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1. 发明授权

US08520217B2 Talbot interferometer, its adjustment method, and measurement method 有权
标题翻译： Talbot干涉仪，其调整方法和测量方法
公开(公告)号：US08520217B2
公开(公告)日：2013-08-27
申请号：US12765037
申请日：2010-04-22
申请人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
发明人： Toshiyuki Naoi , Seima Kato , Naoki Kohara , Chidane Ouchi
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G01B9/02097 , G01B9/02024 , G01B2290/30
摘要： A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.
摘要翻译： Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个衍射光栅中的一个和使用移动单元的图像拾取装置。

2. 发明申请

US20130070895A1 X-RAY IMAGING APPARATUS 有权
标题翻译： X射线成像装置
公开(公告)号：US20130070895A1
公开(公告)日：2013-03-21
申请号：US13610365
申请日：2012-09-11
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G01N23/04
CPC分类号： G01N23/04 , A61B6/484 , G01N2223/313 , G01N2223/3301
摘要： An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis.
摘要翻译：用于成像对象的X射线成像装置包括被构造成通过衍射来自X射线源的X射线辐射而形成干涉图案的衍射光栅，被配置为屏蔽部分干涉图案的屏蔽光栅，被配置为检测穿过屏蔽光栅的X射线辐射，以及被配置为改变每个衍射光栅，屏蔽光栅和检测器之间的角度和光轴的移动单元，其中检测器被配置为根据涉及每个衍射光栅，屏蔽光栅和检测器之间的角度以及光轴的变化。

3. 发明申请

US20120236988A1 X-RAY IMAGING APPARATUS 有权
标题翻译： X射线成像装置
公开(公告)号：US20120236988A1
公开(公告)日：2012-09-20
申请号：US13416339
申请日：2012-03-09
申请人： Toru Den , Kimiaki Yamaguchi , Chidane Ouchi
发明人： Toru Den , Kimiaki Yamaguchi , Chidane Ouchi
IPC分类号： G01N23/04
CPC分类号： G21K1/067 , A61B6/484 , G01N23/046 , G01N23/20075 , G01N2223/419 , G21K2207/005
摘要： An X-ray imaging apparatus comprises a grating configured to form an interference pattern by diffracting X-rays from an X-ray source, a amplitude grating configured to partly shield X-rays forming the interference pattern, and an X-ray detector configured to detect an intensity distribution of X-rays from the amplitude grating. The amplitude grating is comprised of a central area and a peripheral area and the peripheral area shows an X-ray transmittance higher than the central area relative to X-rays perpendicularly entering the amplitude grating.
摘要翻译：一种X射线摄像装置，其特征在于，包括：被配置为通过衍射来自X射线源的X射线形成干涉图案的光栅;被配置为部分地屏蔽形成所述干涉图案的X射线的振幅光栅;以及X射线检测器，检测来自幅度光栅的X射线的强度分布。振幅光栅由中心区域和外围区域组成，周边区域相对于垂直进入振幅光栅的X射线，显示高于中心区域的X射线透射率。

4. 发明授权

US08009797B2 X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program 有权
标题翻译： X射线成像装置，X射线成像方法和X射线成像程序
公开(公告)号：US08009797B2
公开(公告)日：2011-08-30
申请号：US12842937
申请日：2010-07-23
申请人： Chidane Ouchi , Kentaro Nagai , Toru Den , Hidenosuke Itoh
发明人： Chidane Ouchi , Kentaro Nagai , Toru Den , Hidenosuke Itoh
IPC分类号： G03H5/00
CPC分类号： G06T7/0002 , A61B6/4291 , A61B6/484 , G01J9/02 , G01N23/04 , G01N23/20075 , G01N2223/401 , G21K1/06 , G21K2201/06 , G21K2201/067
摘要： An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.
摘要翻译： X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

