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1. 发明授权

US5667920A Process for preparing a color filter 失效
标题翻译：制备滤色片的方法
公开(公告)号：US5667920A
公开(公告)日：1997-09-16
申请号：US613849
申请日：1996-03-11
申请人： Carl A. Chiulli , John E. MacLatchy , Harris R. Miller
发明人： Carl A. Chiulli , John E. MacLatchy , Harris R. Miller
IPC分类号： G03F7/004 , G02B5/20 , G03F7/00 , G03F7/26 , G03F7/38 , G03F7/40 , G02F1/1335
CPC分类号： G03F7/0007 , G03F7/405
摘要： A substrate (typically a solid state imager or a liquid crystal display device) is provided with a filter by forming a layer of photoresist on the substrate, and exposing and developing the photoresist to produce filter elements from the portions of the layer of photoresist remaining after the development. After development of the layer of photoresist, the substrate is treated with a silylation compound capable of cross-linking the photoresist and of promoting adhesion of the photoresist to the substrate. A preferred silylation compound is hexamethylcyclotrisilizane.
摘要翻译：基板（通常为固态成像器或液晶显示装置）通过在基板上形成光致抗蚀剂层而设置有滤光器，并且曝光和显影光致抗蚀剂以从光致抗蚀剂层的部分剩余的部分产生滤光元件的发展。在光致抗蚀剂层开发之后，用能够交联光致抗蚀剂并促进光致抗蚀剂与基材的粘合的甲硅烷化化合物处理基板。优选的甲硅烷基化合物是六甲基环三硅氮烷。

2. 发明授权

US4808501A Method for manufacturing an optical filter 失效
标题翻译：光学滤波器的制造方法
公开(公告)号：US4808501A
公开(公告)日：1989-02-28
申请号：US50743
申请日：1987-05-15
申请人： Carl A. Chiulli
发明人： Carl A. Chiulli
IPC分类号： G03F7/00 , H01L31/0216 , G03F9/00
CPC分类号： H01L31/02162 , G03F7/0007 , G03F7/0035
摘要： A color filter is formed on a support, such as a charge coupled device, by (a) forming a layer on a support with a composition comprising a positive photoresist and a dye; said dye being soluble in the solvent of said photoresist; (b) exposing predetermined portions of said layer to radiation adapted to increase the solubility of said coating in the exposed areas; (c) developing said exposed areas to form a pattern of filter elements; and (d) repeating said steps with a different color dye in said composition; wherein said dye constitutes in excess of 10% by weight, dry basis of said composition, is substantially non-absorptive in the exposure wavelength of said composition, and provides predetermined absorptive characteristics for the specified filter element and said dye possessing substantially the same polarity as said composition.

3. 发明授权

US5652612A Apparatus and method for enhancing printing efficiency to reduce artifacts 失效
标题翻译：用于提高打印效率以减少伪影的装置和方法
公开(公告)号：US5652612A
公开(公告)日：1997-07-29
申请号：US599871
申请日：1996-02-12
申请人： Carl A. Chiulli , Yalan Mao , William T. Plummer
发明人： Carl A. Chiulli , Yalan Mao , William T. Plummer
IPC分类号： B41J2/44 , H04N1/04 , H04N1/06 , H04N1/23 , B41J2/47 , G01D15/34 , G02B26/00 , G02B27/00
CPC分类号： H04N1/0635 , B41J2/442 , H04N1/04 , H04N1/0607 , H04N1/23
摘要： Apparatus and methods for exposing multilayered thermal imaging by proper optimization of the exposing radiation angle of incidence of a coherent radiation source to eliminate "cloud" or "woodgrain" artifacts stemming from local differences in printing efficiency across a sheet of the multilayered imaging media. A media is mounted to an exposure surface and exposed with a scanning coherent Gaussian laser beam at an angle other than normal incidence. The angle of incidence of the exposing beam is intentionally made large enough so that all rays with high reflectance loss are paired with equally many with low reflectance loss to increase printing efficiency. This efficiency occurs over a range of angles between 21 and 25 degrees, with some benefit beginning at 16 degrees.
摘要翻译：通过适当优化相干辐射源的暴露辐射入射角来消除多层热成像的装置和方法，以消除由多层成像介质片上的印刷效率的局部差异引起的“云”或“木纹”伪影。将介质安装到曝光表面并以除正常入射之外的角度以扫描相干高斯激光束曝光。有意地使曝光光束的入射角变得足够大，使得具有高反射率损失的所有光线与低反射率损失相同地配对，以提高打印效率。这种效率发生在21到25度之间的角度范围内，从16度开始有一些好处。

