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1. 发明申请

US20090253194A1 DNA ANALYSIS APPARATUS 有权
标题翻译： DNA分析仪器
公开(公告)号：US20090253194A1
公开(公告)日：2009-10-08
申请号：US12419399
申请日：2009-04-07
申请人： Hideki KAMBARA , Akihiko KISHIMOTO
发明人： Hideki KAMBARA , Akihiko KISHIMOTO
IPC分类号： C12M1/34 , G01N21/64
CPC分类号： C12Q1/6869 , B01J2219/00659 , B01J2219/00722 , B01L7/52 , C12Q2565/301 , C12Q2563/103 , C12Q2535/101
摘要： Accurate and sensitive sequencing in pyrosequencing is achieved by allowing complementary strand synthesis reaction to proceed homogeneously and completely in a short time while performing luminescence reaction for a sufficiently long time. DNA as a sequencing target is immobilized on the surface of a solid supporter. Nucleic acid substrates are injected from a dispenser to the supporter site where complementary strand synthesis is in turn performed rapidly and completely in a short time under a small reaction volume. Next, the supporter together with the product thereon is moved into a luminescence reaction solution where luminescence reaction is in turn performed. Thus, a DNA complementary strand synthesis reaction site and a luminescence reaction site are completely separated. The-supporter surface is also washed by dipping the supporter in the luminescence reaction solution that contains a luminescence reagent and an enzyme that degrades redundant nucleic acid substrates.
摘要翻译：焦磷酸测序中的精确和灵敏的测序通过使互补链合成反应在短时间内均匀且完全地进行，同时进行发光反应足够长的时间来实现。作为测序靶的DNA被固定在固体支持物的表面上。将核酸底物从分配器注入到支架位置，其中互补链合成在短时间内在小的反应体积下快速且完全地进行。接下来，将支持物与其上的产物一起移动到依次进行发光反应的发光反应溶液中。因此，DNA互补链合成反应位点和发光反应位点完全分离。将支持体浸渍在含有发光试剂的发光反应溶液和降解冗余核酸底物的酶中也可以洗涤载体表面。

2. 发明授权

US3950455A Method for graft polymerization of diene polymer 失效
标题翻译：二烯聚合物接枝聚合方法
公开(公告)号：US3950455A
公开(公告)日：1976-04-13
申请号：US483107
申请日：1974-06-26
申请人： Takehiko Okamoto , Akihiko Kishimoto , Masakazu Inoue , Ikuo Nagai , Mitsunobu Otani
发明人： Takehiko Okamoto , Akihiko Kishimoto , Masakazu Inoue , Ikuo Nagai , Mitsunobu Otani
IPC分类号： C08F279/02 , C08F285/00 , C08F291/02
CPC分类号： C08F285/00 , C08F279/02 , Y10S525/91
摘要： High impact resistant thermoplastic resins are produced in three steps: (a) graft polymerizing a minor amount of unsaturated monomer onto a major amount of diene type rubber polymer in latex form, (b) mixing the grafted diene type rubber latex with a monomer or monomers, extracting the grafted rubber polymer particles into the monomer phase and separating and discarding the water phase to obtain a grafted rubber polymer particle dispersed monomer solution, and (c) bulk polymerizing the resulting rubber polymer particle dispersed monomer solution.
摘要翻译：高耐冲击热塑性树脂分三个步骤生产：（a）将少量不饱和单体接枝聚合到胶乳形式的主要量的二烯型橡胶聚合物上，（b）将接枝二烯型橡胶胶乳与单体或单体将接枝的橡胶聚合物颗粒提取到单体相中并分离和丢弃水相，得到接枝橡胶聚合物颗粒分散单体溶液，和（c）将所得橡胶聚合物颗粒分散的单体溶液本体聚合。

3. 发明授权

US5500478A Housing and resin composition including polyether ester amide, polycarbonate resin and modified vinyl polymer 失效
标题翻译：外壳和树脂组合物，包括聚醚酯酰胺，聚碳酸酯树脂和改性乙烯基聚合物
公开(公告)号：US5500478A
公开(公告)日：1996-03-19
申请号：US240270
申请日：1994-05-10
申请人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
发明人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
IPC分类号： C08L25/06 , C08L51/04 , C08L67/00 , C08L69/00 , C08L71/12 , C08L77/00 , C08L77/12 , G11B23/03 , C08G69/44
CPC分类号： G11B23/0315 , C08L25/06 , C08L51/04 , C08L69/00 , C08L71/123 , C08L77/12 , C08L67/00 , C08L77/00 , Y10S525/905
摘要： Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, are permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.
摘要翻译：由1-40重量％的聚醚酯酰胺（A）和99-60重量％的选自苯乙烯基树脂的至少一种热塑性树脂（B）组成的热塑性树脂组合物，还含有（C）0.1-10％的经修饰的含有羧基的乙烯基聚合物是永久抗静电的，由抗冲击性，耐热成型性以及模制品的外观和光泽以及适合于光学或磁性记录介质的外壳的机械特性优异。

