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1. 发明申请

WO2012178177A3 MICROPLASMA JET DEVICES, ARRAYS, MEDICAL DEVICES AND METHODS 审中-公开
标题翻译： MICROPLASMA喷射装置，阵列，医疗装置和方法
公开(公告)号：WO2012178177A3
公开(公告)日：2013-03-28
申请号：PCT/US2012044037
申请日：2012-06-25
申请人： UNIV ILLINOIS , EDEN J GARY , PARK SUNG-JIN , CHO JIN HOON , MA H JEFFREY
发明人： EDEN J GARY , PARK SUNG-JIN , CHO JIN HOON , MA H JEFFREY
IPC分类号： H05H1/24 , H05H1/30 , H05H1/34
CPC分类号： H01J37/32467 , H01J9/18 , H01J37/3244 , H01J37/32513 , H01J37/32568 , H05H1/2406 , H05H2001/2418 , H05H2001/2462
摘要： Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
摘要翻译：本发明的优选实施例包括各种材料中的微血管射流装置和阵列，以及低温微血浆喷射装置和阵列。这些包括优选的实施方案，单个微血浆喷射装置和在具有细长微腔的整体式聚合物嵌段中形成的装置阵列。阵列可以被密集地包装，例如在几平方厘米的区域中具有100个喷嘴。另外的实施方案包括在金属氧化物本身中具有微喷嘴的金属/金属氧化物微量喷射装置。本发明还提供了微型喷射装置的制造方法，并且已经证明这些方法能够产生与材料绝缘电极整体的定制的微型喷嘴轮廓。

2. 发明申请

WO2010138104A1 SYSTEMS AND METHODS FOR PLASMA APPLICATION 审中-公开
标题翻译：等离子体应用的系统和方法
公开(公告)号：WO2010138104A1
公开(公告)日：2010-12-02
申请号：PCT/US2009/005398
申请日：2009-09-30
申请人： COLORADO STATE UNIVERSITY RESEARCH FOUNDATION , KOO, Il-Gyo , MOORE, Cameron A. , COLLINS, George J. , CHO, Jin-Hoon
发明人： KOO, Il-Gyo , MOORE, Cameron A. , COLLINS, George J. , CHO, Jin-Hoon
IPC分类号： C25F1/00
CPC分类号： H05H1/24 , A61B18/042 , C23C16/513 , H01J37/32348 , H01J37/3255 , H05H1/2406 , H05H2001/2412 , H05H2001/2418 , H05H2001/2431 , H05H2001/2443 , H05H2001/245
摘要： The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.
摘要翻译：本公开提供了一种等离子体系统。等离子体系统包括等离子体装置，可电离介质源和电源。等离子体装置包括内部电极和外部电极，同轴地设置在内部电极周围。内部电极包括远端部分和覆盖内部电极的至少一部分的绝缘层。可电离介质源耦合到等离子体装置并且被配置为向其提供可电离介质。电源耦合到内电极和外电极，并且被配置为点燃等离子体装置处的可离子化介质以形成具有围绕暴露的远端部分的电子鞘层的等离子体流出物。

3. 发明申请

WO2010138102A1 PLASMA ELECTRODE CONFIGURATION FOR FORMING AN ELECTRON SHEATH LAYER 审中-公开
标题翻译：用于形成电子层的等离子体电极配置
公开(公告)号：WO2010138102A1
公开(公告)日：2010-12-02
申请号：PCT/US2009/005385
申请日：2009-09-30
申请人： Colorado State University Research Foundation , COLLINS, George J. , MOORE, Cameron A. , KOO, Il-Gyo , CHO, Jin-Hoon , ANTIOCO, Douglas K.
发明人： COLLINS, George J. , MOORE, Cameron A. , KOO, Il-Gyo , CHO, Jin-Hoon , ANTIOCO, Douglas K.
IPC分类号： A61B5/04
CPC分类号： H05H1/24 , A61B18/042 , C23C16/513 , H01J37/32348 , H01J37/3255 , H05H1/2406 , H05H2001/2412 , H05H2001/2418 , H05H2001/2431 , H05H2001/2443 , H05H2001/245
摘要： The present disclosure provides for a method of treating tissue. The method includes the steps of: positioning a plasma device in spaced relation to target tissue in accordance with a target tissue effect and generating plasma including secondarily-emitted electrons sufficient such that the target tissue effect is achieved.
摘要翻译：本公开提供了一种治疗组织的方法。该方法包括以下步骤：根据目标组织效应将等离子体装置定位成与靶组织间隔开的关系，并产生足够的二次发射电子的等离子体，从而实现目标组织效应。

