专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100086212A1 Method and System for Dispositioning Defects in a Photomask 审中-公开
标题翻译：在光掩模中配置缺陷的方法和系统
公开(公告)号：US20100086212A1
公开(公告)日：2010-04-08
申请号：US12524668
申请日：2007-01-29
申请人： Peter Daniel Buck , Richard Walter Gladhill , Roy Eric Staveley , Joseph Adam Straub , Craig Alan West
发明人： Peter Daniel Buck , Richard Walter Gladhill , Roy Eric Staveley , Joseph Adam Straub , Craig Alan West
IPC分类号： G06K9/46
CPC分类号： G03F1/84 , G03F1/00 , G06T7/0004 , G06T2207/10056 , G06T2207/30148
摘要： A method and system for dispositioning defects in a photomask are provided. A method for dispositioning defects in a photomask includes analyzing photomask topography data including data representing a design topology of at least a first photomask, the first photomask corresponding to a first layer in a photolithographic process. Based at least on the analysis, one or more safe regions of the first photomask are identified, each safe region corresponding to a region of the first layer insensitive to potential defects located in the first photomask.
摘要翻译：提供了一种用于配置光掩模中的缺陷的方法和系统。用于配置光掩模中的缺陷的方法包括分析光掩模地形数据，其包括表示至少第一光掩模的设计拓扑的数据，所述第一光掩模在光刻工艺中对应于第一层。至少基于分析，识别出第一光掩模的一个或多个安全区域，每个安全区对应于对位于第一光掩模中的潜在缺陷不敏感的第一层的区域。

2. 发明申请

US20130126756A1 FLUORESCENCE IMAGING APPARATUS AND METHOD 审中-公开
标题翻译：荧光成像装置及方法
公开(公告)号：US20130126756A1
公开(公告)日：2013-05-23
申请号：US13574363
申请日：2011-01-24
申请人： Chunhui (Chris) Xu , Scott Howard , Adam Straub , Guanghao Zhu
发明人： Chunhui (Chris) Xu , Scott Howard , Adam Straub , Guanghao Zhu
IPC分类号： G01N21/64 , G02F1/01
CPC分类号： G01N21/64 , G01N21/6408 , G01N21/6456 , G02F1/01
摘要： A fluorescence emission imaging method and apparatus allows for high frame rate imaging in scattering medium as well as for fluorescence, phosphorescence, or luminescence lifetime imaging, time-resolved fluorescence, phosphorescence, or luminescence lifetime spectroscopy and imaging. A method involves providing an illumination beam, propagating the illumination beam to a light modulator array, modulating the illumination beam so as to generate an array of point sources, wherein each of the point sources is modulated at a frequency, imaging the modulated illumination beam on the object, and detecting a fluorescent, phosphorescent, or luminescent emission from the object. An optical imaging component in the form of a modulation mask has multiple bands. Each band has alternating transmissive and/or reflective and/or absorptive regions that are patterned such that light scanned over a band will be modulated at a band-related frequency.
摘要翻译：荧光发射成像方法和装置允许散射介质中的高帧率成像以及荧光，磷光或发光寿命成像，时间分辨荧光，磷光或发光寿命光谱和成像。一种方法包括提供照明光束，将照明光束传播到光调制器阵列，调制照明光束以产生点光源阵列，其中每个点光源以一个频率被调制，对被调制的照明光束进行成像并且检测来自物体的荧光，磷光或发光发射。调制掩模形式的光学成像部件具有多个带。每个带具有交替的透射和/或反射和/或吸收区域，其被图案化，使得在频带上扫描的光将以带相关频率被调制。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式