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    • 4. 发明申请
    • LCD PANEL
    • 液晶面板
    • US20080246902A1
    • 2008-10-09
    • US12099166
    • 2008-04-08
    • Chu-Liang Cheng
    • Chu-Liang Cheng
    • G02F1/13357
    • G02F1/133617G02F1/133512
    • A LCD panel is provided. The LCD panel includes a front substrate, a plurality of first phosphor composites, a plurality of second phosphor composites, a black matrix, a transparent electrode, a TFT array substrate and a liquid crystal layer. The liquid crystal layer is sandwiched between the front substrate and the TFT array substrate. The first phosphor composites, the second phosphor composites, the black matrix and the transparent electrode are disposed on the front substrate. The black matrix divides the front substrate into three windows including first windows, second windows and third windows periodically, wherein the first phosphor composites are disposed on the first windows, and the second phosphor composites are disposed on the second windows. The first phosphor composites and the second phosphor composites are capable of converting the primary light shinning towards the LCD panel into different colors respectively.
    • 提供LCD面板。 LCD面板包括前基板,多个第一磷光体复合体,多个第二磷光体复合体,黑矩阵,透明电极,TFT阵列基板和液晶层。 液晶层夹在前基板和TFT阵列基板之间。 第一磷光体复合物,第二磷光体复合物,黑色矩阵和透明电极设置在前基板上。 黑色矩阵将前基板分为三个窗口,包括第一窗口,第二窗口和第三窗口,其中第一荧光体复合材料设置在第一窗口上,第二荧光体复合材料设置在第二窗口上。 第一种磷光体复合材料和第二种磷光体复合材料能够将初级光线朝着LCD面板分别转换成不同的颜色。
    • 8. 发明授权
    • Vertical Enhancement-mode Group III-V compound MISFETs
    • 垂直增强型III-V族复合MISFET
    • US4755867A
    • 1988-07-05
    • US896772
    • 1986-08-15
    • Chu-Liang Cheng
    • Chu-Liang Cheng
    • H01L21/336H01L29/12H01L29/51H01L29/78
    • H01L29/66522H01L29/51H01L29/7827
    • A vertical, enhancement mode InP MISFET includes a conducting n-type substrate, a semi-insulating Fe-doped InP blocking layer on the substrate, a conducting layer formed in the blocking layer, a groove which extends through both the conducting layer and the blocking layer, a borosilicate dielectric layer formed on the walls of the groove, a gate electrode formed on the dielectric layer, drain electrodes formed on each side of the gate electrode, and a source electrode formed on the bottom of the substrate. When a positive gate voltage relative to the source is applied, conduction channels are formed along the sidewalls of the groove, and current flows vertically from drain to source.
    • 垂直增强型InP MISFET包括导电n型衬底,在衬底上的半绝缘Fe掺杂InP阻挡层,形成在阻挡层中的导电层,延伸穿过导电层和阻挡层的沟槽 形成在槽的壁上的硼硅酸盐介电层,形成在电介质层上的栅电极,形成在栅电极的每一侧的漏电极和形成在基板的底部上的源电极。 当施加相对于源极的正栅极电压时,沿着沟槽的侧壁形成导电沟道,并且电流从漏极到源极垂直流动。