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    • 2. 发明申请
    • Water-based polymer composition and articles made therefrom
    • 水性聚合物组合物和由其制成的制品
    • US20050070659A1
    • 2005-03-31
    • US10902007
    • 2004-07-30
    • Lin Shiow-LingDavid GibalaAnthony LipplGeoffrey UnderwoodTiziana Poggio
    • Lin Shiow-LingDavid GibalaAnthony LipplGeoffrey UnderwoodTiziana Poggio
    • C08K3/00
    • C08L27/12C08L27/18C08L79/04C09D127/12C09D127/18Y10T428/3154C08L2666/20
    • The present invention relates to a water-based polymer composition, comprising: at least one polymer (P) comprising recurring units (R1), from 0 to at most 25% mol of said recurring units (R1) comprising a carboxylic acid group (in acid or salt form); at least one aromatic polyamic acid (A) comprising recurring units, more than 50% mol of said recurring units comprising at least one aromatic ring and at least one amic acid group and/or imide group [recurring units (R2)], more than 50% mol of recurring units (R2) comprising at least one amic acid group, part or all of the amic acid groups being neutralized by at least one basic compound (B); water; optionally, at least one organic solvent (S) of the aromatic polyamic acid (A), in an amount of less than 20% wt with respect to the weight of the aromatic polyamic acid. The polymer (P) is preferably a fluoropolymer; it can be either a partially fluorinated fluoropolymer, such as ECTFE, or a perfluorinated fluoropolymer such as TFE polymers. The water-based polymer compositions of this invention may be notably found useful for coating applications where organic solvents may not be desired or tolerated.
    • 本发明涉及水基聚合物组合物,其包含:至少一种包含重复单元(R1)的至少一种聚合物(P),0至至多25摩尔%的包含羧酸基团的重复单元(R1)(在 酸或盐形式); 至少一种包含重复单元的芳族聚酰胺酸(A),超过50%摩尔的所述重复单元包含至少一个芳族环和至少一个酰胺基和/或酰亚胺基[重复单元(R 2)],多于 50%摩尔的包含至少一种酰胺酸基团的重复单元(R2),部分或全部酰胺酸基团被至少一种碱性化合物(B)中和; 水; 任选地,芳族聚酰胺酸(A)的至少一种有机溶剂(S)的用量相对于芳族聚酰胺酸的重量小于20%wt。 聚合物(P)优选为含氟聚合物; 它可以是部分氟化的氟聚合物,例如ECTFE,或全氟化含氟聚合物如TFE聚合物。 本发明的水基聚合物组合物可以显着地用于可能不期望或耐受有机溶剂的涂布应用。
    • 6. 发明授权
    • Water-based polymer composition and articles made therefrom
    • 水性聚合物组合物和由其制成的制品
    • US08063135B2
    • 2011-11-22
    • US10902007
    • 2004-07-30
    • Lin Shiow-LingDavid GibalaAnthony LipplGeoffrey Scott UnderwoodTiziana Poggio
    • Lin Shiow-LingDavid GibalaAnthony LipplGeoffrey Scott UnderwoodTiziana Poggio
    • C08L79/08B32B27/28
    • C08L27/12C08L27/18C08L79/04C09D127/12C09D127/18Y10T428/3154C08L2666/20
    • The present invention relates to a water-based polymer composition, comprising: at least one polymer (P) comprising recurring units (R1), from 0 to at most 25% mol of said recurring units (R1) comprising a carboxylic acid group (in acid or salt form); at least one aromatic polyamic acid (A) comprising recurring units, more than 50% mol of said recurring units comprising at least one aromatic ring and at least one amic acid group and/or imide group [recurring units (R2)], more than 50% mol of recurring units (R2) comprising at least one amic acid group, part or all of the amic acid groups being neutralized by at least one basic compound (B); water; optionally, at least one organic solvent (S) of the aromatic polyamic acid (A), in an amount of less than 20% wt with respect to the weight of the aromatic polyamic acid. The polymer (P) is preferably a fluoropolymer; it can be either a partially fluorinated fluoropolymer, such as ECTFE, or a perfluorinated fluoropolymer such as TFE polymers.The water-based polymer compositions of this invention may be notably found useful for coating applications where organic solvents may not be desired or tolerated.
    • 本发明涉及一种水基聚合物组合物,其包含:至少一种包含重复单元(R1)的至少一种聚合物(P),0至至多25摩尔%的包含羧酸基团的重复单元(R1)(在 酸或盐形式); 至少一种包含重复单元的芳族聚酰胺酸(A),超过50%摩尔的所述重复单元包含至少一个芳族环和至少一个酰胺基和/或酰亚胺基[重复单元(R 2)],多于 50%摩尔的包含至少一种酰胺酸基团的重复单元(R2),部分或全部酰胺酸基团被至少一种碱性化合物(B)中和; 水; 任选地,芳族聚酰胺酸(A)的至少一种有机溶剂(S)的用量相对于芳族聚酰胺酸的重量小于20%wt。 聚合物(P)优选为含氟聚合物; 它可以是部分氟化的氟聚合物,例如ECTFE,或全氟化含氟聚合物如TFE聚合物。 本发明的水基聚合物组合物可以显着地用于可能不期望或耐受有机溶剂的涂布应用。