专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2005070715A Photographic aid used at photographing of child 审中-公开
标题翻译：儿童摄影拍摄照片
公开(公告)号：JP2005070715A
公开(公告)日：2005-03-17
申请号：JP2003338774
申请日：2003-08-22
申请人： Akitoshi Yoshida , 彰敏吉田
发明人： YOSHIDA AKITOSHI
IPC分类号： G03B17/56
摘要： PROBLEM TO BE SOLVED: To resolve the problem wherein it is difficult to take a "best" shot when photographing a child, especially an infant because the infant will not turn the face and eyes toward a camera due to his being absorbed in playing.
SOLUTION: A photographer inserts an index finger of the hand in a finger insertion hole and operates a doll 1 and a speaker 2 by depressing an operation button 6. A child's attention is attracted by this operation, to cause the child to turn the face and eyes toward the camera, and thus a best shot is taken.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了解决拍摄孩子，特别是婴儿时难以采取“最佳”拍摄的问题，因为婴儿由于被吸收而不会将脸部和眼睛转向相机播放。
解决方案：摄影者将手的食指插入手指插入孔中，通过按下操作按钮6操作玩偶1和扬声器2.通过该操作吸引小孩的注意力，使孩子转动脸部和眼睛朝向相机，因此拍摄得最好。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JPS61141681A Ceramic lining work 失效
标题翻译：陶瓷内衬工程
公开(公告)号：JPS61141681A
公开(公告)日：1986-06-28
申请号：JP26238184
申请日：1984-12-11
申请人： Nikken Sangyo Kk , Minoru Okamoto , Akitoshi Yoshida
发明人： TOKUNAGA SEIJI , OKAMOTO MINORU , YOSHIDA AKITOSHI , KITAJIMA AKIRA
IPC分类号： C04B37/02 , B21C37/00 , F27D1/10

3. 发明授权

US6106728A Slurry recycling system and method for CMP apparatus 失效
标题翻译：用于CMP设备的浆料回收系统和方法
公开(公告)号：US6106728A
公开(公告)日：2000-08-22
申请号：US103653
申请日：1998-06-23
申请人： Shinya Iida , Akitoshi Yoshida
发明人： Shinya Iida , Akitoshi Yoshida
IPC分类号： B24B37/00 , B24B57/02 , B24B1/00 , H01L21/00
CPC分类号： B24B37/04 , B24B57/02
摘要： A slurry recycling system for a CMP apparatus includes a flow path through which a slurry used in the CMP apparatus flows. A first filter is disposed in the flow path for filtering out foreign matter of a particle size of more than 0.5 microns mixed in said slurry. A second filter is preferably disposed in the flow path at a location upstream of and away from the first filter for filtering out foreign matter of a particle size of more than 10 microns mixed in said slurry. Preferably, provisions are made for a concentration adjuster for adjusting the concentration of abrasives in said slurry to substantially an initial value before use, and a pH adjuster for adjusting the pH of said slurry to substantially an initial pH value before use.
摘要翻译：用于CMP设备的浆料循环系统包括流化路径，CMP设备中使用的浆料通过该流路流动。第一过滤器设置在流路中，用于过滤在所述浆料中混合的大于0.5微米的粒度的杂质。优选地，第二过滤器在第一过滤器的上游和远离第一过滤器的位置处设置在流路中，用于过滤在所述浆料中混合的超过10微米的粒度的杂质。优选地，为浓缩调节剂提供用于将所述浆料中的研磨剂的浓度调节至使用前的初始值，以及用于在使用前将所述浆料的pH调节至基本上初始pH值的pH调节剂。

