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1. 发明授权

US5131755A Automatic high speed optical inspection system 失效
标题翻译：自动高速光学检测系统
公开(公告)号：US5131755A
公开(公告)日：1992-07-21
申请号：US429859
申请日：1989-10-31
申请人： Curt H. Chadwick , Robert R. Sholes , John D. Greene , Francis D. Tucker, III , Michael E. Fein , P. C. Jann , David J. Harvey , William Bell
发明人： Curt H. Chadwick , Robert R. Sholes , John D. Greene , Francis D. Tucker, III , Michael E. Fein , P. C. Jann , David J. Harvey , William Bell
IPC分类号： G06T7/00 , G01B11/30 , G01N21/88 , G01N21/89 , G01N21/93 , G01N21/956 , G01R31/309 , G01R31/311 , G06T1/00
CPC分类号： G01N21/8806 , G01N21/956 , G01N21/95607 , G01R31/309 , G01R31/311 , G01N2021/8907 , G01N2021/8908 , G01N2021/95615 , G01N2021/95638 , G01N2201/06126
摘要： In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. Each time the comparison is performed, it is noted whether or not there has been agreement between the two patterns and which two patterns where compared. This inspection technique is useful for doing die-to-die inspections. A variation of the second configuration uses two TDI sensors to simultaneously image the first and second patterns, thus eliminating the need for temporary memory. In this configuration, the two patterns are simultaneously imaged and compared, then additional patterns are compared sequentially, in the same manner with the results of the comparisons and the pattern locations stored to determine which patterns are bad when the inspection of all patterns is completed.
摘要翻译：在每个配置中，使用至少一个TDI传感器来对感兴趣的衬底部分进行成像，其中那些部分用基本上均匀的照明照亮。在一种配置中，将基底与预先存储的预期特征特征进行比较。在第二配置中，通过将一个图案与另一个图案相比较并注意它们是否彼此一致来检查至少一个基板的表面区域中的第一和第二图案。这是通过照亮两个图案，对第一图案进行成像并将其特征存储在临时存储器中，然后对第二图案进行成像并将其与来自临时存储器的存储特性进行比较来实现的。然后，相对于新的第二图案，比较继续顺序地与第二图案成为下次成像/比较序列中的第一图案。每次进行比较时，都注意到两种模式之间是否有一致，哪两种模式相比较。这种检查技术对于进行模 - 模检查是有用的。第二配置的变型使用两个TDI传感器来同时对第一和第二图案进行成像，从而消除对临时存储器的需要。在该配置中，两个图案被同时成像和比较，然后以与比较的结果相同的方式对附加图案进行比较，并且存储的图案位置以确定当所有图案的检查完成时哪些图案是不良的。

2. 发明授权

US4877326A Method and apparatus for optical inspection of substrates 失效
标题翻译：用于光学检查基板的方法和装置
公开(公告)号：US4877326A
公开(公告)日：1989-10-31
申请号：US158289
申请日：1988-02-19
申请人： Curt H. Chadwick , Robert R. Sholes , John D. Greene , Francis D. Tucker, III , Michael E. Fein , P. C. Jann , David J. Harvey , William Bell
发明人： Curt H. Chadwick , Robert R. Sholes , John D. Greene , Francis D. Tucker, III , Michael E. Fein , P. C. Jann , David J. Harvey , William Bell
IPC分类号： H05K3/00 , G01N21/88 , G01N21/89 , G01N21/93 , G01N21/956 , G01R31/311
CPC分类号： G01N21/95684 , G01N21/8806 , G01N21/956 , G01R31/311 , G01N2021/8908 , G01N2021/95638
摘要： Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others. Fourth and fifth reflectors are also included with each being flat and mounted parallel to each other and at opposite ends of each of said first, second and third reflectors, and first, second and third linear light sources each mounted parallel to a corresponding one of said first, second and third reflectors with each of the light sources mounted so that it is at the first focus of the corresponding reflector and the illuminated linear region is at the second focus of each of the first, second and third reflectors.
摘要翻译：基板检查装置及方法及照明装置。检查装置和方法包括用于存储基板的表面的期望特征的存储器，用于基本上均匀地照射待检查的基板的表面的区域的聚焦照明器。另外还有一个传感器，用于对由照明器照射的衬底的区域进行成像，以及响应于存储器和传感器的比较器，用于将衬底的成像区域与存储的衬底的期望特征进行比较。照明装置被设计成沿狭窄的线性区域提供基本均匀的聚焦照明。该装置包括椭圆形圆柱形的第一，第二和第三反射器，每个反射器的长轴基本上平行于每个反射器的长轴。还包括第四和第五反射器，每个反射器是平坦的并且彼此平行并且在每个所述第一，第二和第三反射器的相对端部安装，并且第一，第二和第三线性光源各自平行于所述第一，第一，第二和第三反射器，其中每个光源安装成使得其处于相应反射器的第一焦点，并且被照射的线性区域处于第一，第二和第三反射器中的每一个的第二焦点。

