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    • 1. 发明授权
    • Circuit structure and manufacturing method thereof
    • 电路结构及其制造方法
    • US08987608B2
    • 2015-03-24
    • US13615722
    • 2012-09-14
    • Shang-Feng HuangCheng-Po YuJen-Chi Cheng
    • Shang-Feng HuangCheng-Po YuJen-Chi Cheng
    • H05K1/11H05K1/02H05K3/46
    • H05K1/0221H05K3/4644Y10T29/49155
    • A circuit structure includes an inner circuit layer, a first and a second dielectric layers, a first and a second conductive material layers, and a second and a third conductive layers. The first dielectric layer covers a first conductive layer of the inner circuit layer and has a first surface and first circuit grooves. The first conductive material layer is disposed inside the first circuit grooves. The second conductive layer is disposed on the first surface and includes a signal trace and at least two reference traces. The second dielectric layer covers the first surface and the second conductive layer and has a second surface and second circuit grooves. Widths of the first and the second circuit grooves are smaller than that of the reference traces. The second conductive material layer is disposed inside the second circuit grooves. The third conductive layer is disposed on the second surface.
    • 电路结构包括内部电路层,第一和第二电介质层,第一和第二导电材料层以及第二和第三导电层。 第一电介质层覆盖内电路层的第一导电层,并具有第一表面和第一电路槽。 第一导电材料层设置在第一电路槽的内部。 第二导电层设置在第一表面上并且包括信号迹线和至少两个参考迹线。 第二电介质层覆盖第一表面和第二导电层,并具有第二表面和第二电路槽。 第一和第二电路槽的宽度小于参考轨迹的宽度。 第二导电材料层设置在第二电路槽的内部。 第三导电层设置在第二表面上。
    • 3. 发明授权
    • Embedded wiring board and method for manufacturing the same
    • 嵌入式布线板及其制造方法
    • US08373071B2
    • 2013-02-12
    • US12696629
    • 2010-01-29
    • Cheng-Po YuChai-Liang Hsu
    • Cheng-Po YuChai-Liang Hsu
    • H05K1/00
    • H05K3/107H05K3/181H05K3/422H05K2201/0376
    • A method for manufacturing an embedded wiring board is provided. An activating insulation layer is formed, in which the activating insulation layer includes a plurality of catalyst particles, and covers a first wiring layer. An intaglio pattern and at least one blind via partially exposing the first wiring layer are formed on the activating insulation layer, in which some of the catalyst particles are activated and exposed in the intaglio pattern and the blind via. The activating insulation layer is dipped in a first chemical plating solution, and a solid conductive pillar is formed in the blind via through electroless plating. The activating insulation layer is dipped in a second chemical plating solution after the solid conductive pillar is formed, and a second wiring layer is formed in the intaglio pattern through the electroless plating. Components of the first chemical plating solution and the second chemical plating solution are different.
    • 提供了一种用于制造嵌入式布线板的方法。 形成激活绝缘层,其中活化绝缘层包括多个催化剂颗粒,并覆盖第一布线层。 在活化绝缘层上形成凹版图案和部分露出第一布线层的至少一个盲孔,其中一些催化剂颗粒被活化并以凹版图案和盲孔曝光。 将激活绝缘层浸入第一化学镀溶液中,并通过化学镀在盲孔中形成固体导电柱。 在形成固体导电柱之后,将激活绝缘层浸入第二化学镀溶液中,并且通过无电解电镀在凹版图案中形成第二布线层。 第一化学镀液和第二化学镀液的成分不同。