4. 发明授权

US5137844A Process to adjust output of light emitters 失效
标题翻译：调整发光体输出的过程
公开(公告)号：US5137844A
公开(公告)日：1992-08-11
申请号：US681146
申请日：1991-04-05
申请人： Carl A. Chiulli
发明人： Carl A. Chiulli
IPC分类号： H01L33/00 , H01L33/44 , H01S5/028 , H01S5/40
CPC分类号： H01L33/44 , H01L33/005 , H01S5/028 , H01S5/4031 , Y10S148/093 , Y10S148/099
摘要： The electromagnetic radiation output from a solid-state radiation emitter is adjusted by covering at least part of the emission surface with an absorber material which absorbs the radiation emitted from the emitter, and directing a beam of radiation from outside the radiation emitter on to the absorber material so as to ablate at least part of the absorber material from the emission surface, or render at least part of the absorber material transmissive of the electromagnetic radiation from the emitter. The process is especially useful for equalizing the outputs from an array of emitters, such as a bar of light emitting diodes.
摘要翻译：通过用吸收从发射器发射的辐射的吸收材料覆盖至少部分发射表面并将辐射束从辐射发射器外部引导到吸收体上来调节从固态辐射发射器输出的电磁辐射材料，以便从发射表面烧蚀吸收材料的至少一部分，或使吸收材料的至少一部分透射来自发射体的电磁辐射。该过程对于均衡发射器阵列（例如一排发光二极管）的输出特别有用。

5. 发明授权

US06485839B1 Ablation enhancement layer 有权
公开(公告)号：US06485839B1
公开(公告)日：2002-11-26
申请号：US09570074
申请日：2000-05-12
申请人： Pradnya V. Nagarkar , James T. Richard , Linda S. Heath , Carl A. Chiulli , Radha Sen , Jyothsna Ram , David W. McCarthy
发明人： Pradnya V. Nagarkar , James T. Richard , Linda S. Heath , Carl A. Chiulli , Radha Sen , Jyothsna Ram , David W. McCarthy
IPC分类号： B32B1508
CPC分类号： G02F1/13439 , B41M5/24 , Y10T428/31692
摘要： An ablatable laminar imaging medium useful in the manufacture of a substantially transparent electrode assembly is disclosed. The laminar imaging medium comprises a substrate, a high-index metal oxide layer, an ablatable metallic conductive layer, a high-index conductive metal oxide layer, and an ablation enhancement layer. The ablation enhancement layer has an IR-absorption greater than the IR-absorption of said high-index conductive metal oxide layer and an IR-reflectivity less than the IR-reflectivity of said high-index conductive metal oxide layer. Presence in the laminar imaging medium of the ablation enhancement layer lowers the exposure threshold of the medium and improves ablation accuracy, both—when occasioned in the manufacture of LCD electrode patterns—resulting collectively and ultimately in a more reliably formed electrical architecture, less susceptible to unwanted “shorting”.

6. 发明授权

US5900902A Apparatus and method for enhancing printing efficiency to reduce artifacts 失效
标题翻译：用于提高打印效率以减少伪影的装置和方法
公开(公告)号：US5900902A
公开(公告)日：1999-05-04
申请号：US901707
申请日：1997-07-28
申请人： Carl A. Chiulli , Yalan Mao , William T. Plummer
发明人： Carl A. Chiulli , Yalan Mao , William T. Plummer
IPC分类号： B41J2/475 , B41J2/47 , G01D15/34
CPC分类号： B41J2/4753
摘要： Apparatus and methods for exposing multilayered thermal imaging media to eliminate "cloud" or "woodgrain" artifacts by proper optimization of the exposing radiation angle of incidence. The exposure angle of incidence is large enough so that all rays with high reflectance loss are paired with equally many with low reflectance loss to increase printing efficiency.
摘要翻译：用于暴露多层热成像介质以通过曝光辐射入射角的适当优化来消除“云”或“木纹”伪像的装置和方法。入射角度的曝光角度足够大，所以具有高反射率损失的所有光线都具有同等多数的低反射率损失，以提高打印效率。

7. 发明授权

US5268245A Process for forming a filter on a solid state imager 失效
标题翻译：在固态成像器上形成滤光片的工艺
公开(公告)号：US5268245A
公开(公告)日：1993-12-07
申请号：US911001
申请日：1992-07-09
申请人： Carl A. Chiulli
发明人： Carl A. Chiulli
IPC分类号： G03F7/004 , B41M5/337 , C09B11/28 , C09B47/00 , C09K9/02 , G02B5/22 , G03C8/10 , G03F7/00 , H01L27/14 , G03F9/00
CPC分类号： G03F7/0007
摘要： A filter is formed on a solid state imager by:forming, on the imaging surface of the imager, an adherent layer of a dye-containing photoresist composition comprising a photoresist resin and a thermochromic dye, this dye being substantially non-absorbent of actinic radiation of a first wavelength, but capable, upon heating, of undergoing a thermally-induced color change which renders it absorptive of actinic radiation of the first wavelength;imagewise exposing the adherent layer of dye-containing photoresist composition to actinic radiation of the first wavelength;removing one of the exposed and unexposed areas of the layer, while leaving the other of the exposed and unexposed areas on the imaging surface, to form a pattern of filter elements; andheating the solid state imager to a temperature and for a time sufficient to cause the dye to undergo its color change, thereby causing the filter elements to become absorptive of radiation of the first wavelength.This process avoids the long exposure times otherwise required when forming filter elements of a color which strongly absorbs the exposing radiation.
摘要翻译：在固态成像器上形成滤光器，方法是：在成像器的成像表面上形成包含光致抗蚀剂树脂和热致变色染料的含染料的光致抗蚀剂组合物的粘合层，该染料基本上不吸收光化辐射第一波长但能够在加热时经受热诱导的颜色变化，其使其吸收第一波长的光化辐射; 将含染料的光致抗蚀剂组合物的粘附层成像曝光于第一波长的光化辐射; 去除所述层的暴露和未曝光区域中的一个，同时在成像表面上留下暴露和未曝光的区域中的另一个，以形成过滤元件的图案; 并将固态成像器加热到足以使染料发生颜色变化的温度和时间，从而使过滤元件吸收第一波长的辐射。当形成强烈吸收曝光辐射的颜色的滤光元件时，该过程避免了另外需要的长曝光时间。