4. 发明授权

US08057039B2 Fundus imaging apparatus 有权
标题翻译：眼底成像装置
公开(公告)号：US08057039B2
公开(公告)日：2011-11-15
申请号：US12232879
申请日：2008-09-25
申请人： Junichi Akita , Akitoshi Yoshida , Satoshi Ishiko
发明人： Junichi Akita , Akitoshi Yoshida , Satoshi Ishiko
IPC分类号： A61B3/14
CPC分类号： A61B3/1025 , A61B5/0068
摘要： A fundus imaging apparatus comprises: an irradiation optical system comprising a light source which emits a laser beam and a scanner which two-dimensionally scans the laser beam on a fundus of an examinee's eye, the irradiation optical system being adapted to focus the laser beam emitted from the light source on the fundus to form a confocal region; an imaging optical system comprising a photo-receiving element which receives reflection light of the laser beam reflected from the fundus, the imaging optical system being adapted to focus the reflection light from the fundus and receive the reflection light by the photo-receiving element; and a beam restriction member placed in an optical path of the imaging optical system, the beam restriction member comprising: one of an opening through which part of the reflection light from the fundus outside the confocal region is allowed to pass toward the photo-receiving element and a mirror part which reflects the part of the reflection light from the fundus outside the confocal region toward the photo-receiving element; and a light shielding part which shields the reflection light from the fundus in the confocal region and the part of the reflection light from the fundus outside the confocal region. The light shielding part includes a first light shielding part placed in a conjugate position with a focus point of the laser beam on the fundus and a second light shielding part placed in a nearly conjugate position with the fundus and adapted to shield part of an optical path of the reflection light, the second light shielding part is formed around the first light shielding part.
摘要翻译：眼底成像装置包括：照射光学系统，包括发射激光束的光源和在受检眼睛的眼底上二维地扫描激光束的扫描仪，所述照射光学系统适于聚焦发射的激光束从眼底上的光源形成共焦区域; 成像光学系统，包括接收从眼底反射的激光束的反射光的光接收元件，所述成像光学系统适于聚焦来自眼底的反射光并且通过光接收元件接收反射光; 以及放置在所述成像光学系统的光路中的光束限制部件，所述光束限制部件包括：允许来自所述共焦区域外部的所述眼底的反射光的一部分通过所述开口朝向所述光接收元件以及反射镜部，其将来自共焦区域外的眼底的反射光的一部分反射到光接收元件; 以及遮光部，其遮蔽来自共焦区域中的眼底的反射光和来自共焦区域外的眼底的反射光的一部分。遮光部分包括放置在激光束的焦点在眼底上的共轭位置的第一遮光部分和与眼底几乎共轭的第二遮光部分，并适于屏蔽光路的一部分所述第二遮光部形成在所述第一遮光部的周围。

5. 发明申请

US20090086164A1 Fundus imaging apparatus 有权
标题翻译：眼底成像装置
公开(公告)号：US20090086164A1
公开(公告)日：2009-04-02
申请号：US12232879
申请日：2008-09-25
申请人： Junichi Akita , Akitoshi Yoshida , Satoshi Ishiko
发明人： Junichi Akita , Akitoshi Yoshida , Satoshi Ishiko
IPC分类号： A61B3/12 , A61B3/14
CPC分类号： A61B3/1025 , A61B5/0068
摘要： A fundus imaging apparatus comprises: an irradiation optical system comprising a light source which emits a laser beam and a scanner which two-dimensionally scans the laser beam on a fundus of an examinee's eye, the irradiation optical system being adapted to focus the laser beam emitted from the light source on the fundus to form a confocal region; an imaging optical system comprising a photo-receiving element which receives reflection light of the laser beam reflected from the fundus, the imaging optical system being adapted to focus the reflection light from the fundus and receive the reflection light by the photo-receiving element; and a beam restriction member placed in an optical path of the imaging optical system, the beam restriction member comprising: one of an opening through which part of the reflection light from the fundus outside the confocal region is allowed to pass toward the photo-receiving element and a mirror part which reflects the part of the reflection light from the fundus outside the confocal region toward the photo-receiving element; and a light shielding part which shields the reflection light from the fundus in the confocal region and the part of the reflection light from the fundus outside the confocal region. The light shielding part includes a first light shielding part placed in a conjugate position with a focus point of the laser beam on the fundus and a second light shielding part placed in a nearly conjugate position with the fundus and adapted to shield part of an optical path of the reflection light, the second light shielding part is formed around the first light shielding part.
摘要翻译：眼底成像装置包括：照射光学系统，包括发射激光束的光源和在受检眼睛的眼底上二维地扫描激光束的扫描仪，所述照射光学系统适于聚焦发射的激光束从眼底上的光源形成共焦区域; 成像光学系统，包括接收从眼底反射的激光束的反射光的光接收元件，所述成像光学系统适于聚焦来自眼底的反射光并且通过光接收元件接收反射光; 以及放置在所述成像光学系统的光路中的光束限制部件，所述光束限制部件包括：允许来自所述共焦区域外部的所述眼底的反射光的一部分通过所述开口朝向所述光接收元件以及反射镜部，其将来自共焦区域外的眼底的反射光的一部分反射到光接收元件; 以及遮光部，其遮蔽来自共焦区域中的眼底的反射光和来自共焦区域外的眼底的反射光的一部分。遮光部分包括放置在激光束的焦点在眼底上的共轭位置的第一遮光部分和与眼底几乎共轭的第二遮光部分，并适于屏蔽光路的一部分所述第二遮光部形成在所述第一遮光部的周围。

