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1. 发明申请

US20140295331A1 NANOPOROUS FILM PATTERNED BY DIRECT PHOTOLITHOGRAPHY AND METHOD FOR PREPARING THE SAME 有权
标题翻译：通过直接光刻技术绘制的纳米薄膜及其制备方法
公开(公告)号：US20140295331A1
公开(公告)日：2014-10-02
申请号：US14004757
申请日：2013-04-27
申请人： Xiaohong Wang , Caiwei Shen
发明人： Xiaohong Wang , Caiwei Shen
IPC分类号： G03F7/40
CPC分类号： G03F7/405 , B05D1/00 , G03F7/00 , G03F7/0002 , G03F7/26
摘要： A nanoporous film patterned by direct photolithography and a method for preparing the same are provided. Since a precursor of the material is the mixture of a nano template material and a photoresist and the mixture still has the basic physical properties of the photoresist, a film is formed on a substrate by a standard photolithography process and a micro-sized patterned structure is realized. The mixture with the patterned structure is chemically etched to remove the template material to form a porous polymer film, or the mixture with the patterned structure is carbonized at a high temperature and then the template material is removed to form a porous carbon film. The nanoporous film patterned by direct photolithography and the method for preparing the same have the advantages of simple operation, low cost and good integration with other micro electric mechanical systems.
摘要翻译：提供通过直接光刻图案化的纳米多孔膜及其制备方法。由于材料的前体是纳米模板材料和光致抗蚀剂的混合物，并且混合物仍然具有光致抗蚀剂的基本物理性质，通过标准光刻工艺在基底上形成膜，并且微尺寸图案结构是实现了将具有图案化结构的混合物化学蚀刻以除去模板材料以形成多孔聚合物膜，或者将具有图案化结构的混合物在高温下碳化，然后除去模板材料以形成多孔碳膜。通过直接光刻法构图的纳米多孔膜及其制备方法具有操作简单，成本低，与其他微机电系统良好集成的优点。

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