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1. 发明专利

AU2003283848A1 TUMBLER TYPE OF MOBILE PHONE 未知
公开(公告)号：AU2003283848A1
公开(公告)日：2004-11-26
申请号：AU2003283848
申请日：2003-11-25
申请人： CHOI HO SANG
发明人： CHOI HO SANG
IPC分类号： H04B1/38 , H04M1/02

2. 发明专利

GB2360208A Nail clipper with side blades 未知
公开(公告)号：GB2360208A
公开(公告)日：2001-09-19
申请号：GB0104716
申请日：2001-02-26
申请人： LIM CHANG KUN , LEE MIN EUN , CHOI HO IL
发明人： LIM CHANG KUN , LEE MIN EUN , CHOI HO IL
IPC分类号： A45D29/02
摘要： Upper 12 and lower 14 arms have cutting edges at both the front 26, 28 and along part of the side 30, 32 near the front blade. The arms are attached by a springlike coupling remote from the cutting area. The upper arm 12 is depressed towards the lower arm 14 by an actuating handle 16 on the upper arm 12. The handle is rotatably attached to a shaft 18 near the cutting area. In an alternative embodiment the side cutting edges are replaced by scatter preventing barriers (34, 36 figure 5).

3. 发明专利

TWI426362B 用於製造液晶顯示器（ＬＣＤ）之光阻剝離組合物有权
简体标题：用于制造液晶显示器（ＬＣＤ）之光阻剥离组合物
公开(公告)号：TWI426362B
公开(公告)日：2014-02-11
申请号：TW099128466
申请日：2010-08-25
申请人： LTC股份有限公司 , LTC CO., LTD. , 崔禾宋 , CHOI, HO SUNG
发明人：崔禾宋 , CHOI, HO SUNG
IPC分类号： G03F7/42
CPC分类号： G03F7/422 , C11D11/0047 , G03F7/425

4. 发明专利

GB0104716D0 Nail clipper having side cutting edges 未知
公开(公告)号：GB0104716D0
公开(公告)日：2001-04-11
申请号：GB0104716
申请日：2001-02-26
申请人： LIM CHANG K , CHOI HO I , LEE MIN E
IPC分类号： A45D29/02
摘要： Upper 12 and lower 14 arms have cutting edges at both the front 26, 28 and along part of the side 30, 32 near the front blade. The arms are attached by a springlike coupling remote from the cutting area. The upper arm 12 is depressed towards the lower arm 14 by an actuating handle 16 on the upper arm 12. The handle is rotatably attached to a shaft 18 near the cutting area. In an alternative embodiment the side cutting edges are replaced by scatter preventing barriers (34, 36 figure 5).

5. 发明专利

ZA200803949B Skateboard 未知
公开(公告)号：ZA200803949B
公开(公告)日：2009-09-30
申请号：ZA200803949
申请日：2008-05-22
申请人： CHOI HO SEONG
发明人： CHOI HO SEONG
IPC分类号： A63C20090101

6. 发明专利

AU2007270259A1 Skateboard 未知
公开(公告)号：AU2007270259A1
公开(公告)日：2008-01-10
申请号：AU2007270259
申请日：2007-06-27
申请人： CHOI HO SEONG
发明人： CHOI HO SEONG
IPC分类号： A63C17/01 , A63C17/02
摘要： Provided is a skateboard. The skateboard includes front and rear boards each including a foot placing unit, a directional caster including at least two connectors respectively disposed on bottom surfaces of the front and rear boards at a predetermined distance, rotating arms rotatably coupled to the connectors respectively, and wheels respectively supported by the rotating arms and rollingly contacting the ground, and a connection unit having both ends axial-rotatably and pivotally connected to one sides of the front and rear boards.

