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1. 发明专利

AU2003221359A1 PLASMA PROCESSING DEVICE AND PLASMA GENERATING METHOD 未知
公开(公告)号：AU2003221359A1
公开(公告)日：2003-09-22
申请号：AU2003221359
申请日：2003-03-12
申请人： TOKYO ELECTRON LTD , YASAKA YASUYOSHI , TAKAHASHI MASAHARU , ANDO MAKOTO
发明人： YASAKA YASUYOSHI , TAKAHASHI MASAHARU , ANDO MAKOTO , ISHII NOBUO
IPC分类号： H05H1/46 , H01J37/32 , H01L21/3065
摘要： The length (L) of a slot ( 26 ) increases monotonously from the central portion (A) of an antenna surface ( 28 ) in the radial direction, and reaches the maximal value at the first intermediate portion (C). The maximal value is maintained from the first intermediate portion (C) until the peripheral portion (B). When compared to a case wherein the length of the slot is increased monotonously from the central portion of the antenna surface ( 28 ) until its peripheral portion, the power radiated from a slot antenna can increase. Accordingly, the power which is not radiated from the slot antenna but remains in it decreases, so that the reflected power from the slot antenna decreases.

2. 发明公开

EP1361782A1 PLASMA DEVICE AND PLASMA GENERATING METHOD 审中-公开
标题翻译： PLASMAEINRICHTUNG UND PLASMEERZEUGUNGSVERFAHREN
公开(公告)号：EP1361782A1
公开(公告)日：2003-11-12
申请号：EP02715809.6
申请日：2002-01-18
申请人： TOKYO ELECTRON LIMITED , Ando, Makoto , Takahashi, Masaharu
发明人： ANDO, Makoto , TAKAHASHI, Masaharu , ISHII, Nobuo
IPC分类号： H05H1/46 , H01L21/3065 , H01L21/205 , C23C16/505
CPC分类号： H01J37/32192 , H01J37/3244
摘要： A plasma device includes a slot antenna (30) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel (11). The feeding part has a cavity (35) for forming a resonator and converting the fed high frequency electromagnetic field (F) into a rotating electromagnetic field and supplying the rotating electromagnetic field to the slot antenna (30).
摘要翻译：等离子体装置包括用于将通过馈送部分供应的高频电磁场（F）提供到处理容器（11）中的缝隙天线（30）。馈电部分具有用于形成谐振器的空腔（35），并将馈送的高频电磁场（F）转换成旋转的电磁场，并将旋转的电磁场提供给缝隙天线（30）。

3. 发明公开

EP1096554A1 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译： Einrichtung zur Plasmabehandlung
公开(公告)号：EP1096554A1
公开(公告)日：2001-05-02
申请号：EP99923919.7
申请日：1999-06-04
申请人： TOKYO ELECTRON LIMITED , Goto, Naohisa , Ando, Makoto
发明人： GOTO, Naohisa , ANDO, Makoto , ISHII, Nobuo
IPC分类号： H01L21/3065
CPC分类号： H01J37/3222 , H01J37/32192
摘要： In a plasma processing system, microwaves generated by a microwave generator (86) are guided to a plane antenna (62) to introduce the microwaves, which are attenuated exponentially, into a processing vessel (22) in which an object to be processed (W) is subjected to a plasma process. A microwave absorbing means (96) is disposed in a peripheral portion of the plane antenna (62) to absorb the microwaves propagating from a central portion of the plane antenna and to control the amount of reflected microwave. Thus the amount of the microwaves reflected toward the central portion of the plane antenna (62) by a peripheral portion of the plane antenna (62) is reduced to some extent so that electromagnetic field intensity is distributed uniformly.
摘要翻译：在等离子体处理系统中，由微波发生器（86）产生的微波被引导到平面天线（62），以将被指数地衰减的微波引入处理容器（22）中，在该处理容器（22）中，待加工物体（W ）进行等离子体处理。微波吸收装置（96）设置在平面天线（62）的周边部分中，以吸收从平面天线的中心部分传播的微波并控制反射微波的量。因此，通过平面天线（62）的周边部分朝向平面天线（62）的中心部分反射的微波的量减少到一定程度，使得电磁场强度均匀分布。