4. 发明申请

WO2012177762A2 ARRAYS OF METAL AND METAL OXIDE MICROPLASMA DEVICES WITH DEFECT FREE OXIDE 审中-公开
标题翻译：金属和金属氧化物微孔器件与无氧氧化物的阵列
公开(公告)号：WO2012177762A2
公开(公告)日：2012-12-27
申请号：PCT/US2012/043350
申请日：2012-06-20
申请人： THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS , EDEN, J., Gary , PARK, Sung-jin , CHO, Jin, Hoon , SUNG, Seung, Hoon , KWAN, Min, Hwan
发明人： EDEN, J., Gary , PARK, Sung-jin , CHO, Jin, Hoon , SUNG, Seung, Hoon , KWAN, Min, Hwan
IPC分类号： H01J17/04
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00842 , B01J2219/00853 , B01J2219/00891 , C01B13/115 , C25D11/02 , C25D11/022 , C25D11/026 , C25D11/12 , C25D11/18 , C25D11/26 , H01J11/18 , H01J11/22 , H01J11/34 , H01J17/066 , H01J17/16 , H01J37/32055 , H05H2001/2412 , H05H2001/2418
摘要： A microplasma device of the invention includes a microcavity (16) or microchannel (21, 30) defined at least partially within a thick metal oxide layer (10) consisting essentially of defect free oxide. Electrodes (12, 22a, 22b) are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown. A method of fabricating a microcavity or microchannel plasma device of the invention includes anodizing a flat or gently curved or gently sloped metal substrate to form a thick layer of metal oxide consisting essentially of nanopores that are perpendicular to the surface of the metal substrate. Material removal is conducted to remove metal oxide material to form a microcavity or microchannel in the thick layer of metal oxide. Powder blasting is preferably used as an efficient removal process that preserves oxide quality.
摘要翻译：本发明的微型装置包括至少部分地限定在基本上由无缺陷氧化物组成的厚金属氧化物层（10）内的微腔（16）或微通道（21,30）。相对于微腔或微通道布置电极（12,22a，22b），以在施加适当电压时刺激所述微腔或微通道中的等离子体产生，并且至少一个电极被封装在厚金属氧化物层内。可以形成大阵列，并且由于缺乏氧化物中的微裂纹而避免电介质击穿，因此它们具有很强的鲁棒性。制造本发明的微腔或微通道等离子体装置的方法包括阳极化平坦或轻柔地弯曲或轻轻倾斜的金属基底，以形成基本上由垂直于金属基底表面的纳米孔构成的厚层金属氧化物。进行材料去除以去除金属氧化物材料以在金属氧化物的厚层中形成微腔或微通道。粉末喷射优选用作保持氧化物质量的有效的除去方法。

5. 发明申请

WO2012178177A2 MICROPLASMA JET DEVICES, ARRAYS, MEDICAL DEVICES AND METHODS 审中-公开
标题翻译： MICROPLASMA喷射装置，阵列，医疗装置和方法
公开(公告)号：WO2012178177A2
公开(公告)日：2012-12-27
申请号：PCT/US2012/044037
申请日：2012-06-25
申请人： THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS , EDEN, J., Gary , PARK, Sung-Jin , CHO, Jin, Hoon , MA, H., Jeffrey
发明人： EDEN, J., Gary , PARK, Sung-Jin , CHO, Jin, Hoon , MA, H., Jeffrey
IPC分类号： H05H1/24 , H05H1/30 , H05H1/34
CPC分类号： H01J37/32467 , H01J9/18 , H01J37/3244 , H01J37/32513 , H01J37/32568 , H05H1/2406 , H05H2001/2418 , H05H2001/2462
摘要： Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
摘要翻译：本发明的优选实施例包括各种材料中的微血管射流装置和阵列，以及低温微血浆喷射装置和阵列。这些包括优选的实施方案，单个微血浆喷射装置和在具有细长微腔的整体式聚合物嵌段中形成的装置阵列。阵列可以被密集地包装，例如在几平方厘米的区域中具有100个喷嘴。另外的实施方案包括在金属氧化物本身中具有微喷嘴的金属/金属氧化物微量喷射装置。本发明还提供了微型喷射装置的制造方法，并且已经证明这些方法能够产生与材料绝缘电极整体的定制的微型喷嘴轮廓。

6. 发明申请

WO2010138103A1 ELECTRODE SURFACE MATERIALS AND STRUCTURES FOR PLASMA CHEMISTRY 审中-公开
标题翻译：电子表面材料和等离子体化学结构
公开(公告)号：WO2010138103A1
公开(公告)日：2010-12-02
申请号：PCT/US2009/005389
申请日：2009-09-30
申请人： COLORADO STATE UNIVERSITY RESEARCH FOUNDATION , KOO, Il-Gyo , CHO, Jin-Hoon , MOORE, Cameron A. , COLLINS, George J. , ANTIOCO, Douglas K.
发明人： KOO, Il-Gyo , CHO, Jin-Hoon , MOORE, Cameron A. , COLLINS, George J. , ANTIOCO, Douglas K.
IPC分类号： B23K9/00
CPC分类号： H05H1/24 , A61B18/042 , C23C16/513 , H01J37/32348 , H01J37/3255 , H05H1/2406 , H05H2001/2412 , H05H2001/2418 , H05H2001/2431 , H05H2001/2443 , H05H2001/245
摘要： The present disclosure provides for a plasma system, which includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. At least one of the inner electrode and the outer electrode is formed from a metal alloy and includes a dielectric coating covering at least a portion thereof. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes and is configured to ignite the ionizable media at the plasma device to form a plasma effluent.
摘要翻译：本公开提供了一种等离子体系统，其包括等离子体装置，可电离介质源和电源。等离子体装置包括内部电极和外部电极，同轴地设置在内部电极周围。内部电极和外部电极中的至少一个由金属合金形成，并且包括覆盖其至少一部分的电介质涂层。可电离介质源耦合到等离子体装置并且被配置为向其提供可电离介质。电源耦合到内电极和外电极并且被配置为点燃等离子体装置处的可离子化介质以形成等离子体流出物。