7. 发明授权

EP2207197B1 Photoresist residue removal composition 有权
标题翻译：一种用于去除光刻胶残渣的组合物
公开(公告)号：EP2207197B1
公开(公告)日：2017-03-22
申请号：EP10150217.7
申请日：2010-01-07
申请人： Sung, Choi Ho
发明人： Sung, Choi Ho
IPC分类号： H01L21/311 , H01L21/02 , G03F7/42
CPC分类号： H01L21/31133 , G03F7/423 , G03F7/425 , H01L21/02071

8. 发明公开

EP2207197A3 Photoresist residue removal composition 有权
标题翻译：一种用于去除光刻胶残渣的组合物
公开(公告)号：EP2207197A3
公开(公告)日：2013-01-16
申请号：EP10150217.7
申请日：2010-01-07
申请人： Sung, Choi Ho
发明人： Sung, Choi Ho
IPC分类号： H01L21/311 , H01L21/02 , G03F7/42
CPC分类号： H01L21/31133 , G03F7/423 , G03F7/425 , H01L21/02071
摘要： A photoresist residue removal composition is provided. The photoresist residue removal composition essentially contains glycolic and water, to which a pH control agent and/or a cleanability improver is selectively added. The photoresist residue removal composition has a high capability to remove residues caused by plasma etching and ashing of a metal or silicon oxide layer under a photoresist pattern, does not cause corrosion, and is eco-friendly

9. 发明公开

EP2207197A2 Photoresist residue removal composition 有权
标题翻译： Zusammensetzung zum Entfernen vonFotolackrückständen
公开(公告)号：EP2207197A2
公开(公告)日：2010-07-14
申请号：EP10150217.7
申请日：2010-01-07
申请人： Sung, Choi Ho
发明人： Sung, Choi Ho
IPC分类号： H01L21/311 , H01L21/02 , G03F7/42
CPC分类号： H01L21/31133 , G03F7/423 , G03F7/425 , H01L21/02071
摘要： A photoresist residue removal composition is provided. The photoresist residue removal composition essentially contains glycolic and water, to which a pH control agent and/or a cleanability improver is selectively added. The photoresist residue removal composition has a high capability to remove residues caused by plasma etching and ashing of a metal or silicon oxide layer under a photoresist pattern, does not cause corrosion, and is eco-friendly
摘要翻译：提供光致抗蚀剂残留物去除组合物。光致抗蚀剂残留物去除组合物基本上含有乙醇酸和水，选择性地添加pH控制剂和/或可清洁性改进剂。光致抗蚀剂残留物去除组合物具有很高的去除由光刻胶图案下的等离子体蚀刻和金属或氧化硅层的灰化引起的残留物的能力，不会引起腐蚀，并且是环保的

10. 发明公开

KR20180057441A 통합일체형 오토브레이크 장치 审中-公开
公开(公告)号：KR20180057441A
公开(公告)日：2018-05-30
申请号：KR20160156081
申请日：2016-11-22
申请人： CHOI HO KYUNG
发明人： CHOI HO KYUNG
IPC分类号： B60T7/04 , B60K26/02 , B60T17/22 , G05G1/30 , G05G5/04
摘要： 본발명은통합일체형오토브레이크장치에관한것으로, 그구성은차량의브레이크페달과엑셀페달이위치되는대시패널에위치고정되는고정패널;과, 상기고정패널에형성되어상기브레이크페달의암을결속하거나결속해제하여상기브레이크페달의움직임을제어하는잠금수단;과, 상기고정패널상에위치되는것으로, 상기브레이크페달이눌러지면상기브레이크페달의암에접촉되어상기브레이크페달의눌러짐을감지하고, 그감지정보를제어부로전송하는리미트스위치;와, 상기리미트스위치의감지정보와차량의 RPM 및주행속도정보를기반으로상기잠금수단의작동을제어하는제어부;로된 것을특징으로하는것으로서, 제어부는리미트스위치를통해브레이크페달의누름이감지되는동시에차량의 RPM이 800 내지 1400으로절감되면서차량의주행이정지되는 3가지조건이만족되면잠금수단을통한차량의브레이크자동락킹이수행되므로종래의기계식오토브레이크장치에서빈번하게발생하는오작동으로인한안전사고를미연에방지할수 있을뿐만아니라, 간단한구성을갖는잠금수단을통해브레이크자동락킹을수행할수 있어저렴한비용으로현재사용되고있는차량에도간편히설치사용할수 있어종래의전자식및 기계식오토브레이크장치의장점을모두기대할수 있는효과가있다. 또한, 잠금수단의오작동으로인해브레이크페달의눌림이방해되더라도안전수단을통해간편히오작동을보상하여원활한브레이크작동을유도할수 있어잠금수단의오작동으로인한차량의안전사고를미연에방지하여장치의안전성을강화할수 있는효과가있다.

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