4. 发明授权

US5115456A Mask for exposing wafer with radiation and its exposing method 失效
标题翻译：用辐射辐射掩蔽面罩及其暴露方法
公开(公告)号：US5115456A
公开(公告)日：1992-05-19
申请号：US447865
申请日：1989-12-08
申请人： Takeshi Kimura , Shinji Kuniyoshi , Akihiko Kishimoto , Takashi Soga
发明人： Takeshi Kimura , Shinji Kuniyoshi , Akihiko Kishimoto , Takashi Soga
IPC分类号： H01L21/30 , G03F7/20 , H01L21/027
CPC分类号： G03F1/22 , G03F7/70475
摘要： A mask for exposing a wafer with radiation and its exposition method in which the radiation exposure mask is provided with at least two radiation exposure windows which each include a mask pattern of a smaller pattern area obtained by dividing a pattern area constituting an integrating circuit chip into a plurality of the areas, and a semiconductor wafer is exposed with radiation while the radiation exposure mask is intermittently moved by a distance of the size of the small pattern area.

5. 发明授权

US5886097A Housing and resin composition including polyether ester amide, thermoplastic resin, vinyl polymer and halogen 失效
标题翻译：外壳和树脂组合物，包括聚醚酯酰胺，热塑性树脂，乙烯基聚合物和卤素
公开(公告)号：US5886097A
公开(公告)日：1999-03-23
申请号：US932286
申请日：1997-09-17
申请人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
发明人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
IPC分类号： C08L25/06 , C08L51/04 , C08L67/00 , C08L69/00 , C08L71/12 , C08L77/00 , C08L77/12 , G11B23/03 , C08L53/00
CPC分类号： G11B23/0315 , C08L25/06 , C08L51/04 , C08L69/00 , C08L71/123 , C08L77/12 , C08L67/00 , C08L77/00
摘要： Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, are permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.
摘要翻译：由1-40重量％的聚醚酯酰胺（A）和99-60重量％的选自苯乙烯基树脂的至少一种热塑性树脂（B）组成的热塑性树脂组合物，还含有（C）0.1-10％的经修饰的含有羧基的乙烯基聚合物是永久抗静电的，由抗冲击性，耐热成型性以及模制品的外观和光泽以及适合于光学或磁性记录介质的外壳的机械特性优异。

6. 发明授权

US5338795A Housing and thermoplastic resin compositions including polyether ester amide, styrene based resin and vinyl copolymer 失效
标题翻译：包括聚醚酯酰胺，苯乙烯基树脂和乙烯基共聚物的壳和热塑性树脂组合物
公开(公告)号：US5338795A
公开(公告)日：1994-08-16
申请号：US980106
申请日：1992-11-23
申请人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
发明人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
IPC分类号： C08L25/06 , C08L51/04 , C08L67/00 , C08L69/00 , C08L71/12 , C08L77/00 , C08L77/12 , G11B23/03
CPC分类号： G11B23/0315 , C08L25/06 , C08L51/04 , C08L69/00 , C08L71/123 , C08L77/12 , C08L67/00 , C08L77/00 , Y10S525/905
摘要： Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, are permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.
摘要翻译：由1-40重量％的聚醚酯酰胺（A）和99-60重量％的选自苯乙烯基树脂的至少一种热塑性树脂（B）组成的热塑性树脂组合物，还含有（C）0.1-10％的经修饰的含有羧基的乙烯基聚合物是永久抗静电的，由抗冲击性，耐热成型性以及模制品的外观和光泽以及适合于光学或磁性记录介质的外壳的机械特性优异。

7. 发明授权

US4543390A Antistatic resinous compositions 失效
标题翻译：抗静电树脂组合物
公开(公告)号：US4543390A
公开(公告)日：1985-09-24
申请号：US683874
申请日：1984-12-20
申请人： Masayuki Tanaka , Katsuharu Morioka , Akihiko Kishimoto
发明人： Masayuki Tanaka , Katsuharu Morioka , Akihiko Kishimoto
IPC分类号： C08L51/04 , C08L51/08
CPC分类号： C08L51/04
摘要： An antistatic resinours composition comprising (A) graft copolymers prepared by emulsion polymerization of (a) monomer mixture consisting of (i) from 50 to 100 percents by weight of monomers having polyalkylene oxide chains and (ii) from 50 to 0 percents by weight of vinyl monomers in the presence of rubbers and (B) thermoplastic resins compatible with the graft copolymers, has permanent antistatic performances, superior mechanical properties and high flowability.
摘要翻译：一种抗静电树脂组合物，其包含（A）通过（a）由（i）50-100重量％的具有聚环氧烷链的单体和（ii）50至0重量％乙烯基单体和（B）与接枝共聚物相容的热塑性树脂具有永久抗静电性能，优异的机械性能和高流动性。

