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1. 发明授权

US08293125B2 Method and device for manufacturing structure having pattern, and method for manufacturing mold 有权
标题翻译：具有图案的制造结构的方法和装置，以及用于制造模具的方法
公开(公告)号：US08293125B2
公开(公告)日：2012-10-23
申请号：US11995170
申请日：2006-09-05
申请人： Aya Imada , Toru Den , Takashi Nakamura
发明人： Aya Imada , Toru Den , Takashi Nakamura
IPC分类号： C03C15/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/09
摘要： A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
摘要翻译：制造具有图案的结构。弹性变形过程目标从第一状态沿面内方向弹性变形。在变形的过程目标上形成第一图案。使弹性变形的加工对象靠近或返回到第一状态，从而形成具有与第一图案不同的尺寸和形状的第二图案。

2. 发明授权

US07794861B2 Patterned media, method of manufacturing magnetic recording medium, and method of manufacturing a base 有权
标题翻译：图案化介质，制造磁记录介质的方法，以及制造基座的方法
公开(公告)号：US07794861B2
公开(公告)日：2010-09-14
申请号：US11836556
申请日：2007-08-09
申请人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
发明人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
IPC分类号： G11B5/66
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/667 , G11B5/743 , G11B5/8404 , G11B5/855
摘要： To provide patterned media having novel structure. Plural convex members 2991 are provided in an array form on a substrate 2990. The convex member has a shape such that the cross section at each plane in parallel to the substrate tapers toward the substrate. Magnetic recording layers 2992 are provided on upper parts 2993 of the convex members so that they are not in contact with each other between the adjacent upper surface parts.
摘要翻译：提供具有新颖结构的图案化介质。多个凸形构件2991以阵列形式设置在基板2990上。凸形构件具有使得平行于基板的每个平面处的横截面朝向基板逐渐变细的形状。磁记录层2992设置在凸部件的上部2993上，使得它们在相邻的上表面部分之间不彼此接触。

3. 发明申请

US20090120904A1 METHOD AND DEVICE FOR MANUFACTURING STRUCTURE HAVING PATTERN, AND METHOD FOR MANUFACTURING MOLD 有权
标题翻译：用于制造具有图案的结构的方法和装置，以及用于制造模具的方法
公开(公告)号：US20090120904A1
公开(公告)日：2009-05-14
申请号：US11995170
申请日：2006-09-05
申请人： Aya Imada , Toru Den , Takashi Nakamura
发明人： Aya Imada , Toru Den , Takashi Nakamura
IPC分类号： B44C1/22 , B29C69/00 , C23F1/08 , B29C33/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/09
摘要： A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
摘要翻译：制造具有图案的结构。弹性变形过程目标从第一状态沿面内方向弹性变形。在变形的过程目标上形成第一图案。使弹性变形的加工对象靠近或返回到第一状态，从而形成具有与第一图案不同的尺寸和形状的第二图案。

4. 发明授权

US07517554B2 Process for producing nanostructure of mixed film of Al, Si, and/or Ge 失效
标题翻译：制备Al，Si和/或Ge混合膜的纳米结构的方法
公开(公告)号：US07517554B2
公开(公告)日：2009-04-14
申请号：US11339627
申请日：2006-01-26
申请人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
发明人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
IPC分类号： C23C8/00
CPC分类号： C23C14/5873 , B82Y30/00 , C23C14/165
摘要： A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an aluminum-silicon-germanium mixed film containing silicon and germanium at a content of 20 to 70 atom % relative to aluminum, the mixed film being constituted of a matrix composed mainly of silicon and germanium in a composition ratio of SixGe1-x (0≦X≦1), and cylindrical portions mainly composed of aluminum having a diameter of not larger 30 nm in the matrix. In the process, the mixed film is formed at a film-forming rate of not higher than 150 nm/min.
摘要翻译：提供一种制造纳米结构的方法，其能够通过成膜条件控制孔径和孔间隔。该方法产生相对于铝含有20〜70原子％含有硅和锗的铝 - 硅 - 锗混合膜的纳米结构，该混合膜由组成为主要由硅和锗组成的基体构成 SixGe1-x（0 <= X <= 1）的比例，以及主要由直径不大于30nm的铝构成的圆筒部。在该过程中，以不高于150nm / min的成膜速度形成混合膜。

