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1. 发明授权

US07440083B2 Printing a mask with maximum possible process window through adjustment of the source distribution 失效
公开(公告)号：US07440083B2
公开(公告)日：2008-10-21
申请号：US11957602
申请日：2007-12-17
申请人： Alan Edward Rosenbluth
发明人： Alan Edward Rosenbluth
IPC分类号： G03B27/32 , G03B27/52
CPC分类号： G03F7/70125
摘要： A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined in terms of an allowed range for defining shapes. Constrained sets of intensity parameters are imposed. A first set of intensity parameters represents maximum possible intensities that can be permitted for overexposed tolerance positions. A second set of intensity parameters represents minimum possible intensities that can be permitted for underexposed tolerance positions. Optimum source intensities of incident beams are defined using a linear program and constraints. The optimum source intensities maximize an integrated range of dose and focal variations without causing printed shapes to depart from the allowed range. Apparatus are detailed and variations are described.

2. 发明授权

US06341038B1 Apparatus for polarization conversion 失效
标题翻译：极化转换装置
公开(公告)号：US06341038B1
公开(公告)日：2002-01-22
申请号：US09507996
申请日：2000-02-22
申请人： Russell Alan Budd , Derek Brian Dove , Alan Edward Rosenbluth
发明人： Russell Alan Budd , Derek Brian Dove , Alan Edward Rosenbluth
IPC分类号： G02B530
CPC分类号： G02B27/283
摘要： An apparatus for polarization conversion having a light source for supplying vertically and horizontally linearly polarized light to an optical path and a parabolic mirror disposed in the optical path and proximate to the light source. In different embodiments, the parabolic mirror has a mirror coating to induce a phase shift of 0°, 90°, or an arbitrary phase shift between incident light and reflected light. A polarizer means, preferably a reflective polarizer film, is disposed in the optical path for reflecting light of one of the linear polarizations and for transmitting the other linear polarization. Lastly, one or more waveplates are disposed in the optical path between the polarizer means and the parabolic mirror. The waveplates have opposing segments each having axes which are antiparallel to each other for recycling the reflected linear polarization by converting it to the transmitted polarization.
摘要翻译：一种用于偏振转换的装置，具有用于向光路提供垂直和水平线性偏振光的光源和设置在光路中并且靠近光源的抛物面镜。在不同的实施例中，抛物面反射镜具有镜面涂层，以引起0°，90°的相移或入射光与反射光之间的任意相移。在光路中设置偏振器装置，优选地是反射偏振片，用于反射线偏振之一的光，并用于透射另一线性偏振。最后，一个或多个波片设置在偏振器装置和抛物面镜之间的光路中。波片具有各自具有彼此反平行的轴的相对的段，用于通过将反射的线偏振转换成透射的偏振来再循环反射的线偏振。

3. 发明授权

US06193393B1 Apparatus and method for intensifying illumination brightness by time-superposing multiple pulsed light sources 失效
公开(公告)号：US06193393B1
公开(公告)日：2001-02-27
申请号：US09151178
申请日：1998-09-10
申请人： Derek Brian Dove , Alan Edward Rosenbluth , Kei-Hsiung Yang
发明人： Derek Brian Dove , Alan Edward Rosenbluth , Kei-Hsiung Yang
IPC分类号： F21V2304
CPC分类号： G02B27/141
摘要： An illumination apparatus including: at least two light sources, in which each of the light sources produce independent light beams; a controller for sequentially driving each of the light sources at a high power above their respective maximum rated power, to produce a respective light beam for each light source, and for leaving the remaining light sources at a low power below their respective maximum rated power, such that the time-average of the high and low power levels are set to a predetermined value for each of the light sources; and a combiner and director for sequentially combining each of the light beams from their respective light sources while being driven at high power into a common output beam with a fixed direction. Various combiner and directors are disclosed including tiltable mirrors under the control of the controller as well as optical systems.

4. 发明授权

US5777789A Efficient optical system for a high resolution projection display employing reflection light valves 失效
标题翻译：高效光学系统，用于采用反射光阀的高分辨率投影显示
公开(公告)号：US5777789A
公开(公告)日：1998-07-07
申请号：US934300
申请日：1997-09-19
申请人： George Liang-Tai Chiu , Thomas Mario Cipolla , Fuad Elias Doany , Derek Brian Dove , Alan Edward Rosenbluth , Rama Nand Singh , Janusz Stanislaw Wilczynski
发明人： George Liang-Tai Chiu , Thomas Mario Cipolla , Fuad Elias Doany , Derek Brian Dove , Alan Edward Rosenbluth , Rama Nand Singh , Janusz Stanislaw Wilczynski
IPC分类号： G02F1/13 , G02F1/1335 , H04N5/74 , H04N9/31 , G02B5/30 , G02B27/28 , G02F1/00 , G03B21/00
CPC分类号： H04N9/3105
摘要： An optical system is described consisting of reflection birefringent light valves, polarizing beam splitter, color image combining prisms, illumination system, projection lens, filters for color and contrast control, and screen placed in a configuration offering advantages for a high resolution color display. The illumination system includes a light tunnel having a cross-sectional shape corresponding to the geometrical shape of the spacial light modulator to optimize the amount of light projected onto the screen.
摘要翻译：描述了由反射双折射光阀，偏振分束器，彩色图像组合棱镜，照明系统，投影透镜，用于颜色和对比度控制的滤光器以及放置在为高分辨率彩色显示提供优点的配置中的屏幕组成的光学系统。照明系统包括具有对应于空间光调制器的几何形状的横截面形状的光通道，以优化投影到屏幕上的光量。