3. 外观设计

USD348419S Flag 失效
公开(公告)号：USD348419S
公开(公告)日：1994-07-05
申请号：US7376
申请日：1993-04-21
申请人： C. David J. Harvey , Tonya L. Harvey
设计人： C. David J. Harvey , Tonya L. Harvey

4. 再颁专利

USRE37740E1 Method and apparatus for optical inspection of substrates 失效
标题翻译：用于光学检查基板的方法和装置
公开(公告)号：USRE37740E1
公开(公告)日：2002-06-11
申请号：US08373084
申请日：1995-01-17
申请人： Curt H. Chadwick , Robert R. Sholes , John D. Greene , Francis D. Tucker, III , Michael E. Fein , P. C. Jann , David J. Harvey , William Bell
发明人： Curt H. Chadwick , Robert R. Sholes , John D. Greene , Francis D. Tucker, III , Michael E. Fein , P. C. Jann , David J. Harvey , William Bell
IPC分类号： G01B1130
CPC分类号： G01N21/95684 , G01N21/8806 , G01N21/956 , G01N2021/8908 , G01N2021/95638 , G01R31/311
摘要： Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others. Fourth and fifth reflectors are also included with each being flat and mounted parallel to each other and at opposite ends of each of said first, second and third reflectors, and first, second and third linear light sources each mounted parallel to a corresponding one of said first, second and third reflectors with each of the light sources mounted so that it is at the first focus of the corresponding reflector and the illuminated linear region is at the second focus of each of the first, second and third reflectors. The questions raised in reexamination request No. 90/003,232, filed Oct. 29, 1993, have been considered and the results thereof are reflected in this reissue patent which constitutes the reexamination certificate required by 35 U.S.C. 307 as provided in 37 CFR 1.570(e).
摘要翻译：基板检查装置及方法及照明装置。检查装置和方法包括用于存储基板的表面的期望特征的存储器，用于基本上均匀地照射待检查的基板的表面的区域的聚焦照明器。另外还有一个传感器，用于对由照明器照射的衬底的区域进行成像，以及响应于存储器和传感器的比较器，用于将衬底的成像区域与存储的衬底的期望特征进行比较。照明装置被设计成沿狭窄的线性区域提供基本均匀的聚焦照明。该装置包括椭圆形圆柱形的第一，第二和第三反射器，每个反射器的长轴基本上平行于每个反射器的长轴。还包括第四和第五反射器，每个反射器是平坦的并且彼此平行并且在每个所述第一，第二和第三反射器的相对端部安装，并且第一，第二和第三线性光源各自平行于所述第一，第一，第二和第三反射器，其中每个光源安装成使得其处于相应反射器的第一焦点，并且被照射的线性区域处于第一，第二和第三反射器中的每一个的第二焦点。已经考虑了1993年10月29日提交的第90 / 003,232号复审请求中提出的问题，其结果反映在该重新颁发专利中，该专利构成了35U.S.C.所要求的复审证书。 307如第37 CFR 1.570（e）条。

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