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1. 发明申请

US20050226790A1 Flue gas treating equipment 审中-公开
标题翻译：烟气处理设备
公开(公告)号：US20050226790A1
公开(公告)日：2005-10-13
申请号：US10514945
申请日：2003-05-30
申请人： Byoung-sup Park , Bingzhe Jin
发明人： Byoung-sup Park , Bingzhe Jin
IPC分类号： F23J1/00 , B01D53/46 , F23G7/06 , F23J1/06 , B01D53/34 , B08B9/027 , F23J3/02
CPC分类号： F23J1/06
摘要： It is an object of the present invention to provide an exhaust gas processing apparatus capable of more effectively scraping off powder which is attached to an inner surface of a combustion chamber, and capable of increasing lifetime of an impact member which generates an impact against a scraping member. The exhaust gas processing apparatus is characterized in that a blade portion or an acute edge portion 7a1 is provided on a lever 7a which is a scraping member at a position opposed to an inner surface of a combustion chamber 1. The scraping member moves in a circumferential direction along the inner surface of the combustion chamber 1 to scrape off powder which is attached to the inner surface of the combustion chamber 1.
摘要翻译：本发明的目的是提供一种排气处理装置，其能够更有效地刮除附着在燃烧室的内表面上的粉末，并能够增加产生对刮擦的冲击的冲击构件的使用寿命会员。废气处理装置的特征在于，在与燃烧室1的内表面相对的位置处的刮削构件的杠杆7a上设置有叶片部分或锐边缘部分7,1。刮削构件沿着燃烧室1的内表面沿圆周方向移动以刮除附着在燃烧室1的内表面上的粉末。

2. 发明申请

US20050115674A1 Method for treating exhaust gas 审中-公开
标题翻译：废气处理方法
公开(公告)号：US20050115674A1
公开(公告)日：2005-06-02
申请号：US10474765
申请日：2003-02-13
申请人： Hiroyasu Taguchi , Yasuyuki Hoshino , Byoung-sup Park , Bingzhe Jin
发明人： Hiroyasu Taguchi , Yasuyuki Hoshino , Byoung-sup Park , Bingzhe Jin
IPC分类号： B01D53/68 , F23G7/06 , H01L21/302 , C23F1/00 , F23M5/00
CPC分类号： F23G7/065 , F23J2215/30
摘要： Exhaust gas containing fluorine gas or halogen fluoride gas emitted from etching or cleaning steps is burned in a combustion chamber having a fluoride passivation film formed on its surface. It is possible to treat exhaust gas emitted from semiconductor fabrication processes which contains fluorine gas or halogen fluoride gas in high concentrations or large volumes, while abatement treatment can be accomplished safely and efficiently with less energy usage.
摘要翻译：从蚀刻或清洗步骤排出的含有氟气或卤素氟化物气体的废气在其表面形成氟化物钝化膜的燃烧室中燃烧。可以以高浓度或大体积处理含有氟气或卤素氟化物气体的半导体制造工序排出的废气，同时减少能量消耗可以安全有效地实现减排处理。

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