5. 发明申请

US20100290590A1 X-RAY IMAGING APPARATUS, X-RAY IMAGING METHOD, AND X-RAY IMAGING PROGRAM 有权
标题翻译： X射线成像装置，X射线成像方法和X射线成像程序
公开(公告)号：US20100290590A1
公开(公告)日：2010-11-18
申请号：US12842937
申请日：2010-07-23
申请人： Chidane Ouchi , Kentaro Nagai , Toru Den , Hidenosuke Itoh
发明人： Chidane Ouchi , Kentaro Nagai , Toru Den , Hidenosuke Itoh
IPC分类号： G01N23/04
CPC分类号： G06T7/0002 , A61B6/4291 , A61B6/484 , G01J9/02 , G01N23/04 , G01N23/20075 , G01N2223/401 , G21K1/06 , G21K2201/06 , G21K2201/067
摘要： An X-ray imaging apparatus includes a phase grating, an absorption grating, a detector, and an arithmetic unit. The arithmetic unit executes a Fourier transform step of performing Fourier transform for an intensity distribution of a Moiré acquired by the detector, and acquiring a spatial frequency spectrum. Also, the arithmetic unit executes a phase retrieval step of separating a spectrum corresponding to a carrier frequency from a spatial frequency spectrum acquired in the Fourier transform step, performing inverse Fourier transform for the separated spectrum, and acquiring a differential phase image.
摘要翻译： X射线成像装置包括相位光栅，吸收光栅，检测器和运算单元。算术单元执行对由检测器获取的莫尔的强度分布执行傅里叶变换并获取空间频谱的傅里叶变换步骤。此外，运算单元执行相位检索步骤，从傅里叶变换步骤中获取的空间频谱中分离出与载波频率对应的频谱，对分离的频谱进行傅里叶逆变换，获取差分相位图像。

6. 发明申请

US20050117168A1 Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method 失效
标题翻译：使用剪切干涉测量的测量方法和装置，使用其的曝光方法和装置以及装置制造方法
公开(公告)号：US20050117168A1
公开(公告)日：2005-06-02
申请号：US10994331
申请日：2004-11-23
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G21K1/06 , G01B9/02 , G01J9/02 , G01M11/02 , G03F7/20 , G21K5/00 , G21K5/02 , H01L21/027
CPC分类号： G03F7/706 , G01J9/0215 , G03F7/70266
摘要： A measuring method for measuring wave front of light, which passed through a target optical system includes the steps of, generating an interference fringe using a shearing interference with light that passes a target optical system, calculating a differential wave front between a first wave front of the light that passes the target optical system and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction, and correcting the differential wave front based on the predetermined amount and the wave number in the predetermined direction.
摘要翻译：用于测量通过目标光学系统的光的前端的测量方法包括以下步骤：利用通过目标光学系统的光的剪切干涉产生干涉条纹，计算第一波前的差分波前通过目标光学系统的光和通过在预定方向上将第一波前偏移预定量而形成的第二波前，并且基于预定量和预定方向上的波数来校正差分波前。

7. 发明授权

US06661522B2 Interference system and semiconductor exposure apparatus having the same 失效
标题翻译：干涉系统和具有相同的半导体曝光装置
公开(公告)号：US06661522B2
公开(公告)日：2003-12-09
申请号：US09893636
申请日：2001-06-29
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G01B1102
CPC分类号： G03F7/706 , G01B9/02057 , G01B9/02065 , G01J9/02
摘要： Disclosed is a Fizeau interference system for causing interference between reflection lights from a reflection surface and a semi-transmission surface, respectively, disposed along one and the same optical axis. The interference system includes a light source, an optical path difference applying optical system for dividing light from the light source into two lights and for re-combining them, and an interference optical system for causing reflection of the two lights passed through the optical path difference applying optical system, at corresponding one of the reflection surface and the semi-transmission surface, and to cause interference of them, wherein a difference &Dgr;F in optical path length of the light reflected by the reflection surface and with respect to the light reflected by the semi-transmission surface satisfies a relation |&Dgr;D−&Dgr;F|
摘要翻译：公开了一种Fizeau干涉系统，用于分别沿着同一个光轴设置来自反射面和半透射面的反射光之间的干涉。干涉系统包括光源，用于将来自光源的光分为两个光并用于重新组合的光路差分施加光学系统，以及用于使通过光程差的两个光的反射的干涉光学系统在相应的一个反射面和半透射面上施加光学系统，并引起它们的干涉，其中由反射面反射的光和相对于由反射面反射的光的光路长度的差ΔF 半透射面满足关系| DeltaD-ΔF| <ΔL，其中由光程差应用光学系统DeltaD应用的两个光之间的光程差ΔD和来自光源的光的相干长度为ΔL 。