8. 发明授权

US5059500A Process for forming a color filter 失效
标题翻译：用于形成滤色器的方法
公开(公告)号：US5059500A
公开(公告)日：1991-10-22
申请号：US595211
申请日：1990-10-10
申请人： Christopher R. Needham , Carl A. Chiulli , Stephen F. Clark
发明人： Christopher R. Needham , Carl A. Chiulli , Stephen F. Clark
IPC分类号： G02B5/20 , G03F7/00 , H01L21/302 , H01L21/3065 , H01L31/0216 , H04N5/335
CPC分类号： H01L31/02162 , G03F7/0007
摘要： A filter is formed on a substrate, such as a solid state imager, by providing successively on the substrate a layer of an absorber material, a layer of a barrier material, and a layer of a photoresist material. The photoresist is patternwise exposed and developed, thereby baring regions of the barrier layer underlying selected regions of the photoresist layer. The coated substrate is reactive ion etched under a first set of etching conditions to etch away the bared regions of the barrier layer and to bare but not substantially etch the underlying regions of the absorber layer, and then reactive ion etched under a second set of etching conditions, thereby etching away the remaining regions of the photoresist layer and the bared regions of the absorber layer, so forming a filter on the substrate. To form multi-colored filters, the process may be repeated with a different dye, or additional dyes may be deposited by other processes, such as that described in U.S. Pat. No. 4,808,501.

9. 发明授权

US5140396A Filter and solid state imager incorporating this filter 失效
标题翻译：滤波器和固态成像器结合此滤波器
公开(公告)号：US5140396A
公开(公告)日：1992-08-18
申请号：US715100
申请日：1991-06-13
申请人： Christopher R. Needham , Carl A. Chiulli , Stephen F. Clark
发明人： Christopher R. Needham , Carl A. Chiulli , Stephen F. Clark
IPC分类号： G03F7/00 , H01L31/0216
CPC分类号： G03F7/0007 , H01L31/02162
摘要： A filter is formed on a substrate, such as a solid state imager, by providing successively on the substrate a layer of an absorber material, a layer of a barrier material, and a layer of a photoresist material. The photoresist is patternwise exposed and developed, thereby baring regions of the barrier layer underlying selected regions of the photoresist layer. The coated substrate is reactive ion etched under a first set of etching conditions to etch away the bared regions of the barrier layer and to bare but not substantially etch the underlying regions of the absorber layer, and then reactive ion etched under a second set of etching conditions, thereby etching away the remaining regions of the photoresist layer and the bared regions of the absorber layer, so forming a filter on the substrate. To form multi-colored filters, the process may be repeated with a different dye, or additional dyes may be deposited by other processes, such as that described in U.S. Pat. No. 4,808,501.
摘要翻译：通过在衬底上依次提供吸收材料层，阻挡材料层和光致抗蚀剂材料层，在诸如固态成像器的衬底上形成滤光器。光致抗蚀剂被图案化地曝光和显影，从而阻挡在光致抗蚀剂层的选定区域下面的区域。涂覆的基底在第一组蚀刻条件下被反应离子蚀刻，以蚀刻掉阻挡层的裸露区域并且裸露但基本上不蚀刻吸收层的下面的区域，然后在第二组蚀刻下进行反应离子蚀刻从而蚀刻掉光致抗蚀剂层的剩余区域和吸收层的裸露区域，从而在衬底上形成过滤器。为了形成多色过滤器，该方法可以用不同的染料重复，或者可以通过其它方法沉积另外的染料，例如美国专利No. 第4,808,501号。

10. 发明授权

US4652412A Method for forming microporous filter 失效
标题翻译：形成微孔过滤器的方法
公开(公告)号：US4652412A
公开(公告)日：1987-03-24
申请号：US744540
申请日：1985-06-14
申请人： Carl A. Chiulli
发明人： Carl A. Chiulli
IPC分类号： B01D67/00 , B26F1/00 , C08J9/26 , B29C59/02
CPC分类号： B26F1/00 , B01D67/0025
摘要： A surface-type microporous filter is prepared by embossing substantially uniform holes in an embossable polymer carried on a porous support wherein the pores are filled with a soluble filler. Subsequent to the embossing step, the filler is removed by dissolution.
摘要翻译：表面型微孔过滤器通过在承载在多孔载体上的可压纹聚合物中压花基本均匀的孔来制备，其中孔填充有可溶性填料。在压花步骤之后，通过溶解除去填料。

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