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    • 2. 发明授权
    • Thermal-chemical polishing device and method thereof
    • 热化学抛光装置及其方法
    • US06739946B1
    • 2004-05-25
    • US10444979
    • 2003-05-27
    • Choung-Lii ChaoKung-Jeng MaHung-Yi Lin
    • Choung-Lii ChaoKung-Jeng MaHung-Yi Lin
    • B24B4900
    • B24B37/20B24B37/015B24B37/042
    • A thermal-chemical polishing device and method for polishing a diamond film of a workpiece, the device includes a horizontally displaced first rotatable high rpm shaft and a vertically displaced second rotatable high rpm shaft that are perpendicular. The first shaft is made of a material from transition metals or rare-earth elements which undergo a chemical reaction with the diamond film at high temperature. The circumferential surface of the first shaft has a predefined heating region. The second shaft moves axially towards the first shaft to allow the diamond film to make contact with the heating region of the first shaft. A heating unit is provided to heat up the heating region to create a chemical reaction for thermal-chemical polishing to perform while the diamond film is in contact with the heating region. The device of the present invention increases the rate of polishing and also decreases cost.
    • 一种用于抛光工件的金刚石膜的热化学抛光装置和方法,该装置包括垂直于水平位移的第一可旋转高rpm轴和垂直移位的第二可旋转高rpm轴。 第一轴由过渡金属或稀土元素的材料制成,与金刚石膜在高温下发生化学反应。 第一轴的圆周表面具有预定的加热区域。 第二轴轴向移动朝向第一轴,以允许金刚石膜与第一轴的加热区域接触。 提供加热单元以加热加热区域,以在金刚石膜与加热区域接触的同时产生用于热化学抛光的化学反应。 本发明的装置增加了抛光速度并降低了成本。