5. 发明申请

US20080050526A1 METHOD OF PRODUCING A STRUCTURE HAVING A HOLE 失效
标题翻译：生产具有孔的结构的方法
公开(公告)号：US20080050526A1
公开(公告)日：2008-02-28
申请号：US11766908
申请日：2007-06-22
申请人： Aya Imada , Toru Den
发明人： Aya Imada , Toru Den
IPC分类号： B05D5/00
CPC分类号： B81C1/00111 , B81B2203/0361 , C25D1/08 , C25D11/04 , C25D11/045 , C25D11/16 , C25D11/18 , C25D11/26
摘要： The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.
摘要翻译：本发明提供一种通过使用阳极氧化法容易地得到纳米级结构的结构体的制造方法。制造具有孔的结构的方法包括：形成规则地布置在基板上的第一突出结构; 在具有第一投影结构的基板上形成第一阳极氧化层，从而在由阳极氧化层上的投影结构形成的单元的中心部分形成第一凹陷结构; 移除第一投影结构以形成孔; 以及对所述第一阳极氧化层进行阳极氧化，以在所述第一凹部结构的位置形成孔。

6. 发明申请

US20080037173A1 PATTERNED MEDIA, METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM, AND METHOD OF MANUFACTURING A BASE 有权
标题翻译：图形介质，制造磁记录介质的方法及其制造方法
公开(公告)号：US20080037173A1
公开(公告)日：2008-02-14
申请号：US11836556
申请日：2007-08-09
申请人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
发明人： Tatsuya Saito , Takashi Nakamura , Shigeru Ichihara , Toru Den , Aya Imada , Nobuhiro Yasui
IPC分类号： G11B5/82
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/667 , G11B5/743 , G11B5/8404 , G11B5/855
摘要： To provide patterned media having novel structure. Plural convex members 2991 are provided in an array form on a substrate 2990. The convex member has a shape such that the cross section at each plane in parallel to the substrate tapers toward the substrate. Magnetic recording layers 2992 are provided on upper parts 2993 of the convex members so that they are not in contact with each other between the adjacent upper surface parts.
摘要翻译：提供具有新颖结构的图案化介质。多个凸形构件2991以阵列形式设置在基板2990上。凸形构件具有使得平行于基板的每个平面处的横截面朝向基板逐渐变细的形状。磁记录层2992设置在凸部件的上部2993上，使得它们在相邻的上表面部分之间不彼此接触。

7. 发明申请

US20060144812A1 Process for producing structure, structure thereof, and magnetic recording medium 失效
公开(公告)号：US20060144812A1
公开(公告)日：2006-07-06
申请号：US10559966
申请日：2003-12-05
申请人： Aya Imada , Tohru Den
发明人： Aya Imada , Tohru Den
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C59/022 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： The present invention relates to a process for producing a structure having holes at prescribed positions. The structure is produced through steps of (A) providing an impressing member having protrusions, and a substrate, (B) forming a layer, on the substrate, from a material having a less strength than the impressing member, (C) forming depressions by impressing the impressing member on the layer corresponding to protrusions of the impressing member, (D) etching the layer to bare at least a part of the surface of the substrate, and (E) anodizing the substrate to form holes on the substrate.

