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1. 发明申请

WO1997000295A1 CARBON BLACK GRAFT POLYMER, PROCESS FOR THE PRODUCTION OF THE POLYMER AND USE THEREOF 审中-公开
标题翻译：碳黑玻璃聚合物，生产聚合物的方法及其用途
公开(公告)号：WO1997000295A1
公开(公告)日：1997-01-03
申请号：PCT/JP1996001645
申请日：1996-06-14
申请人： NIPPON SHOKUBAI CO., LTD. , IKEDA, Hayato , ANDO, Nobuyuki , ASAKO, Yoshinobu , ANAN, Kazuhiro , MATSUDA, Tatsuhito , ARAKAWA, Motohiro , OHTSUKI, Nobuaki , AWAJI, Toshio , TORIBUCHI, Hironobu , KUSHINO, Mitsuo , UEHARA, Keiichi , MORI, Yoshikuni
发明人： NIPPON SHOKUBAI CO., LTD.
IPC分类号： C09C01/56
CPC分类号： B41M5/385 , C08F292/00 , C08K9/08 , C09D11/324 , G02F1/133512 , G03C7/12 , G03F7/0007 , G03F7/0388 , G03G9/08786 , G03G9/0904 , G03G9/122 , Y10T428/2989 , Y10T428/2998
摘要： A carbon black graft polymer that is prepared by mixing a block or graft polymer comprising a segment (A) having groups reactive with the functional groups present on the surface of carbon black and a segment (B) having a skeletal structure different from that of the segment (A) with carbon black under heating and is excellent in the dispersibility in various media, pigmentation and light screening properties. A graft polymer produced by further incorporating an ethylenically unsaturatred double bond and/or a carbonyl group into the graft chain of the above graft polymer exhibits also photosensitivity, alkali developability, insulating characteristics or the like, thus being useful as a black photo-curable resin composition suitable for forming the black matrix of a color filter.
摘要翻译：通过混合包含具有与存在于炭黑表面上的官能团反应的基团的链段（A）的嵌段或接枝聚合物和具有不同于碳黑的骨架结构的链段（B）而制备的炭黑接枝聚合物片段（A）加热炭黑，在各种介质中的分散性优异，色素沉着和遮光性能优异。通过在上述接枝聚合物的接枝链中进一步掺入烯键式不饱和双键和/或羰基而生产的接枝聚合物还具有光敏性，碱显影性，绝缘特性等，因此可用作黑色光固化树脂适用于形成滤色器的黑矩阵的组合物。

2. 发明申请

WO0234822A3 METHOD FOR PRODUCTION OF POROUS CROSS-LINKED POLYMER SHEET 审中-公开
标题翻译：多孔交联聚合物片的制备方法
公开(公告)号：WO0234822A3
公开(公告)日：2002-09-19
申请号：PCT/JP0109297
申请日：2001-10-23
申请人： NIPPON CATALYTIC CHEM IND , PROCTER & GAMBLE , SASABE MASAZUMI , SAKAMOTO KATSUHIKO , NOGI KOZO , ARAKAWA MOTOHIRO
发明人： SASABE MASAZUMI , SAKAMOTO KATSUHIKO , NOGI KOZO , ARAKAWA MOTOHIRO
IPC分类号： C08F2/32 , C08J9/36 , F26B13/10 , F26B13/24 , B29C44/56 , F26B13/26
CPC分类号： C08J9/36 , C08J2201/028 , F26B13/101 , F26B13/24
摘要： AbstractA method for dehydrating a porous cross-linked polymer conveniently to a low final water content is provided. A porous cross-linked polymer sheet is produced by a method which comprises causing a porous cross-linked polymer obtained by forming and polymerizing a water-in-oil type higher internal phase emulsion to be dehydrated by the use of non-woven fabric rolls furnished with an aspiration mechanism. Properly in this case, the porous cross-linked polymer is subjected to preliminary squeezing. In accordance with the present invention, a porous cross-linked polymer abounding in a water absorbing property to be dehydrated to a low final water content with a small number of rolls.
摘要翻译：摘要提供了一种将多孔交联聚合物方便地脱水至最终含水量低的方法。多孔交联聚合物片材是通过以下方法制造的：一种方法，该方法包括使通过使用提供的无纺织物辊形成和聚合油包水型高级内相乳液而脱水得到的多孔交联聚合物有吸引力的机制。在这种情况下适当地对多孔交联聚合物进行预挤压。根据本发明，多孔交联聚合物在吸水性方面具有很少的卷筒脱水至最终含水量低的特点。

