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    • 2. 发明授权
    • Homogeneous blending
    • 均匀混合
    • US09556371B2
    • 2017-01-31
    • US13618088
    • 2012-09-14
    • Saeed H. MohseniElizabeth K. GrammDeepak Mahulikar
    • Saeed H. MohseniElizabeth K. GrammDeepak Mahulikar
    • B01J13/00C09G1/02C09K3/14
    • C09K3/1463C09G1/02
    • A method of forming a colloidal dispersion includes providing a first continuous material flow, providing a second continuous material flow, combining the first and second continuous material flows, and moving a continuous flow of a colloidal dispersion in a direction downstream of the first and second continuous flows. The first continuous material flow includes one or more of a diluent (e.g., deionized water), a base, and an acid, and the second continuous material flow includes an abrasive particle solution. The first and second material flows are combined with a Reynolds number greater than about 4400 and less than about 25000 (e.g., about 7400 to about 25000). The colloidal dispersion includes the diluent, the base, the acid, and abrasive particles from the abrasive particle solution.
    • 形成胶态分散体的方法包括提供第一连续材料流,提供第二连续材料流,组合第一和第二连续材料流,以及在第一和第二连续材料的下游方向上移动胶体分散体的连续流动 流动。 第一连续材料流包括稀释剂(例如去离子水),碱和酸中的一种或多种,​​并且第二连续材料流包括研磨颗粒溶液。 第一和第二材料流与大于约4400且小于约25000(例如约7400至约25000)的雷诺数组合。 胶体分散体包括来自磨料颗粒溶液的稀释剂,碱,酸和磨料颗粒。
    • 3. 发明授权
    • Fluid processing
    • 流体加工
    • US08303806B2
    • 2012-11-06
    • US12702602
    • 2010-02-09
    • Saeed H. MohseniDeepak Mahulikar
    • Saeed H. MohseniDeepak Mahulikar
    • B01D35/157B01D29/50B01D35/00
    • B01D35/143B01D29/56B01D29/96B01D2201/265
    • Fluid processing apparatuses and systems are disclosed. In some embodiments the fluid processing apparatuses include a movable enclosure, a plurality of filter housings disposed substantially within the movable enclosure, and a stand disposed within the enclosure. The filter housings are in fluid communication with one another. Each filter housing defines an elongate path and is configured to support a respective filter along the elongate flow path to filter a substantially continuous flow of fluid. The stand supports each filter housing such that the elongate flow path of each filter housing is substantially parallel to a vertical axis, wherein each filter housing is independently rotatable, relative to the stand.
    • 公开了流体处理装置和系统。 在一些实施例中,流体处理设备包括可移动的外壳,基本上设置在可移动外壳内的多个过滤器外壳以及设置在外壳内的支架。 过滤器壳体彼此流体连通。 每个过滤器壳体限定细长的路径并且构造成沿着细长流动路径支撑相应的过滤器以过滤基本连续的流体流。 支架支撑每个过滤器壳体,使得每个过滤器壳体的细长流动路径基本上平行于垂直轴线,其中每个过滤器壳体相对于支架独立地可旋转。
    • 4. 发明申请
    • Fluid Processing
    • 流体加工
    • US20110215053A1
    • 2011-09-08
    • US12850915
    • 2010-08-05
    • Saeed H. MohseniDeepak Mahulikar
    • Saeed H. MohseniDeepak Mahulikar
    • B01D37/00B01D29/50
    • B01D35/143B01D29/56B01D29/96B01D2201/265
    • Fluid processing apparatuses and systems are disclosed. In some embodiments the fluid processing apparatuses include a movable enclosure, a plurality of filter housings disposed substantially within the movable enclosure, and a stand disposed within the enclosure. The filter housings are in fluid communication with one another. Each filter housing defines an elongate path and is configured to support a respective filter along the elongate flow path to filter a substantially continuous flow of fluid. The stand supports each filter housing such that the elongate flow path of each filter housing is substantially parallel to a vertical axis, wherein each filter housing is independently rotatable, relative to the stand.
