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    • 1. 发明专利
    • Titanium-coating agent
    • 钛涂料
    • JP2005200392A
    • 2005-07-28
    • JP2004039008
    • 2004-01-15
    • Akio Shima昭夫 嶋
    • SHIMA AKIO
    • A61L2/18A01N25/06A01N31/02A01N59/16C09D1/00C09D5/14
    • PROBLEM TO BE SOLVED: To develop a spraying agent of a modified titanic acid-coating agent by mixing water soluble titanic acid solution with titanium oxide to obtain lasting evaporation effects of sterilizing, antibacterial, bactericidal and deodorizing properties.
      SOLUTION: This titanium-coating agent is obtained by mixing an alcohol with titanium oxide and other solution, and used by spreading the agent on the outside and inside walls and inside of the rooms of every building to improve anti-bacterial, bactericidal. deodorizing and anti-fungal properties, imparted with lasting property, and preventing the air-oxidation of a metal surface as capable of recovering its lustrous surface by simple wiping on getting cloudy.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:通过将水溶性钛酸溶液与氧化钛混合来开发改性钛酸涂层剂的喷雾剂,以获得灭菌,抗菌,杀菌和除臭性能的持久蒸发效果。 解决方案:该钛涂层剂通过将醇与氧化钛和其它溶液混合而获得,并通过在每个建筑物的房间的外部和内部和内部铺展剂来使用,以改善抗菌,杀菌 。 除臭和抗真菌性质,具有持久的性能,并且防止金属表面的空气氧化,因为能够通过简单地在多云的时候擦拭来恢复其光泽的表面。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明申请
    • MANUFACTURE OF SEMICONDUCTOR DEVICE
    • 半导体器件的制造
    • US20080145987A1
    • 2008-06-19
    • US11943639
    • 2007-11-21
    • Akio Shima
    • Akio Shima
    • H01L21/336
    • H01L21/823814H01L21/26513H01L21/268H01L21/8249H01L27/1052
    • A reflectance-controlling layer whose reflectance to irradiation of laser light becomes lower as a thickness thereof becomes thinner is formed on a semiconductor substrate having a first region and a second region. Thereafter, the reflectance-controlling layer on the first region is etched. Then, a laser light is irradiated to the semiconductor substrate to anneal an n−-type semiconductor region and an n+-type semiconductor region of the first region. In the same manner, after the reflectance-controlling layer is formed on the semiconductor substrate, the reflectance-controlling layer on the second region is etched. Then, a laser light is irradiated to the semiconductor substrate to anneal a p−-type semiconductor region and a p+-type semiconductor region of the second region.
    • 在具有第一区域和第二区域的半导体衬底上形成反射率控制层,其反射率随着其厚度变薄而变低。 此后,蚀刻第一区域上的反射率控制层。 然后,将激光照射到半导体衬底上,以退火第一区域的n + O - 型半导体区域和n + + + / - 半导体区域。 以相同的方式,在半导体衬底上形成反射控制层之后,蚀刻第二区域上的反射控制层。 然后,将激光照射到半导体衬底上,以退火第二区域的p + / - 型半导体区域和p + + + / - 半导体区域。