3. 发明申请

WO2005115637A1 FORMING METHOD, UNIT AND MATERIAL FOR PATTERN FILMS, AND PRODUCT GAINED BY SAID METHOD 审中-公开
标题翻译：形成方法，图案的材料和材料，以及通过方法获得的产品
公开(公告)号：WO2005115637A1
公开(公告)日：2005-12-08
申请号：PCT/JP2005/010003
申请日：2005-05-25
申请人： JAPAN SCIENCE AND THCHNOLOGY AGENCY , TOKYO INSTITUTE OF TECHNOLOGY , NIPPON SHOKUBAI CO., LTD. , GUO, Don , TAKEDA, Mitsuo , ARAKAWA, Motohiro , MORI, Yumiko , YOSHIMURA, Masahiro , WATANABE, Tomoaki , GALLAGE, Polwatta, Gallage, Chammika, Ruwan , FUJIWARA, Takeshi
发明人： YOSHIMURA, Masahiro , WATANABE, Tomoaki , GALLAGE, Polwatta, Gallage, Chammika, Ruwan , FUJIWARA, Takeshi
IPC分类号： B05D1/26
CPC分类号： B41J3/407 , B41J11/002 , G02F1/13439 , H01L51/0005 , H01L51/0022 , H05K3/1208 , H05K3/125 , H05K3/1283 , H05K2203/013 , H05K2203/107 , H05K2203/1105
摘要： An object of the present invention relates to formation of pattern films and is to provide such a method, a unit, a material, and a product, wherein the method is a wet process and enables the film formation at a low temperature applicable also to a film base material, such as a resin film, and further enables, for example, direct patterning and the formation of a film having a uniform thickness, at low cost and with ease. As a means of achieving this object, a forming method for pattern films according to the present invention is a forming method for a film having a desired pattern on a surface of a base material, characterized in that a desired pattern 8 is formed on the surface of the base material 7 by supplying an ink 2 that includes a film forming material to the surface of the aforementioned base material 7 from a nozzle 1a in a state where heat has been applied to the aforementioned base material 7. And a forming unit for pattern films according to the present invention is characterized by comprising a means for supplying an ink that includes a film forming material to a surface of a base material from a nozzle and a means for heating the base material.
摘要翻译：本发明的目的涉及形成图案膜，并且是提供这种方法，单元，材料和产品，其中该方法是湿法，并且使得能够在低温下成膜也适用于膜基材，例如树脂膜，并且还能够以低成本和容易地例如直接图案化和形成具有均匀厚度的膜。作为实现该目的的手段，根据本发明的图案膜的形成方法是在基材的表面上具有期望图案的膜的形成方法，其特征在于，在表面上形成期望的图案8 通过在对上述基材7进行加热的状态下从喷嘴1a向上述基材7的表面供给包含成膜材料的油墨2而形成基材7。根据本发明的膜的特征在于包括用于从喷嘴向基材的表面供给包含成膜材料的油墨的装置和用于加热基材的装置。

4. 发明申请

WO1996008525A1 PROCESS FOR PRODUCING PHOTOSENSITIVE RESIN AND LIQUID PHOTOSENSITIVE RESIN COMPOSITION 审中-公开
标题翻译：生产感光树脂和液体感光树脂组合物的方法
公开(公告)号：WO1996008525A1
公开(公告)日：1996-03-21
申请号：PCT/JP1995001828
申请日：1995-09-13
申请人： NIPPON SHOKUBAI CO., LTD. , AWAJI, Toshio , OHTSUKI, Nobuaki , ARAKAWA, Motohiro
发明人： NIPPON SHOKUBAI CO., LTD.
IPC分类号： C08G59/14
CPC分类号： G03F7/0388 , C08G59/1494 , C08G59/4292 , C08L63/00 , C08L63/10 , G03F7/033 , G03F7/038 , H05K3/0076 , H05K3/3452 , H05K3/4676 , C08L2666/04
摘要： A process for producing a photosensitive resin by the reaction of the carboxyl groups of a resin (A) having at least two (meth)acryloyl groups and at least one carboxyl group in its molecule with a difunctional epoxy resin (B) having two epoxy groups in its molecule. As the obtained resin comprises linear high-molecular-weight resin (A) blocks formed via the resin (B) block, it is excellent in tackfreeness and can be formed into a resist film. This film can be developed, after being irradiated with light, with an aqueous alkali solution rapidly and accurately. Therefore it has become possible to provide a high-performance liquid photosensitive resin composition useful for forming a solder resist for producing printed wiring boards, an electroless plating resist, a black matrix for liquid-crystal display panels, and a color filter. A liquid photosensitive resin composition containing minute particles of a polymer having a Tg of 20 DEG C or below gives a coating film which, after being photocured, is excellent in tight adhesion even when subjected to thermal history.
摘要翻译：通过其分子中具有至少两个（甲基）丙烯酰基和至少一个羧基的树脂（A）的羧基与具有两个环氧基的双官能环氧树脂（B）反应来生产感光性树脂的方法在其分子中。所获得的树脂包含通过树脂（B）嵌段形成的直链状高分子量树脂（A）嵌段，其粘合性优异，可以形成抗蚀剂膜。在用光照射后，可以快速，准确地将碱性水溶液开发出来。因此，可以提供用于形成用于制造印刷线路板的阻焊剂，用于液晶显示面板的化学镀抗蚀剂，黑色矩阵和滤色器的高性能液体光敏树脂组合物。含有Tg为20℃以下的聚合物的微小颗粒的液体感光性树脂组合物产生涂膜，光固化后，即使经历了热历史，密封性也优异。

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