会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明申请
    • Auto-focusing method and device
    • 自动对焦方式和装置
    • US20050121596A1
    • 2005-06-09
    • US10506860
    • 2003-03-13
    • Zvi KamBenjamin Geiger
    • Zvi KamBenjamin Geiger
    • G01N21/64G02B7/36G02B7/38G02B21/24G02B7/04G02B27/64
    • G01N21/6458G02B7/36G02B7/365G02B7/38G02B21/244
    • An auto-focusing method and device are presented for determining an in-focus position of a sample supported on a substrate plate made of a material transparent with respect to incident electromagnetic radiation. The method utilizes an optical system capable of directing incident electromagnetic radiation towards the sample and collecting reflections of the incident electromagnetic radiation that are to be detected. A focal plane of an objective lens arrangement is located at a predetermined distance from a surface of the substrate, which is opposite to the sample-supporting surface of the substrate. A continuous displacement of the focal plane relative to the substrate along the optical axis of the objective lens arrangement is provided, while concurrently directing the incident radiation towards the sample through the objective lens arrangement to thereby focus the incident radiation to a location at the focal plane of the objective lens arrangement. Reflected components of the electromagnetic radiation to a location objective lens arrangement are continuously detected. The detected reflected components are characterized by a first intensity peak corresponding to an in-focus position of said opposite surface of the substrate, and a second intensity peak spaced in time from the first intensity peak and corresponding to an in-focus position of said sample-supporting surface of the substrate. This technique enables imaging of the sample when in the in-focus position of the sample-supporting surface of the substrate.
    • 提出一种自动对焦方法和装置,用于确定由相对于入射电磁辐射透明的材料制成的基板上的样品的对焦位置。 该方法利用一种光学系统,能够将入射的电磁辐射引向样品并收集待检测的入射电磁辐射的反射。 物镜布置的焦平面位于与基板的与样品支撑表面相反的表面的预定距离处。 提供了沿着物镜装置的光轴相对于基板的焦平面的连续位移,同时通过物镜装置同时引导入射辐射朝向样品,从而将入射辐射聚焦到焦平面处的位置 的物镜布置。 连续地检测到位置物镜布置的电磁辐射的反射分量。 检测到的反射分量的特征在于对应于基板的相对表面的对焦位置的第一强度峰值和与第一强度峰值在时间上间隔开并且对应于所述样品的对焦位置的第二强度峰值 支撑表面。 当在基板的样品支撑表面的对焦位置时,该技术能够对样品进行成像。