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    • 2. 发明授权
    • Diacrylates and dimethacrylates
    • 二丙烯酸酯和二甲基丙烯酸酯
    • US06316552B1
    • 2001-11-13
    • US09483057
    • 2000-01-13
    • Bettina SteinmannAdrian SchulthessMax Hunziker
    • Bettina SteinmannAdrian SchulthessMax Hunziker
    • C08G5916
    • C07C69/54B33Y10/00B33Y70/00G03F7/027Y10S525/922
    • Compounds of formulae (Ia) and (Ib) wherein the substituents R1 are each independently of the other hydrogen or methyl, R2 is an unsubstituted C1-C20alkyl group or a C1-C20alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C6-C14aryl and halogen, an unsubstituted phenyl group or a phenyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy or halogen, or is a radical of formula —CH2—OR3, wherein R3 is an unsubstituted C1-C20alkyl group or a C1-C20alkyl group which is substituted by one or more than one substituent selected from the group consisting of hydroxy, C6-C14aryl and halogen, an unsubstituted phenyl group or a phenyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy and halogen, or is a C2-C6alkenyl group, a C2-C20acyl group or an unsubstituted cyclohexylcarbonyl group or a cyclohexylcarbonyl group which is substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, hydroxy and halogen, Z is a group of formulae (IIa)-(IIe) wherein Y is a direct bond, C1-C6alkylene, —S, —O—, —SO—, —SO2— or —CO—, and R1 is hydrogen or methyl, and wherein the aromatic and cycloaliphatic rings of formulae (IIa)-(IIe) are unsubstituted or substituted by one or more than one substituent selected from the group consisting of C1-C6alkyl, chloro and bromo, form, in conjunction with other acrylates or methacrylates, low viscosity photocurable compositions which, when fully cured, give moulded articles of excellent flexibility.
    • 式(Ia)和(Ib)的化合物,其中取代基R 1各自独立地为氢或甲基,R 2为未取代的C 1 -C 20烷基或被一个或多于一个选自以下的取代基取代的C 1 -C 20烷基 由羟基,C 6 -C 14芳基和卤素组成的基团,未取代的苯基或被一个或多于一个选自C 1 -C 6烷基,羟基或卤素的取代基取代的苯基,或者是式 -CH2-OR3,其中R3是未取代的C1-C20烷基或被一个或多于一个选自羟基,C 6 -C 14芳基和卤素的取代基取代的C 1 -C 20烷基,未取代的苯基或 被一个或多于一个选自C 1 -C 6烷基,羟基和卤素的取代基取代的苯基,或者是C 2 -C 6烯基,C 2 -C 20酰基或未取代的环己基羰基或环 由一个或多于一个选自C1-C6烷基,羟基和卤素的取代基取代的环己基羰基,Z是其中Y是直接键的式(IIa) - (IIe)基团,C1-C6亚烷基, -S,-O - , - SO - , - SO 2 - 或-CO-,并且R 1是氢或甲基,并且其中式(IIa) - (IIe)的芳族和脂环族环是未取代的或被一个或多个 与选自C1-C6烷基,氯和溴的一个取代基一起形成与其它丙烯酸酯或甲基丙烯酸酯结合的低粘度可光固化组合物,其在完全固化时得到优异柔性的模制品。
    • 3. 发明授权
    • Liquid, radiation-curable composition, especially for stereolithography
    • 液体,可辐射固化的组合物,特别是用于立体光刻
    • US5972563A
    • 1999-10-26
    • US901303
    • 1997-07-28
    • Bettina SteinmannAdrian Schulthess
    • Bettina SteinmannAdrian Schulthess
    • B29C35/08B29C67/00C08F2/48C08F20/20C08G59/62G03F7/00G03F7/027G03F7/038G03F7/028G03F7/26
    • G03F7/027G03F7/0037G03F7/038