8. 发明申请

US20070054283A1 DNA sequencing method using step by step reaction 审中-公开
标题翻译： DNA测序方法采用逐步反应
公开(公告)号：US20070054283A1
公开(公告)日：2007-03-08
申请号：US11356187
申请日：2006-02-17
申请人： Akihiko Kishimoto , Hideki Kambara , Tomoharu Kajiyama , Guohua Zhou
发明人： Akihiko Kishimoto , Hideki Kambara , Tomoharu Kajiyama , Guohua Zhou
IPC分类号： C12Q1/68
CPC分类号： C12Q1/6869 , C12Q2537/149
摘要： The present invention provides an inexpensive DNA sequencing method with high-sensitivity. The method of the present invention comprising the steps of, adding an given amount of dATP for step by step complementary strand synthesis and subtracting the background luminescence intensity caused by dATP from the measured luminescence intensity to obtain the luminescence intensity involved in complementary strand synthesis.
摘要翻译：本发明提供了具有高灵敏度的便宜的DNA测序方法。本发明的方法包括以下步骤：加入给定量的dATP进行逐步互补链合成，并从测量的发光强度减去由dATP引起的背景发光强度，以获得互补链合成中所涉及的发光强度。

9. 发明授权

US08975066B2 DNA analysis apparatus 有权
标题翻译： DNA分析仪器
公开(公告)号：US08975066B2
公开(公告)日：2015-03-10
申请号：US12419399
申请日：2009-04-07
申请人： Hideki Kambara , Akihiko Kishimoto
发明人： Hideki Kambara , Akihiko Kishimoto
IPC分类号： C12M1/34 , C12M3/00 , C12Q1/68 , B01L7/00
CPC分类号： C12Q1/6869 , B01J2219/00659 , B01J2219/00722 , B01L7/52 , C12Q2565/301 , C12Q2563/103 , C12Q2535/101
摘要： Accurate and sensitive sequencing in pyrosequencing is achieved by allowing complementary strand synthesis reaction to proceed homogeneously and completely in a short time while performing luminescence reaction for a sufficiently long time. DNA as a sequencing target is immobilized on the surface of a solid support. Nucleic acid substrates are injected from a dispenser to the support site where complementary strand synthesis is in turn performed rapidly and completely in a short time under a small reaction volume. Next, the support together with the product thereon is moved into a luminescence reaction solution where luminescence reaction is in turn performed. Thus, a DNA complementary strand synthesis reaction site and a luminescence reaction site are completely separated. The support surface is also washed by dipping the support in the luminescence reaction solution that contains a luminescence reagent and an enzyme that degrades redundant nucleic acid substrates.
摘要翻译：焦磷酸测序中的精确和灵敏的测序通过使互补链合成反应在短时间内均匀且完全地进行，同时进行发光反应足够长的时间来实现。作为测序靶的DNA被固定在固体支持物的表面上。将核酸底物从分配器注射到支持部位，其中互补链合成在短时间内在小反应体积下快速且完全地进行。接下来，将载体与其上的产物一起移动到进行发光反应的发光反应溶液中。因此，DNA互补链合成反应位点和发光反应位点完全分离。通过将载体浸渍在含有发光试剂的发光反应溶液和降解冗余核酸底物的酶中也可以洗涤载体表面。

10. 发明授权

US5834561A Instrinsically antistatic thermoplastic resin compositions housing and resin composition including polyether ester amide, polyphenylene ether resin and vinyl polymer 失效
标题翻译：外壳和树脂组合物，包括聚醚酯酰胺，聚苯醚树脂和乙烯基聚合物
公开(公告)号：US5834561A
公开(公告)日：1998-11-10
申请号：US560821
申请日：1995-11-20
申请人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
发明人： Tadao Fukumoto , Masatoshi Iwamoto , Akihiko Kishimoto
IPC分类号： C08L25/06 , C08L51/04 , C08L67/00 , C08L69/00 , C08L71/12 , C08L77/00 , C08L77/12 , G11B23/03 , C08L53/00
CPC分类号： G11B23/0315 , C08L25/06 , C08L51/04 , C08L69/00 , C08L71/123 , C08L77/12 , C08L67/00 , C08L77/00 , Y10S525/905
摘要： Thermoplastic resin compositions consisting of 1 to 40 wt % a polyether ester amide (A) and 99 to 60 wt % of at least one thermoplastic resin (B) selected from styrene based resins, further containing (C) 0.1-10% of a modified vinyl polymer containing carboxyl groups, area permanently antistatic, excellent in mechanical properties represented by impact resistance, heat resistance moldability and also in the appearance and gloss of the moldings, and suitable for housings of optical or magnetic recording media.
摘要翻译：由1-40重量％的聚醚酯酰胺（A）和99-60重量％的选自苯乙烯基树脂的至少一种热塑性树脂（B）组成的热塑性树脂组合物，还含有（C）0.1-10％的经修饰的含有羧基的乙烯基聚合物，面积永久抗静电，由耐冲击性，耐热成型性以及模制品的外观和光泽度表现的机械性能优异，并且适用于光学或磁记录介质的外壳。

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