8. 发明授权

US09063055B2 X-ray imaging apparatus 有权
标题翻译： X射线成像装置
公开(公告)号：US09063055B2
公开(公告)日：2015-06-23
申请号：US13610365
申请日：2012-09-11
申请人： Chidane Ouchi
发明人： Chidane Ouchi
IPC分类号： G01N23/04 , A61B6/00
CPC分类号： G01N23/04 , A61B6/484 , G01N2223/313 , G01N2223/3301
摘要： An X-ray imaging apparatus for imaging a subject includes a diffraction grating configured to form an interference pattern by diffracting X-ray radiation from an X-ray source, a shielding grating configured to shield part of the interference pattern, a detector configured to detect the X-ray radiation passing through the shielding grating, and a moving unit configured to change an angle between each of the diffraction grating, the shielding grating and the detector and an optical axis, wherein the detector is configured to detect the X-ray according to a change in the angle between each of the diffraction grating, the shielding grating and the detector and the optical axis.
摘要翻译：用于成像对象的X射线成像装置包括被构造成通过衍射来自X射线源的X射线辐射而形成干涉图案的衍射光栅，被配置为屏蔽部分干涉图案的屏蔽光栅，被配置为检测穿过屏蔽光栅的X射线辐射，以及被配置为改变每个衍射光栅，屏蔽光栅和检测器之间的角度和光轴的移动单元，其中检测器被配置为根据涉及每个衍射光栅，屏蔽光栅和检测器之间的角度以及光轴的变化。

9. 发明授权

US09043182B2 Absolute position measurement apparatus and method 有权
标题翻译：绝对位置测量装置及方法
公开(公告)号：US09043182B2
公开(公告)日：2015-05-26
申请号：US12676002
申请日：2008-11-18
申请人： Yuzo Seo , Chidane Ouchi , Takao Ukaji
发明人： Yuzo Seo , Chidane Ouchi , Takao Ukaji
IPC分类号： G01C9/00 , G01B9/02
CPC分类号： G01B9/02083 , G01B9/02007 , G01B2290/70
摘要： An absolute position measurement apparatus measures an absolute position of an object to be measured using a first light source and a second light source which has coherency lower than that of the first light source. The absolute position measurement apparatus includes a measurement part which measures a point where phases of interference signals from the first and the second light sources coincide with each other or a point where an intensity of the interference signal from the second light source is maximized, an origin defining part which defines the point measured by the measurement part as an origin position, a phase storing part which stores the phase of the interference signal from the first light source at the origin position, an origin redefining part which redefines the origin position, and a position calculating part which calculates the absolute position of the object to be measured.
摘要翻译：绝对位置测量装置使用具有低于第一光源的相干性的第一光源和第二光源来测量被测量物体的绝对位置。绝对位置测量装置包括测量部分，其测量来自第一和第二光源的干扰信号的相位彼此一致的点或来自第二光源的干扰信号的强度最大化的点，原点将由测量部分测量的点定义为原点位置的定义部分，存储来自第一光源的干涉信号在原点位置的相位的相位存储部分，重新定义原点位置的原点重新定义部分，以及位置计算部，其计算被测量物体的绝对位置。

10. 发明授权

US08077391B2 Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method 失效
标题翻译：波前像差测量方法，掩模，波前像差测量装置，曝光装置和装置制造方法
公开(公告)号：US08077391B2
公开(公告)日：2011-12-13
申请号：US12391918
申请日：2009-02-24
申请人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
发明人： Chidane Ouchi , Masanobu Hasegawa , Seima Kato
IPC分类号： G02B5/18 , G01B9/02
CPC分类号： G03F7/706 , G03F1/44
摘要： A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.
摘要翻译：一种波前像差测量装置，包括放置在被测试光学系统的物平面中的掩模，并且具有包括产生球面波的针孔和相邻衍射光栅的图案，每个衍射光栅以与另一个不同的方向定向的线划分; 照明光学系统，其利用从光源发射的光照射所述掩模的区域; 分光器，其将来自透过待测光学系统的图案的光分离; 摄像单元，拍摄由分光产生的干涉条纹的图像，该图像用于测量待测光学系统的波前像差; 检测器，其检测来自各个被照射的衍射光栅的各个衍射光束的各个光量; 以及控制单元，其根据检测结果控制掩模的照明区域和图案的对准。

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