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    • 3. 发明授权
    • Semiconductor light emitting device having gallium nitride based compound semiconductor layer
    • 具有氮化镓基化合物半导体层的半导体发光器件
    • US06822270B2
    • 2004-11-23
    • US10360143
    • 2003-02-07
    • Norikatsu KoideAkio AioiTakeshi Nishino
    • Norikatsu KoideAkio AioiTakeshi Nishino
    • H01L3300
    • H01L33/32H01L33/12
    • The semiconductor light emitting device has a gallium nitride base compound semiconductor layer expressed by a general formula of InxGayAlzN (x+y+z=1, 0≦x≦1, 0≦y≦1, 0≦z≦1). A second intermediate layer is provided between a GaN layer and a light emitting layer, and the second intermediate layer has a lattice constant closer to that of the light emitting layer than that of the GaN layer. As such, when a substrate such as Si substrate having a smaller coefficient of thermal expansion than the nitride semiconductor film is employed, occurrence of cracks is prevented and good crystallinity of the nitride semiconductor film is assured, and accordingly, a long-life and high-luminance nitride base semiconductor light emitting device is obtained.
    • 半导体发光器件具有由通式InxGayAlzN(x + y + z =1,0.0≤x≤1,0<= y <=1,0,0≤z≤1)表示的氮化镓基化合物半导体层, = 1)。 第二中间层设置在GaN层和发光层之间,第二中间层的晶格常数比GaN层的晶格常数更接近于发光层的晶格常数。 因此,当采用具有比氮化物半导体膜更小的热膨胀系数的诸如Si衬底的衬底时,可以防止发生裂纹,并且确保氮化物半导体膜的良好的结晶度,因此,长寿命和高 获得了高亮度氮化物基底半导体发光器件。