    • A liquid, radiation-curable composition which in addition to a liquid, free-radically polymerizable component comprises at least the following additional components: (A) from 40 to 80 percent by weight of a liquid difunctional or more highly functional epoxy resin or of a liquid mixture consisting of difunctional or more highly functional epoxy resins; (B) from 0.1 to 10 percent by weight of a cationic photoinitiator or of a mixture of cationic photoinitiators; and (C) from 0.1 to 10 percent by weight of a free-radical photoinitiator or of a mixture of free-radical photoinitiators; and (D) up to 40 percent by weight of a hydroxy compound, in which composition component (D) is selected from the group consisting of:(D1) phenolic compounds having at least 2 hydroxyl groups,(D2) phenolic compounds having at least 2 hydroxyl groups, which are reacted with ethylene oxide, proplyene oxide or with ethylene oxide and propylene oxide,(D3) aliphatic hydroxy compounds having not more than 80 carbon atoms,(D4) compounds having at least one hydroxyl group and at least one epoxide group, and(D5) a mixture of at least 2 of the compounds mentioned under (D1) to (D4), and component (D) is present in the compositions in a quantity of at least 2 percent by weight; the free-radically polymerizable component comprises at least (E) from 4 to 30 percent by weight of at least one liquid poly(meth)acrylate having a (meth)acrylate functionality of more than 2; and at least one of components (A) and (D) comprises substances which have aromatic carbon rings in their molecule, is particularly suitable for stereolithography, a particular feature of this composition being that it leads to cured material which exhibits only a very low propensity for uptake of water.
    • 除了液体可自由基聚合的组分之外,液体可辐射固化的组合物至少包含以下另外的组分:(A)40至80重量%的液体双官能或更高官能的环氧树脂或 由双功能或更高功能的环氧树脂组成的液体混合物; (B)0.1至10重量%的阳离子光引发剂或阳离子光引发剂的混合物; 和(C)0.1至10重量%的自由基光引发剂或自由基光引发剂的混合物; 和(D)至多40重量%的羟基化合物,其中组合物组分(D)选自:(D1)具有至少2个羟基的酚类化合物,(D2)至少具有至少 2个羟基与环氧乙烷,氧化丙烯或环氧乙烷和环氧丙烷反应,(D3)不大于80个碳原子的脂族羟基化合物,(D4)具有至少一个羟基和至少一个环氧化物的化合物 和(D5)组合物中至少2种(D1)至(D4)中提及的化合物和组分(D)的混合物以至少2重量%的量存在于组合物中; 可自由基聚合的组分至少包含(E)4-30重量%的至少一种(甲基)丙烯酸酯官能度大于2的至少一种液体聚(甲基)丙烯酸酯; 并且组分(A)和(D)中的至少一种包括在其分子中具有芳族碳环的物质,特别适用于立体光刻,该组合物的特定特征是其导致仅具有非常低的倾向的固化材料 吸收水分。
    • 7. 发明授权
    • Photosensitive compositions based on acrylates
    • 基于丙烯酸酯的感光组合物
    • US5476749A
    • 1995-12-19
    • US303563
    • 1994-09-09
    • Bettina SteinmannRolf WiesendangerAdrian SchulthessMax Hunziker
    • Bettina SteinmannRolf WiesendangerAdrian SchulthessMax Hunziker
    • C08F2/50C08F2/48C08F290/00C08F299/06C09D4/00C09D4/02G03F7/00G03F7/027G03C5/00
    • G03F7/027B29C67/0066G03F7/0037
    • A liquid photosensitive composition comprising(1) 40 to 80% by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and a molecular weight (Mw) of 500 to 10,000,(2) 5 to 40% by weight of a hydroxyl group containing aliphatic or cycloaliphatic di(meth)acrylate,(3) 0 to 40% by weight of a mono(meth)acrylate or of a mono-N-vinyl compound having a Mw of not more than 500,(4) 0.1 to 10% by weight of a photoinitiator,(5) 0 to 30% by weight of an aliphatic or cycloaliphatic di(meth)acrylate which differs from (2), of an aliphatic tri(meth)acrylate or of an aromatic di- or tri(meth)acrylate, and(6) 0 to 5% by weight of customary additives, such that the proportion of components (1) to (6) together is 100% by weight.The composition is a photosensitive composition which can be polymerised by irradiation with actinic light and which is suitable for the production preferably of three-dimensional objects by the stereolithographic technique.