6. 发明授权

US06827752B2 Cerium oxide slurry, and method of manufacturing substrate 有权
标题翻译：氧化铈浆料及其制造方法
公开(公告)号：US06827752B2
公开(公告)日：2004-12-07
申请号：US10333643
申请日：2003-03-12
申请人： Haruki Nojo , Akitoshi Yoshida , Pascal Berar
发明人： Haruki Nojo , Akitoshi Yoshida , Pascal Berar
IPC分类号： C09G102
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1463
摘要： A problem to be solved is to provide a slurry that is capable of flattening an uneven film on a substrate with good precision, and that has good stability, not separating into two layers, solidifying through flocculated settling or undergoing changes in viscosity. This problem is solved by adding poly ammonium acrylates having different degrees of neutralization to one another as surfactants to a cerium oxide slurry containing cerium oxide particles, and suitably adjusting the total amount of polyacrylates added.
摘要翻译：要解决的问题是提供一种能够以高精度平坦化基板上的不均匀膜的浆料，并且具有良好的稳定性，不分离成两层，通过絮凝沉降或经历粘度变化而固化。通过将具有不同中和度的聚丙烯酸铵作为表面活性剂添加到含有氧化铈颗粒的二氧化铈浆料中，并适当地调节加入的聚丙烯酸酯的总量来解决这个问题。

7. 发明授权

US06530706B2 Paper feed unit 有权
标题翻译：供纸单元
公开(公告)号：US06530706B2
公开(公告)日：2003-03-11
申请号：US09842176
申请日：2001-04-26
申请人： Hiroyuki Sugimoto , Akitoshi Yoshida
发明人： Hiroyuki Sugimoto , Akitoshi Yoshida
IPC分类号： B65H500
CPC分类号： B65H9/004 , B65H3/0623 , B65H2301/42324 , B65H2301/512125 , B65H2403/72 , B65H2404/7231
摘要： A paper feed unit has a paper feed tray stacking sheets thereon, a primary paper feed roller and a secondary paper feed member, wherein an uppermost sheet among the sheets stacked on the paper feed tray is transferred toward the secondary paper feed member from the primary paper feed roller, a tip end of the sheet then contacts with the secondary paper feed member, and primary paper feed is then completed while the sheet is being bent. A counter rotation stop mechanism, which allows the primary paper feed roller to rotate in a paper feed direction but prevents the primary paper feed roller from rotating in a counter direction to the paper feed direction, and a rotation stop release mechanism, which releases a state in which the primary paper feed roller is prevented from rotating in the counter direction by the counter rotation stop mechanism, are also provided.
摘要翻译：供纸单元具有在其上堆叠纸张的供纸托盘，主要供纸辊和次要供纸部件，其中堆叠在供纸托盘上的纸张中的最上面的纸张从初级纸张传送到第二纸张供给部件进给辊，片材的顶端然后与次级进纸构件接触，然后在片材弯曲时完成原纸进给。一种反向旋转停止机构，其允许一次供纸辊在供纸方向上旋转，但是防止主要供纸辊沿与供纸方向相反的方向旋转;以及旋转停止释放机构，其释放状态通过反转止转机构防止主纸供给辊被反向旋转。