5. 发明授权

US07363611B2 Printing a mask with maximum possible process window through adjustment of the source distribution 有权
标题翻译：通过调整源分布打印具有最大可能过程窗口的面具
公开(公告)号：US07363611B2
公开(公告)日：2008-04-22
申请号：US11377957
申请日：2006-03-16
申请人： Alan Edward Rosenbluth
发明人： Alan Edward Rosenbluth
IPC分类号： G06F17/50 , G03C5/00
CPC分类号： G03F7/70125
摘要： A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined in terms of an allowed range for defining shapes. Constrained sets of intensity parameters are imposed. A first set of intensity parameters represents maximum possible intensities that can be permitted for overexposed tolerance positions. A second set of intensity parameters represents minimum possible intensities that can be permitted for underexposed tolerance positions. Optimum source intensities of incident beams are defined using a linear program and constraints. The optimum source intensities maximize an integrated range of dose and focal variations without causing printed shapes to depart from the allowed range. Apparatus are detailed and variations are described.
摘要翻译：使用来自不同方向的光照射光刻掩模，使得多个入射光束的强度提供根据用于定义形状的允许范围限定的最大可能的集成处理窗口。强制约束强度参数集。第一组强度参数表示可能允许曝光过度公差位置的最大可能强度。第二组强度参数表示可以允许曝光不足的公差位置的最小可能强度。入射光束的最佳光源强度使用线性程序和约束来定义。最佳的光源强度最大化剂量和焦点变化的集成范围，而不会使印刷形状偏离允许的范围。详细描述装置并描述变型。

6. 发明授权

US6064523A Apparatus for polarization conversion 失效
标题翻译：极化转换装置
公开(公告)号：US6064523A
公开(公告)日：2000-05-16
申请号：US106783
申请日：1998-06-29
申请人： Russell Alan Budd , Derek Brian Dove , Alan Edward Rosenbluth
发明人： Russell Alan Budd , Derek Brian Dove , Alan Edward Rosenbluth
IPC分类号： G02B5/30 , G02B27/28
CPC分类号： G02B27/283 , G02B5/3025
摘要： An apparatus for polarization conversion having a light source for supplying vertically and horizontally linearly polarized light to an optical path and a parabolic mirror disposed in the optical path and proximate to the light source. In different embodiments, the parabolic mirror has a mirror coating to induce a phase shift of 0.degree., 90.degree., or an arbitrary phase shift between incident light and reflected light. A polarizer, preferably a reflective polarizer film, is disposed in the optical path for reflecting light of one of the linear polarizations and for transmitting the other linear polarization. Lastly, one or more waveplates are disposed in the optical path between the polarizer and the parabolic mirror. The waveplates have opposing segments each having axes which are antiparallel to each other for recycling the reflected linear polarization by converting it to the transmitted polarization.
摘要翻译：一种用于偏振转换的装置，具有用于向光路提供垂直和水平线性偏振光的光源和设置在光路中并且靠近光源的抛物面镜。在不同的实施例中，抛物面反射镜具有镜面涂层，以引起0°，90°的相移或入射光和反射光之间的任意相移。偏振器，优选反射偏振膜，设置在光路中，用于反射线偏振之一的光，并用于透射另一线偏振。最后，一个或多个波片设置在偏振器和抛物面镜之间的光路中。波片具有各自具有彼此反平行的轴的相对的段，用于通过将反射的线偏振转换成透射的偏振来再循环反射的线偏振。

7. 发明授权

US5715081A Oblique viewing microscope system 失效
标题翻译：倾斜观察显微镜系统
公开(公告)号：US5715081A
公开(公告)日：1998-02-03
申请号：US680038
申请日：1996-07-15
申请人： Jean-Claude Andre Chastang , Kathryn Barr Kirtley , Alan Edward Rosenbluth
发明人： Jean-Claude Andre Chastang , Kathryn Barr Kirtley , Alan Edward Rosenbluth
IPC分类号： G02B5/18 , G02B21/00 , G02B21/08 , G02B27/46 , G02B21/06 , G01B9/02
CPC分类号： G02B21/082 , G02B21/0004 , G02B21/0016 , G02B27/46 , G02B5/1828
摘要： An improved oblique viewing microscope system including a diffraction grating that oscillates in the plane of the grating and/or an illuminator that oscillates the light rays directed to the object synchronized with the grating period. Additionally, a low frequency diffraction grating is also disclosed. The oscillation and/or low frequency grating provide a high resolution, multi-color image of an object viewed at an oblique angle. A dual oblique viewing microscope system is also disclosed to provide Koehler illumination.
摘要翻译：一种改进的倾斜观察显微镜系统，其包括在光栅平面中振荡的衍射光栅和/或使与光栅周期同步的指向物体的光线振荡的照明器。此外，还公开了一种低频衍射光栅。振荡和/或低频光栅提供以倾斜角度观看的物体的高分辨率，多色图像。还公开了双倾斜观察显微镜系统以提供科勒照明。

