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    • 7. 发明申请
    • SEMICONDUCTOR DEVICE HAVING LATERAL DIODE
    • 具有横向二极管的半导体器件
    • US20120032313A1
    • 2012-02-09
    • US13197719
    • 2011-08-03
    • Takao YAMAMOTONorihito TokuraHisato KatoAkio Nakagawa
    • Takao YAMAMOTONorihito TokuraHisato KatoAkio Nakagawa
    • H01L29/861
    • H01L29/868H01L27/0664H01L29/0615H01L29/0692H01L29/0878H01L29/1095H01L29/405H01L29/42368H01L29/7394H01L29/7824
    • A semiconductor device having a lateral diode includes a semiconductor layer, a first semiconductor region in the semiconductor layer, a contact region having an impurity concentration greater than that of the first semiconductor region, a second semiconductor region located in the semiconductor layer and separated from the contact region, a first electrode electrically connected through the contact region to the first semiconductor region, and a second electrode electrically connected to the second semiconductor region. The second semiconductor region includes a low impurity concentration portion, a high impurity concentration portion, and an extension portion. The second electrode forms an ohmic contact with the high impurity concentration portion. The extension portion has an impurity concentration greater than that of the low impurity concentration portion and extends in a thickness direction of the semiconductor layer.
    • 具有横向二极管的半导体器件包括半导体层,半导体层中的第一半导体区域,具有大于第一半导体区域的杂质浓度的杂质浓度的接触区域,位于半导体层中并与该半导体层分离的第二半导体区域 接触区域,通过接触区域电连接到第一半导体区域的第一电极和与第二半导体区域电连接的第二电极。 第二半导体区域包括低杂质浓度部分,高杂质浓度部分和延伸部分。 第二电极与高杂质浓度部分形成欧姆接触。 延伸部分的杂质浓度大于低杂质浓度部分的杂质浓度,并且在半导体层的厚度方向上延伸。
    • 10. 发明授权
    • Trench-gated MOSFET including schottky diode therein
    • 沟槽栅MOSFET,其中包括肖特基二极管
    • US07564097B2
    • 2009-07-21
    • US11740045
    • 2007-04-25
    • Syotaro OnoAkio NakagawaYusuke KawaguchiYoshihiro Yamaguchi
    • Syotaro OnoAkio NakagawaYusuke KawaguchiYoshihiro Yamaguchi
    • H01L29/94
    • H01L29/7813H01L29/1095
    • Disclosed is a trench MOSFET, including: a trench gate structure having a gate electrode and a gate insulating film; an n-type diffusion layer formed to face the gate electrode via the gate insulating film at an upper portion of the trench; a p-type base layer formed to face the gate electrode via the gate insulating film at a lower portion than the upper portion; an n-type epitaxial layer locating to face the gate electrode via the gate insulating film at a further lower portion than the lower portion; a metal layer formed departing from the trench in parallel with a depth direction of the trench, penetrating the n-type diffusion layer and the p-type base layer, to reach the n-type epitaxial layer; and a p-type layer with higher impurity concentration than the p-type base layer, locating to be in contact with the p-type base layer and the metal layer.
    • 公开了一种沟槽MOSFET,其包括:具有栅极电极和栅极绝缘膜的沟槽栅极结构; 形成为在沟槽的上部经由栅极绝缘膜与栅电极对置的n型扩散层; p型基底层,其在比上部更低的一部分处经由栅极绝缘膜形成为面对栅电极; n型外延层,其定位成在比下部更下方的一部分经由栅极绝缘膜面对栅电极; 与沟槽的深度方向平行地形成的穿过n型扩散层和p型基底层的金属层,以到达n型外延层; 以及比p型基底层高的杂质浓度的p型层,与p型基底层和金属层接触。