    • 一种液体光敏组合物,其包含(1)40至80重量%的官能度为2至4,分子量(Mw)为500至10,000的聚氨酯(甲基)丙烯酸酯,(2)5至40重量% 含有脂肪族或脂环族二(甲基)丙烯酸酯的羟基,(3)0〜40重量%的单(甲基)丙烯酸酯或Mw不大于500的单-N-乙烯基化合物,(4) 0.1〜10重量%的光引发剂,(5)0〜30重量%脂肪族或(脂)三(甲基)丙烯酸酯或芳香族二(甲基)丙烯酸酯的脂肪族或脂环族二(甲基)丙烯酸酯与(2) 或三(甲基)丙烯酸酯,和(6)0-5重量%的常规添加剂,使得组分(1)至(6)的比例在一起为100重量%。 该组合物是可以通过用光化光照射而聚合的光敏组合物,其适用于通过立体光刻技术优选生产三维物体。
    • 9. 发明授权
    • Stereolithographic resins with high temperature and high impact resistance
    • 具有高温和高抗冲击性的立体光刻胶
    • US06989225B2
    • 2006-01-24
    • US10338074
    • 2003-01-07
    • Bettina Steinmann
    • Bettina Steinmann
    • G03F7/29G03F7/027B29C67/00C08G59/68
    • G03F7/0037B33Y10/00B33Y70/00G03F7/038
    • A liquid radiation-curable composition that comprises (A) at least one polymerizing organic substance comprising a mixture of (1) at least one alicyclic epoxide having at least two epoxy groups; and (2) at least one difunctional or higher functional glycidylether of a polyhydric compound; (B) at least one free-radical polymerizing organic substance comprising a mixture of (1) optionally, at least one trifunctional or higher functional (meth)acrylate compound; and (2) at least one aromatic di(meth)acrylate compound; (C) at least one cationic polymerization initiator; (D) at least one free-radical polymerization initiator; (E) optionally, at least one hydroxyl-functional aliphatic compound; and (F) at least one hydroxyl-functional aromatic compound; wherein the concentration of hydroxyl groups in the radiation-curable composition is at least about 1.1 equivalent OH groups per kilogram;wherein the concentration of epoxy groups in the radiation-curable composition is at least about 5.5 equivalent epoxy groups per kilogram; andwherein the amount of trifunctional or higher functional (meth)acrylate compound (B)(1) is from 0% to about 3% of the composition and the amount of aromatic di(meth)acrylate compound (B)(2) is at least 10% of the composition.
    • 一种液体辐射固化组合物,其包含(A)至少一种聚合有机物质,所述有机物质包含(1)至少一种具有至少两个环氧基的脂环族环氧化物的混合物; 和(2)多羟基化合物的至少一种二官能或更高官能的缩水甘油醚; (B)至少一种自由基聚合有机物质,其包含(1)任选的至少一种三官能或更高官能的(甲基)丙烯酸酯化合物的混合物; 和(2)至少一种芳族二(甲基)丙烯酸酯化合物; (C)至少一种阳离子聚合引发剂; (D)至少一种自由基聚合引发剂; (E)任选地至少一种羟基官能的脂族化合物; 和(F)至少一种羟基官能的芳族化合物; 其中所述可辐射固化组合物中羟基的浓度为至少约1.1当量OH基团/千克; 其中可辐射固化组合物中环氧基团的浓度为至少约5.5当量环氧基团/千克; 并且其中三官能或更高官能度(甲基)丙烯酸酯化合物(B)(1)的量为组合物的0%至约3%,并且芳族二(甲基)丙烯酸酯化合物(B)(2)的量为 至少10%的组成。