8. 发明授权

US06290580B1 Polishing method for silicon wafers which uses a polishing compound which reduces stains 失效
标题翻译：使用减少污渍的抛光化合物的硅晶片的抛光方法
公开(公告)号：US06290580B1
公开(公告)日：2001-09-18
申请号：US09390772
申请日：1999-09-07
申请人： Hiroaki Tanaka , Akitoshi Yoshida , Yoshihisa Ogawa , Yusuke Inoue , Shunji Hakomori
发明人： Hiroaki Tanaka , Akitoshi Yoshida , Yoshihisa Ogawa , Yusuke Inoue , Shunji Hakomori
IPC分类号： B24B100
CPC分类号： B24B37/0056 , B24B9/065 , B24B37/044 , C09G1/02
摘要： The present invention provides a polishing compound which does not make stain grow on the surface of work-piece comprising, the dispersion containing 1-30 wt. % of metal oxide particles having 8-500 nm average diameter, acid or alkali and salt, and whose pH is 7-12. Desirably said polishing compound is the compound in which water soluble organic solvent is contained. Further, present invention provides edge polishing method and surface polishing method by use of said polishing compound.
摘要翻译：本发明提供了在工件表面上不会使污渍生长的抛光化合物，其包含：含有1-30wt。％的平均直径为8-500nm的金属氧化物颗粒，酸或碱和盐，其pH为7-12。理想地，所述抛光化合物是含有水溶性有机溶剂的化合物。此外，本发明通过使用所述研磨化合物提供边缘抛光方法和表面抛光方法。

9. 发明授权

US4006030A Method of preventing deterioration of inorganic substrate surface 失效
标题翻译：防止无机基材表面变质的方法
公开(公告)号：US4006030A
公开(公告)日：1977-02-01
申请号：US594039
申请日：1975-07-08
申请人： Akitoshi Yoshida , Koichiro Yanagida , Tadanobu Maruyama
发明人： Akitoshi Yoshida , Koichiro Yanagida , Tadanobu Maruyama
IPC分类号： C04B41/50 , C04B41/68 , C04B41/22
CPC分类号： C04B41/009 , C04B41/5089 , C04B41/68
摘要： The surface of an inorganic substrate comprising cement, concrete, gypsum or mixtures thereof is treated with a silicate solution or a silica sol comprising a monovalent alkali metal containing component, an ammonium containing component and a silica containing component at a molar ratio of 1:1.about. 10:4.about.5000 corresponding to M.sub.2 O:[R.sub.1 R.sub.2 R.sub.3 R.sub.4 N].sub.2 O: SiO.sub.2 wherein M is Li, K or Na; and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each represent a hydrocarbon group or an alkanol group. The underlying inorganic substrate thus has a modified surface layer thereon having a thickness of less than 50 mm, which functions to protect and prevent deterioration of the underlying surface of said inorganic substrate.
摘要翻译：包括水泥，混凝土，石膏或其混合物的无机基材的表面用硅酸盐溶液或含有一价碱金属的组分，含铵组分和含二氧化硅的组分的硅溶胶以1:1的摩尔比进行处理对应于M2O的差分10：4差异5000：[R1R2R3R4N] 2O：SiO2，其中M是Li，K或Na; 并且R 1，R 2，R 3和R 4各自表示烃基或链烷醇基。因此，底层无机基材在其上具有厚度小于50mm的改性表面层，其用于保护和防止所述无机基材的下表面的劣化。

10. 发明授权

US4002590A Coating composition for thick coating 失效
标题翻译：涂层组合物用于厚涂层
公开(公告)号：US4002590A
公开(公告)日：1977-01-11
申请号：US526409
申请日：1974-11-22
申请人： Akitoshi Yoshida , Masaharu Kosaka , Shigeki Inoue
发明人： Akitoshi Yoshida , Masaharu Kosaka , Shigeki Inoue
IPC分类号： C01B33/14 , C04B28/24 , C04B41/68 , C09D1/00 , C09D1/04 , C08K3/00 , C08L25/14
CPC分类号： C04B28/24 , C09D1/04 , C04B2111/00482
摘要： A coating composition for thick coating prepared by adding an aggregate to a coating liquid containing 5 to 40% by weight as SiO.sub.2 of a coloidal silica and 3 to 40% by weight of dissolved and/or finely dispersed organic polymer, having an SiO.sub. 2 /M.sub.2 O mole ratio (in which M is a monovalent alkali metal atom) of at least 7, and having a viscosity lower than 100 c.p. at 20.degree. C when kept in the sealed state at 50.degree. C for 10 days.Said coating composition being especially suitable for coating of 1 - 20 kg/m.sup.2 in thickness and storable for a long period of time with an excellent stability, giving a cured coating having high water resistance, good weather resistance, high adhesive strength and no efflorescence in its surface.
摘要翻译：通过将聚集体添加至含有5〜40重量％的作为SiO 2的外加二氧化硅和3〜40重量％的溶解和/或分散有机聚合物的SiO 2 / M2O摩尔比（其中M为单价碱金属原子）为至少7，粘度低于100cp 在20℃下保存在密封状态，在50℃下10天。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式