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    • 2. 发明申请
    • TEMPERATURE CONTROL APPARATUS AND METHOD
    • 温度控制装置和方法
    • WO2007092782A1
    • 2007-08-16
    • PCT/US2007/061556
    • 2007-02-02
    • NOAH PRECISION, LLCATLAS, BorisBICHUTSKIY, YefimBRUK, Boris
    • ATLAS, BorisBICHUTSKIY, YefimBRUK, Boris
    • G05D23/19H01L21/02
    • G05D23/1919Y10T137/27
    • An apparatus for use with a process liquid for controlling the temperature of a semiconductor-processing target comprises first and second tanks adapted for holding process liquid, at least one fluid level sensor carried by the first tank for monitoring the amount of process liquid in the first tank, and a valve coupled to one of the at least one fluid level sensor and configured to increases the flow of process liquid from the second tank to the target when the amount of process liquid in the first tank drops to a first predetermined amount. The first tank may include first and second compartments partially separated by a divider with a top whereby process liquid in the first compartment flows over the top of the divider into the second compartment.
    • 一种与用于控制半导体处理对象的温度的处理液一起使用的装置包括适于保持处理液体的第一和第二罐,由第一罐承载的至少一个液位传感器,用于监测第一罐中处理液的量 罐和阀,其联接到所述至少一个液位传感器中的一个,并且被配置为当所述第一罐中的处理液体的量下降到第一预定量时,将处理液体从所述第二罐流到所述目标物的流量。 第一罐可以包括由具有顶部的分隔器部分地隔开的第一隔室和第二隔室,由此第一隔室中的处理液体流过隔板的顶部进入第二隔室。