4. 发明公开

EP1361782A4 PLASMA DEVICE AND PLASMA GENERATING METHOD 审中-公开
标题翻译：等离子体装置及PLASMEERZEUGUNGSVERFAHREN
公开(公告)号：EP1361782A4
公开(公告)日：2006-03-29
申请号：EP02715809
申请日：2002-01-18
申请人： TOKYO ELECTRON LTD , ANDO MAKOTO , TAKAHASHI MASAHARU
发明人： ANDO MAKOTO , TAKAHASHI MASAHARU , ISHII NOBUO
IPC分类号： H01J37/32 , H05H1/46 , H01L21/205 , H01L21/302 , H01L21/3065
CPC分类号： H01J37/32192 , H01J37/3244
摘要： A plasma device, comprising a slot antenna (30) for feeding a high frequency electromagnetic field (F) fed through a feeding part into a processing container (11), the feeding part further comprising a cavity (35) forming an oscillator and converting the fed high frequency electromagnetic field (F) to a rotating electromagnetic field and feeding the rotating electromagnetic field to the slot antenna (30).

5. 发明公开

EP1276356A1 APPARATUS FOR PLASMA PROCESSING 有权
标题翻译：设备用于等离子体处理
公开(公告)号：EP1276356A1
公开(公告)日：2003-01-15
申请号：EP01901433.1
申请日：2001-01-18
申请人： TOKYO ELECTRON LIMITED , Ando, Makoto , Nihon Koshuha Co., Ltd. , Yasaka, Yasuyoshi
发明人： YASAKA, Yasuyoshi , ISHII, Nobuo, c/o Tokyo Electron Ltd. , SHINOHARA, Kibatsu, Nihon Koshuha Co., Ltd.
IPC分类号： H05H1/46 , H01L21/3065 , C23C16/50 , C23F4/00
摘要： A plasma processing apparatus is provided. The plasma processing apparatus can generate a uniform plasma in a processing container to perform a uniform processing on even a large-diameter wafer. The apparatus includes a processing container 4 shaped to be a cylinder with a bottom and accommodating a mounting table 10 for mounting a wafer W thereon, a silica plate 8 for covering an upper opening of the processing container 4 in an airtight manner, a microwave supplier 50 for supplying a microwave in TE11 mode and a cylindrical waveguide 52 having one end connected to the microwave supplier 50 to extend toward the silica plate 8 and also having an interior waveguide space. The apparatus further includes a radial waveguide box 54 connected to the other end of the cylindrical waveguide 52. The radial waveguide box 54 is shaped to extend from the other end of the cylindrical waveguide 52 radially outward in the form of a flange and successively extend toward a lid body downward as a sidewall to define an interior waveguide space. The apparatus further includes a disc-shaped slot antenna 60 arranged along the silica plate 8 to cover an opening at the lower end of the radial waveguide box 54 and have a plurality of slots 101, a circularly polarized wave converter 56 disposed in the cylindrical waveguide 52 between the microwave supplier 50 and the radial waveguide box 54 to rotate the TE11-mode microwave provided from the supplier 50 about an axis of the cylindrical waveguide 52 and send the rotating microwave to the radial waveguide box 54.

6. 发明授权

EP1276356B1 APPARATUS FOR PLASMA PROCESSING 有权
标题翻译：设备用于等离子体处理
公开(公告)号：EP1276356B1
公开(公告)日：2007-08-15
申请号：EP01901433.1
申请日：2001-01-18
申请人： TOKYO ELECTRON LIMITED , Ando, Makoto , Yasaka, Yasuyoshi
发明人： YASAKA, Yasuyoshi , ISHII, Nobuo, c/o Tokyo Electron Ltd. , SHINOHARA, Kibatsu, Nihon Koshuha Co., Ltd.
IPC分类号： H05H1/46 , H01L21/3065 , C23C16/50 , C23F4/00
摘要： A plasma device for uniform processing of large-size wafers. The device comprises a processing container (4) that is a bottomed cylinder with an upper opening covered with a quartz plate (8), the cylinder including a processing stage (10) for holding a wafer (W); a microwave device (50) for supplying TE11-mode microwave; a cylindrical waveguide (52) including a waveguide space, connected with the microwave device (50) on one end, and extending toward the quartz plate (8); a radial waveguide box (54) including a waveguide space, connected with the other end of the waveguide (52), spreading radially outward in the shape of a flange, and falling toward the quartz board (8) to serve as a side wall; and a disk-like slot antenna (60) arranged along the quartz board (8) to cover a lower opening of the waveguide box (54). A circular polarization converter (56) can be provided to rotate microwave on the axis of the cylindrical waveguide (52) and send it to the waveguide box (54).

