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1. 发明申请

WO2012031765A2 METHOD FOR OPERATING A PROJECTION EXPOSURE TOOL AND CONTROL APPARATUS 审中-公开
标题翻译：投影曝光工具和控制装置的操作方法
公开(公告)号：WO2012031765A2
公开(公告)日：2012-03-15
申请号：PCT/EP2011/004535
申请日：2011-09-08
申请人： CARL ZEISS SMT GMBH , GERHARD, Michael , DÖRBRAND, Bernd , GRUNER, Toralf
发明人： GERHARD, Michael , DÖRBRAND, Bernd , GRUNER, Toralf
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70266 , G03F7/706 , G03F7/70833 , G03F7/70891
摘要： A method for operating a projection exposure tool (10) for microlithography is provided. The projection exposure tool (10) comprises an optical system (24; 18) which comprises a number of optical elements (26) which, during an imaging process, convey electromagnetic radiation (16, 16a, 16b, 16c), all of the surfaces of the optical elements (26) interacting with the electromagnetic radiation (16) during the imaging process forming an overall optical surface of the optical system (24; 18). The method comprises the steps: determining respective individual thermal expansion coefficients (52) at at least two different locations of the overall optical surface, calculating a change to an optical property of the optical system (24; 18) brought about by heat emission of the electromagnetic radiation (16, 16a, 16b, 16c) during the imaging process upon the basis of the thermal expansion coefficients (52), and imaging mask structures into an image plane (34) by means of the projection exposure tool (10) with adaptation of the imaging characteristics of the projection exposure tool (10) such that the calculated change to the optical property is at least partially compensated.
摘要翻译：提供了一种用于操作用于微光刻的投影曝光工具（10）的方法。投影曝光工具（10）包括光学系统（24; 18），该光学系统包括多个光学元件（26），其在成像过程期间传送电磁辐射（16,16a，16b，16c），所有表面的光学元件（26）在成像过程中与电磁辐射（16）相互作用，形成光学系统（24; 18）的整个光学表面。该方法包括以下步骤：确定在整个光学表面的至少两个不同位置处的各自的热膨胀系数（52），计算由所述光学系统的热发射引起的光学系统（24; 18）的光学特性的变化基于热膨胀系数（52）在成像过程期间的电磁辐射（16,16a，16b，16c），以及借助于具有适应性的投影曝光工具（10）将掩模结构成像到图像平面（34）的投影曝光工具（10）的成像特性，使得计算出的对光学特性的改变至少部分地被补偿。

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