    • 公开了流体处理装置和系统。 在一些实施例中,流体处理设备包括可移动的外壳,基本上设置在可移动外壳内的多个过滤器外壳以及设置在外壳内的支架。 过滤器壳体彼此流体连通。 每个过滤器壳体限定细长的路径并且构造成沿着细长流动路径支撑相应的过滤器以过滤基本连续的流体流。 支架支撑每个过滤器壳体,使得每个过滤器壳体的细长流动路径基本上平行于垂直轴线,其中每个过滤器壳体相对于支架独立地可旋转。
    • 5. 发明申请
    • Fumed silica to colloidal silica conversion process
    • 气相二氧化硅胶体二氧化硅转化工艺
    • US20060283095A1
    • 2006-12-21
    • US11152873
    • 2005-06-15
    • Deepak MahulikarYuhu Wang
    • Deepak MahulikarYuhu Wang
    • C01B33/20C01B33/141C09K3/14C01B33/12
    • C09K3/1463C01B33/14C01B33/1435C01B33/22
    • A method of manufacturing a colloidal silica dispersion, by dissolving a fumed silica in an aqueous solvent having an alkali metal hydroxide to produce an alkaline silicate solution; removing the alkali metal via ion exchange to produce a silicic acid solution; adjusting the temperature, concentration and pH of the silicic acid solution to values sufficient to initiate nucleation and particle growth at elevated temperatures; and cooling the silicic acid solution at a rate sufficient to produce the colloidal silica dispersion. The colloidal silica particles in the colloidal silica dispersion have a mean particle size about 2 nm to about 100 nm. Also provided is a method of chemical mechanical polishing a surface of a substrate by contacting the substrate and a composition having a plurality of colloidal silica particles according to the present invention and a medium for suspending the particles. The contacting is carried out at a temperature and for a period of time sufficient to planarize the substrate.
    • 通过将热解法二氧化硅溶解在具有碱金属氢氧化物的水性溶剂中以制备碱性硅酸盐溶液来制备胶体二氧化硅分散体的方法; 通过离子交换除去碱金属,生成硅酸溶液; 将硅酸溶液的温度,浓度和pH调节到足以在升高的温度下引发成核和颗粒生长的值; 并以足以产生胶体二氧化硅分散体的速率冷却硅酸溶液。 胶体二氧化硅分散体中的胶体二氧化硅颗粒的平均粒径约为2nm至约100nm。 还提供了通过使基板和具有根据本发明的多个胶体二氧化硅颗粒的组合物和用于悬浮颗粒的介质的组合物进行化学机械抛光基板的表面的方法。 接触在足以使基材平坦化的温度下进行一段时间。
    • 7. 发明授权
    • Chemical mechanical polishing slurry system having an activator solution
    • 具有活化剂溶液的化学机械抛光浆料体系
    • US06447563B1
    • 2002-09-10
    • US09425358
    • 1999-10-22
    • Deepak Mahulikar
    • Deepak Mahulikar
    • C09K314
    • C09K3/1463C09G1/02
    • This invention relates to a CMP slurry system for use in semiconductor manufacturing. The slurry system comprises two parts. The first part is a generic dispersion that only contains an abrasive and, optionally, a surfactant and a stabilizing agent. The generic dispersion can be used for polishing metals as well as interlayer dielectrics (ILD). The second part is a novel activator solution comprising at least two components selected from the group consisting of: an oxidizer, acids, amines, chelating agents, fluorine-containing compounds, corrosion inhibitors, buffering agents, surfactants, biological agents and mixtures thereof.
    • 本发明涉及用于半导体制造的CMP浆料系统。 浆料系统包括两部分。 第一部分是仅含有磨料和任选的表面活性剂和稳定剂的通用分散体。 通用分散体可用于抛光金属以及层间电介质(ILD)。 第二部分是包含至少两种选自以下的组分的新型活化剂溶液:氧化剂,酸,胺,螯合剂,含氟化合物,缓蚀剂,缓冲剂,表面活性剂,生物制剂及其混合物。