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    • 7. 发明申请
    • OPTICAL COMPONENTS CONTAINING COMPLEX DIFFRACTION GRATINGS AND METHODS FOR THE FABRICATION THEREOF
    • 包含复合衍射光栅的光学元件及其制造方法
    • WO1997027519A1
    • 1997-07-31
    • PCT/US1997001519
    • 1997-01-29
    • FOSTER-MILLER, INC.DOMASH, Lawrence, H.
    • FOSTER-MILLER, INC.
    • G03H01/04
    • G03F7/70408G02F1/13342G02F1/29G03H1/02G03H2001/026G03H2001/0264G03H2250/38
    • Methods for forming holographically processes polymer-liquid crystal composites (HPP7LCC) films and electrically switchable gratins utilizing HPP/ICCS are disclosed. These involve imaging a complex mask (10') which may be computer generated, containing the pattern to be imaged onto a film (12) of an HPP-LCC by use of a pair of interfering wavefronts (14A, 14B) as shown in the figure. By suitably selecting the angle between the pair of interfering wavefronts (14A, 14B), a desired submicron holographic pattern can be formed in the HPP/LCC film (12) in order to achieve optimum diffraction efficiency, with the pattern being modulated by the pattern in the mask to achieve the desired optical effect. Alternatively, the imaging may use contact lithography, where the mask (10') is in direct contact with the HPP/LCC film (12) as shown in figure 2 or the mask may be a focussing Fresnel element (10) as shown in figure 3.
    • 公开了使用HPP / ICCS全息处理聚合物 - 液晶复合材料(HPP7LCC)薄膜和电可切换格子的方法。 这些涉及通过使用一对干涉波阵面(14A,14B)来成像可以计算机生成的复合掩模(10'),其包含要成像到HPP-LCC的膜(12)上的图案,如 数字。 通过适当地选择一对干涉波前(14A,14B)之间的角度,可以在HPP / LCC膜(12)中形成期望的亚微米全息图,以获得最佳的衍射效率,其中图案被图案调制 在面具中实现所需的光学效果。 或者,成像可以使用接触光刻,其中掩模(10')与HPP / LCC膜(12)直接接触,如图2所示,或者掩模可以是如图所示的聚焦菲涅尔元件(10) 3。
    • 8. 发明申请
    • MATERIALS,THIN FILMS,OPTICAL FILTERS, AND DEVICES INCLUDING SAME
    • 材料,薄膜,光学过滤器和包括其中的设备
    • WO2007143227A2
    • 2007-12-13
    • PCT/US2007013761
    • 2007-06-08
    • QD VISION INCDOMASH LAWRENCE HCOE-SULLIVAN SETHSTECKEL JONATHAN S
    • DOMASH LAWRENCE HCOE-SULLIVAN SETHSTECKEL JONATHAN S
    • G02B5/20
    • G02B5/206G02B1/02G02B1/10G02B5/207
    • A material is disclosed which possesses at least two of the following characteristics: (a) is optically transparent at a wavelength in the range from about 1500 nm to about 1560 nm; (b) has a 1/n dn/dt greater than that of silicon, (c) has an extinction coefficient, k, less than 10"3. In certain preferred embodiments, the material has the following characteristics: (a) 1/n dn/dt greater than that of silicon, and (b) an extinction coefficient, k, less than 10'3 at 1550 nm. In another aspect, a material comprising semiconductor nanocrystals, wherein the semiconductor nanocrystals are capable of displaying thermo-optic effects in bulk form and being sufficiently non-absorbing at a predetermined wavelength to be optically transparent at that wavelength is disclosed. In a preferred embodiment, the predetermined wavelength is about 155,0 nm. Thin film, optical filters, and devices are also disclosed.
    • 公开了具有以下特征中的至少两个的材料:(a)在约1500nm至约1560nm范围内的波长下是光学透明的; (b)具有大于硅的1 / n dn / dt,(c)具有小于10“3的消光系数k,在某些优选实施方案中,该材料具有以下特征:(a)1 / n dn / dt大于硅的消耗系数,(b)在1550nm处的消光系数k小于10'3,另一方面,包括半导体纳米晶体的材料,其中半导体纳米晶体能够显示热光学 本发明公开了一种本体形式的并且在预定波长下足够不吸收以在该波长下为光学透明的效果,在优选实施例中,预定波长为约155,0nm,还公开了薄膜,滤光器和器件 。