8. 发明申请

US20060127602A1 Nanostructure and process of production thereof 失效
标题翻译：纳米结构及其生产工艺
公开(公告)号：US20060127602A1
公开(公告)日：2006-06-15
申请号：US11339627
申请日：2006-01-26
申请人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
发明人： Tatsuya Saito , Tohru Den , Kazuhiko Fukutani , Aya Imada
IPC分类号： C23C8/00
CPC分类号： C23C14/5873 , B82Y30/00 , C23C14/165
摘要： A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an aluminum-silicon-germanium mixed film containing silicon and germanium at a content of 20 to 70 atom % relative to aluminum, the mixed film being constituted of a matrix composed mainly of silicon and germanium in a composition ratio of SixGe1-x (0≦X≦1), and cylindrical portions mainly composed of aluminum having a diameter of not larger 30 nm in the matrix. In the process, the mixed film is formed at a film-forming rate of not higher than 150 nm/min.
摘要翻译：提供一种制造纳米结构的方法，其能够通过成膜条件控制孔径和孔间隔。该方法产生相对于铝含有20〜70原子％含有硅和锗的铝 - 硅 - 锗混合膜的纳米结构，该混合膜由组成为主要由硅和锗组成的基体构成 Si x 1 x x-x x（0 <= X 1 = 1）的比例，以及主要由矩阵中直径不大于30nm的铝构成的圆筒部。在该过程中，以不高于150nm / min的成膜速度形成混合膜。

9. 发明申请

US20050211663A1 Process for producing structure, process for producing magnetic recording medium, and process for producing molded product 失效
标题翻译：制造结构的方法，磁记录介质的制造方法以及制造模制品的方法
公开(公告)号：US20050211663A1
公开(公告)日：2005-09-29
申请号：US11086423
申请日：2005-03-23
申请人： Aya Imada , Tohru Den , Tatsuya Saito
发明人： Aya Imada , Tohru Den , Tatsuya Saito
IPC分类号： B82B3/00 , B44C1/22 , C01F7/02 , C23C14/58 , C25D1/10 , C25D11/04 , C25D11/18 , G11B5/855
CPC分类号： C25D1/10 , C23C14/5853 , C23C14/5873 , C25D11/045 , C25D11/18 , G11B5/855
摘要： A process for producing a structure having a porous layer is provided. The process forms the porous layer with high thickness-controllability. The process comprises steps of preparing a layered product having, on a substrate, a first nonporous layer and a second nonporous layer different in constituting material composition from the first layer; anodizing the layered product to form pores in the first nonporous layer and the second nonporous layer; and removing the second nonporous layer having pores formed therein from the layered product.
摘要翻译：提供了具有多孔层的结构体的制造方法。该方法形成具有高厚度可控性的多孔层。该方法包括以下步骤：制备在基材上具有与第一层不同的构成材料组成的第一无孔层和第二无孔层的层叠体; 阳极氧化层状产物以在第一无孔层和第二无孔层中形成孔; 并且从层叠体中除去其中形成有孔的第二无孔层。

10. 发明授权

US06932516B2 Surface optical device apparatus, method of fabricating the same, and apparatus using the same 失效
标题翻译：表面光学器件装置及其制造方法以及使用其的装置
公开(公告)号：US06932516B2
公开(公告)日：2005-08-23
申请号：US09903709
申请日：2001-07-13
申请人： Toshihiko Ouchi , Hajime Sakata , Futoshi Hirose , Aya Imada
发明人： Toshihiko Ouchi , Hajime Sakata , Futoshi Hirose , Aya Imada
IPC分类号： G02B6/42 , G02B6/36
CPC分类号： G02B6/4249
摘要： A surface optical device apparatus includes a surface optical device capable of emitting or receiving light through a surface thereof and a thick layer formed of a radiation-curable or electron-beam-curable material, such as a polymerizable resist. In the thick layer, a guide hole for inserting an end portion of a light-transmission member, such as an optical fiber, and a plastic optical fiber with a flat end face or a lens-shaped end face, therein is formed at a position corresponding to the surface of the surface optical device such that the surface optical device can be optically coupled to the light-transmission member inserted in the guide hole. The guide hole is formed in the thick layer by performing a patterning on the thick layer using photolithography to selectively harden the thick layer and developing the thick layer.
摘要翻译：表面光学器件装置包括能够通过其表面发射或接收光的表面光学器件以及由可聚合抗蚀剂等可辐射固化或电子束固化材料形成的厚层。在厚层中，形成用于插入诸如光纤的光传输构件的端部的引导孔和具有平坦端面或透镜形端面的塑料光纤，位于对应于表面光学装置的表面，使得表面光学装置可以光学耦合到插入导向孔中的光传输构件。通过使用光刻法在厚层上进行图案化以选择性地硬化厚层并显影厚层，在厚层中形成引导孔。

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