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    • 2. 发明申请
    • Diagnostic plasma measurement device having patterned sensors and features
    • 具有图案化传感器和特征的诊断等离子体测量装置
    • US20050284570A1
    • 2005-12-29
    • US10875954
    • 2004-06-24
    • Daniel DoranLeonard MahoneySteven RobertsGregory Roche
    • Daniel DoranLeonard MahoneySteven RobertsGregory Roche
    • C23F1/00C23F4/00G01L21/30H01J37/32
    • C23F4/00H01J37/32935
    • A diagnostic plasma measurement device is provided having sensors and features disposed using pattern transfer fabrication techniques. A measurement device comprises a primary substrate with sensors for measuring plasma or surface properties disposed by a stepped pattern transfer technique, such as step-and-repeat photolithography, about the surface of the probe. Sensor fields include sensors that measure physical and electrical properties of a plasma, as well as sensors that measure properties of the wafer surface. Fields or components for processing electronics, electrical interconnections, memory, photovoltaic power, and wireless communication are also provided. By utilizing pattern transfer fabrication techniques, the invention generally provides for reduced risks of contamination of a plasma processing environment and increased manufacturability and reliability of the completed sensor device.
    • 提供诊断等离子体测量装置,其具有使用图案转移制造技术设置的传感器和特征。 测量装置包括具有传感器的初级衬底,该传感器用于通过阶梯式图案转移技术(诸如分步重复光刻法)围绕探针的表面测量等离子体或表面性质。 传感器领域包括测量等离子体的物理和电学特性的传感器以及测量晶片表面性质的传感器。 还提供了用于处理电子,电互连,存储器,光伏电力和无线通信的领域或组件。 通过利用图案转移制造技术,本发明通常提供降低等离子体处理环境的污染风险,并提高完整的传感器装置的可制造性和可靠性。