trench; etching an active region of the semiconductor substrate by a certain depth to form a recessed isolation region; etching the isolation layer by a certain depth to form a recessed isolation region; depositing a gate metal layer in the recessed active region and the recessed isolation region to form a gate of a cell transistor; forming an insulation layer over an upper portion of the gate; removing the pad nitride layer to expose a region of the semiconductor substrate to be formed with a contact plug; and depositing a conductive layer in the region of the semiconductor substrate to form a contact plug.
    • 一种制造半导体器件的方法包括形成在半导体衬底的单元区域上暴露隔离区的衬垫氮化物层; 在所述半导体衬底的隔离区域中形成沟槽; 在沟槽内形成隔离层; 蚀刻半导体衬底的有源区一定深度以形成凹入的隔离区; 将隔离层蚀刻一定深度以形成凹入的隔离区域; 在凹入的有源区和凹入的隔离区中沉积栅极金属层以形成单元晶体管的栅极; 在所述浇口的上部上形成绝缘层; 去除衬垫氮化物层以暴露要形成有接触插塞的半导体衬底的区域; 以及在所述半导体衬底的区域中沉积导电层以形成接触插塞。