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    • 2. 发明授权
    • Phosphoric acid ester surface modifiers for silver carboxylate nanoparticles
    • 用于银羧酸盐纳米粒子的磷酸酯表面改性剂
    • US06387611B2
    • 2002-05-14
    • US09764665
    • 2001-01-18
    • Mark LelentalDavid A. DickinsonJames L. WakleyMichael W. OremPeter J. Ghyzel
    • Mark LelentalDavid A. DickinsonJames L. WakleyMichael W. OremPeter J. Ghyzel
    • G03C1498
    • G03C1/498G03C1/49809G03C1/4989
    • There is disclosed an oxidation-reduction imaging forming composition comprising an aqueous based dispersion of (i) nanoparticulate silver carboxylate particles having on the surface of the particles a surface modifier which is a phosphoric acid ester and (ii) an organic reducing agent. In particular, the surface modifiers can be mixtures of mono- and di-esters of orthophosphoric acid and hydroxyl-terminated, oxyethylated long-chain alcohols or oxyethylated alkyl phenols or derivatives thereof. Also disclosed are various compositions including the dispersions including oxidation-reduction imaging forming compositions, thermographic elements and photothermographic compositions and elements. The preferred carboxylate is a silver salt of a long chain fatty acid such as silver behenate. A media milling method and a controlled precipitation method of making the dispersions are also disclosed
    • 公开了一种氧化还原成像组合物,其包含(i)纳米颗粒状羧酸银颗粒的水性分散体,其在颗粒表面上具有作为磷酸酯的表面改性剂和(ii)有机还原剂。 特别地,表面改性剂可以是正磷酸和羟基封端的羟乙基化长链醇或羟乙基化烷基酚或其衍生物的单酯和二酯的混合物。 还公开了包括包括氧化还原成像组合物,热成像元件和光热成像组合物和元素的分散体的各种组合物。 优选的羧酸酯是长链脂肪酸的银盐,例如山嵛酸银。 还公开了制备分散体的介质研磨方法和受控沉淀法
    • 10. 发明授权
    • Photographic elements containing release compounds
    • 含有释放化合物的摄影元素
    • US6150077A
    • 2000-11-21
    • US60802
    • 1998-04-15
    • J. Ramon VargasDavid A. Dickinson
    • J. Ramon VargasDavid A. Dickinson
    • G03C1/43G03C7/30G03C7/305G03C1/34
    • G03C7/30511G03C7/30Y10S430/156Y10S430/158Y10S430/16
    • Photographic elements are provided which contain a compound having the formula:R.sup.1 --NH--(Q).sub.m --C(R.sup.2)(R.sup.3)--(TIME).sub.n -PAMwherein: R.sup.1 is an electron withdrawing moiety; Q is a group comprising a conjugated system; m is 0 or 1, and when m=1, --NH--Q--C(R.sup.2)(R.sup.3)-- is a timing or linking group which undergoes electron migration along a conjugated system to cause a cleavage reaction; TIME is a timing or linking group; n is 0, 1, 2 or 3, preferably 0 or 1; PAM is a photographically active moiety; and R.sup.2 and R.sup.3 are independently hydrogen, susbtituted or unsubstituted alkyl, aryl, heteroaryl, alkenyl, or alkynyl groups, can be combined with R.sup.1 to form a ring, or can combine together to form a ring, with the proviso R.sup.2 and R.sup.3 cannot together form a double bond with another atom and neither R.sup.2 nor R.sup.3 can be selected from RO--, RS--, R.sub.2 N--, or RSe-- where R represents any substituent. Photographic elements comprising the novel blocked image-modifying compounds of the present invention provide for the opportunity to specifically control the strength and location of image modification. They are also useful when incorporated in oligomeric or other polymeric species. Further, when such compounds unblock to fonn development inhibitors, excellent control of push processing, control of fog development, and control of specific layer developability can be obtained. These three applications can be realized by controlling the release rates. To control push processing, steady release upon extended processing is desirable; for control of fog development, gradual release during keeping is desirable; and for control of specific layer developability, rapid release upon processing is desirable.
    • 提供了含有下列化学式的化合物的摄影元件:R1-NH-(Q)m-C(R2)(R3) - (TIME)n-PAM其中:R1是吸电子部分; Q是包含共轭体系的基团; m为0或1,当m = 1时,-NH-Q-C(R2)(R3) - 是沿着共轭体系发生电子迁移以引起裂解反应的定时或连接基团; TIME是一个时间或连接组; n为0,1,2或3,优选0或1; PAM是摄影活性部分; 并且R2和R3独立地是氢,取代或未取代的烷基,芳基,杂芳基,烯基或炔基可与R 1结合形成环,或者可以结合在一起形成环,条件是R 2和R 3不能一起 与另一个原子形成双键,R2和R3都不能选自RO-,RS-,R2N-或RSe-,其中R表示任何取代基。 包含本发明的新型阻塞图像修饰化合物的照相元件提供了专门控制图像修饰的强度和位置的机会。 当掺入低聚物或其他聚合物种时,它们也是有用的。 此外,当这些化合物阻断开发抑制剂时,可以获得优异的推压加工控制,雾化发展的控制和特定层显影性的控制。 这三个应用可以通过控制释放速率来实现。 为了控制推动处理,期望在延长处理时稳定地释放; 为了控制雾的发展,保持逐渐释放是可取的; 并且为了控制特定层显影性,期望在加工时快速释放。