8. 发明授权

US07712071B2 Printing a mask with maximum possible process window through adjustment of the source distribution 失效
标题翻译：通过调整源分布打印具有最大可能过程窗口的面具
公开(公告)号：US07712071B2
公开(公告)日：2010-05-04
申请号：US11957587
申请日：2007-12-17
申请人： Alan Edward Rosenbluth
发明人： Alan Edward Rosenbluth
IPC分类号： G06F17/50 , G03C3/00
CPC分类号： G03F7/70125
摘要： A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined in terms of an allowed range for defining shapes. Constrained sets of intensity parameters are imposed. A first set of intensity parameters represents maximum possible intensities that can be permitted for overexposed tolerance positions. A second set of intensity parameters represents minimum possible intensities that can be permitted for underexposed tolerance positions. Optimum source intensities of incident beams are defined using a linear program and constraints. The optimum source intensities maximize an integrated range of dose and focal variations without causing printed shapes to depart from the allowed range. Apparatus are detailed and variations are described.
摘要翻译：使用来自不同方向的光照射光刻掩模，使得多个入射光束的强度提供根据用于定义形状的允许范围限定的最大可能的集成处理窗口。强制约束强度参数集。第一组强度参数表示可能允许曝光过度公差位置的最大可能强度。第二组强度参数表示可以允许曝光不足的公差位置的最小可能强度。入射光束的最佳光源强度使用线性程序和约束来定义。最佳的光源强度最大化剂量和焦点变化的集成范围，而不会使印刷形状偏离允许的范围。详细描述装置并描述变型。

9. 发明授权

US07127699B2 Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process 有权
标题翻译：用于优化在光学微光刻工艺中用于光学邻近校正的相干光源之和中使用的多个内核的方法
公开(公告)号：US07127699B2
公开(公告)日：2006-10-24
申请号：US10737626
申请日：2003-12-16
申请人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan Edward Rosenbluth , Shlomo Shlafman
发明人： Gregg M. Gallatin , Emanuel Gofman , Kafai Lai , Mark A. Lavin , Maharaj Mukherjee , Dov Ramm , Alan Edward Rosenbluth , Shlomo Shlafman
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method is provided for optimizing the number of kernels N used in a sum of coherent sources (SOCS) for optical proximity correction in an optical microlithography process, including setting the number of kernels N to a predetermined minimum value Nmin, where a determination is made as to whether an accuracy estimate of calculated intensity is within a tolerable value, and a determination is also made as to whether an added X/Y asymmetry estimate of the calculated intensity is negligible.
摘要翻译：提供一种用于优化在光学微光刻工艺中用于光学邻近校正的相干源（SOCS）之和中使用的内核数N的方法，包括将内核数N设置为预定的最小值Nmin，其中进行确定关于计算强度的精度估计是否在容许值内，并且还确定所计算的强度的添加的X / Y不对称估计是否可忽略。

10. 发明授权

US07057709B2 Printing a mask with maximum possible process window through adjustment of the source distribution 失效
标题翻译：通过调整源分布打印具有最大可能过程窗口的面具
公开(公告)号：US07057709B2
公开(公告)日：2006-06-06
申请号：US10727901
申请日：2003-12-04
申请人： Alan Edward Rosenbluth
发明人： Alan Edward Rosenbluth
IPC分类号： G03B27/72 , G03B27/32
CPC分类号： G03F7/70125
摘要： A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined in terms of an allowed range for defining shapes. Constrained sets of intensity parameters are imposed. A first set of intensity parameters represents maximum possible intensities that can be permitted for overexposed tolerance positions. A second set of intensity parameters represents minimum possible intensities that can be permitted for underexposed tolerance positions. Optimum source intensities of incident beams are defined using a linear program and constraints. The optimum source intensities maximize an integrated range of dose and focal variations without causing printed shapes to depart from the allowed range. Apparatus are detailed and variations are described.
摘要翻译：使用来自不同方向的光照射光刻掩模，使得多个入射光束的强度提供根据用于定义形状的允许范围限定的最大可能的集成处理窗口。强制约束强度参数集。第一组强度参数表示可能允许曝光过度公差位置的最大可能强度。第二组强度参数表示可以允许曝光不足的公差位置的最小可能强度。入射光束的最佳光源强度使用线性程序和约束来定义。最佳的光源强度最大化剂量和焦点变化的集成范围，而不会使印刷形状偏离允许的范围。详细描述装置并描述变型。

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