7. 发明申请

WO2012177762A3 ARRAYS OF METAL AND METAL OXIDE MICROPLASMA DEVICES WITH DEFECT FREE OXIDE 审中-公开
标题翻译：金属和金属氧化物微孔器件与无氧氧化物的阵列
公开(公告)号：WO2012177762A3
公开(公告)日：2013-02-14
申请号：PCT/US2012043350
申请日：2012-06-20
申请人： UNIV ILLINOIS , EDEN J GARY , PARK SUNG-JIN , CHO JIN HOON , SUNG SEUNG HOON , KWAN MIN HWAN
发明人： EDEN J GARY , PARK SUNG-JIN , CHO JIN HOON , SUNG SEUNG HOON , KWAN MIN HWAN
IPC分类号： H01J17/04
CPC分类号： B01J19/0093 , B01J2219/00783 , B01J2219/00842 , B01J2219/00853 , B01J2219/00891 , C01B13/115 , C25D11/02 , C25D11/022 , C25D11/026 , C25D11/12 , C25D11/18 , C25D11/26 , H01J11/18 , H01J11/22 , H01J11/34 , H01J17/066 , H01J17/16 , H01J37/32055 , H05H2001/2412 , H05H2001/2418
摘要： A microplasma device of the invention includes a microcavity (16) or microchannel (21, 30) defined at least partially within a thick metal oxide layer (10) consisting essentially of defect free oxide. Electrodes (12, 22a, 22b) are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown. A method of fabricating a microcavity or microchannel plasma device of the invention includes anodizing a flat or gently curved or gently sloped metal substrate to form a thick layer of metal oxide consisting essentially of nanopores that are perpendicular to the surface of the metal substrate. Material removal is conducted to remove metal oxide material to form a microcavity or microchannel in the thick layer of metal oxide. Powder blasting is preferably used as an efficient removal process that preserves oxide quality.
摘要翻译：本发明的微血管装置包括至少部分地限定在基本上由无缺陷氧化物组成的厚金属氧化物层（10）内的微腔（16）或微通道（21,30）。电极（12,22a，22b）相对于微腔或微通道布置，以在施加合适的电压时刺激所述微腔或微通道中的等离子体产生，并且至少一个电极被包封在厚的金属氧化物层内。可以形成大阵列，并且由于在氧化物中缺少微裂纹以避免电介质击穿，因此它们具有很强的鲁棒性。制造本发明的微腔或微通道等离子体装置的方法包括阳极氧化平坦或轻柔地弯曲或缓慢倾斜的金属基底，以形成基本上由垂直于金属基底表面的纳米孔构成的厚层金属氧化物。进行材料去除以除去金属氧化物材料以在金属氧化物的厚层中形成微腔或微通道。粉末喷射优选用作保持氧化物质量的有效的除去方法。

8. 发明申请

WO2004032176A1 NANOPOROUS DIELECTRICS FOR PLASMA GENERATOR 审中-公开
标题翻译：用于等离子体发生器的纳米电介质
公开(公告)号：WO2004032176A1
公开(公告)日：2004-04-15
申请号：PCT/KR2003/002023
申请日：2003-10-01
申请人： LEE, Kyu-Wang , PARK, Sung-Jin , CHO, Jin-Hoon
发明人： LEE, Kyu-Wang , PARK, Sung-Jin , CHO, Jin-Hoon
IPC分类号： H01J37/32
CPC分类号： H01J37/32559 , H01J37/32018
摘要： The present invention provides a plasma electrode with nanoporous dielectrics of their pore size of few nm to few um. According to an embodiment of the present invention, regular or irregular nanoporous dielectrics are formed on the electrodes and arranged symmetrically or asymmetrically to produce a glow discharge with various modes of volume, surface and coplanar discharge. Simple modification of plasma parameters and consequently the improvement of stability and efficiency of plasma can be achieved by changing the thickness, homogeneity, pore diameter and porosity of the nanoporous dielectrics and by impregnation or forming the plasma reforming materials such as conductor, semiconductor or secondary electron emissive materials inside of the pore or surface of the dielectrics.
摘要翻译：本发明提供一种等离子体电极，其具有孔径小至几毫米的纳米多孔电介质。根据本发明的实施例，在电极上形成规则或不规则的纳米多孔介电体，对称或不对称地布置以产生具有各种体积，表面和共面放电模式的辉光放电。通过改变纳米多孔电介质的厚度，均匀性，孔径和孔隙率以及通过浸渍或形成诸如导体，半导体或二次电子的等离子体重整材料，可以实现等离子体参数的简单修改，从而提高等离子体的稳定性和效率在电介质的孔或表面内的发射材料。

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