7. 发明公开

EP1276356A4 APPARATUS FOR PLASMA PROCESSING 有权
标题翻译： VORRICHTUNG ZUR PLASMAVERARBEITUNG
公开(公告)号：EP1276356A4
公开(公告)日：2006-01-04
申请号：EP01901433
申请日：2001-01-18
申请人： TOKYO ELECTRON LTD , ANDO MAKOTO , YASAKA YASUYOSHI
发明人： YASAKA YASUYOSHI , ISHII NOBUO , SHINOHARA KIBATSU
IPC分类号： H01J37/32 , H05H1/46 , C23C16/50 , C23F4/00 , H01L21/3065
摘要： A plasma device for uniform processing of large-size wafers. The device comprises a processing container (4) that is a bottomed cylinder with an upper opening covered with a quartz plate (8), the cylinder including a processing stage (10) for holding a wafer (W); a microwave device (50) for supplying TE11-mode microwave; a cylindrical waveguide (52) including a waveguide space, connected with the microwave device (50) on one end, and extending toward the quartz plate (8); a radial waveguide box (54) including a waveguide space, connected with the other end of the waveguide (52), spreading radially outward in the shape of a flange, and falling toward the quartz board (8) to serve as a side wall; and a disk-like slot antenna (60) arranged along the quartz board (8) to cover a lower opening of the waveguide box (54). A circular polarization converter (56) can be provided to rotate microwave on the axis of the cylindrical waveguide (52) and send it to the waveguide box (54).
摘要翻译：一种等离子体处理装置，其产生均匀的等离子体，从而允许大直径晶片的均匀处理。圆筒形装置包括晶片安装台，提供密封的石英板，用于以TE11模式传播微波的微波供应器，以及一端连接到微波供应器的圆柱形波导。径向波导盒连接在圆柱形波导的另一端和石英板之间。径向波导盒从圆柱形波导径向向外延伸，形成凸缘并限定内部波导空间。盘状槽天线位于放射状波导箱的下端，位于石英板上方。设置在圆筒形波导管中的圆偏振波转换器围绕圆柱形波导的轴线旋转TE11模式微波，并将旋转的微波发送到径向波导盒。

8. 发明公开

EP1096554A4 PLASMA PROCESSING APPARATUS 审中-公开
标题翻译： EINRICHTUNG ZUR PLASMA-BEHANDLUNG
公开(公告)号：EP1096554A4
公开(公告)日：2004-09-29
申请号：EP99923919
申请日：1999-06-04
申请人： TOKYO ELECTRON LTD , GOTO NAOHISA , ANDO MAKOTO
发明人： GOTO NAOHISA , ANDO MAKOTO , ISHII NOBUO
IPC分类号： H05H1/46 , C23C16/00 , C23C16/511 , H01J37/32 , H01L21/00 , H01L21/203 , H01L21/3065 , H05H1/00
CPC分类号： H01J37/3222 , H01J37/32192
摘要： In the plasma processor, the microwaves generated from a microwave generator (86) are led to a plane antenna (62), which in turn introduces exponentially attenuating microwaves into a container (22) that processes an object (W) in plasma. Microwave absorption means (96) provided in the circumference of the plane antenna (62) absorbs microwaves propagating from the center of the plane antenna (62) and suppresses the reflection. As a result, the microwaves reflected in the circumference of the plane antenna (62) and returned to the center are decreased to some degree, and the electromagnetic field distribution of the microwave becomes uniform.
摘要翻译：在等离子体处理系统中，由微波发生器（86）产生的微波被引导到平面天线（62），以将被指数地衰减的微波引入处理容器（22）中，在该处理容器（22）中，待加工物体（W ）进行等离子体处理。微波吸收装置（96）设置在平面天线（62）的周边部分中，以吸收从平面天线的中心部分传播的微波并控制反射微波的量。因此，通过平面天线（62）的周边部分朝向平面天线（62）的中心部分反射的微波的量减少到一定程度，使得电磁场强度均匀分布。

9. 发明申请

WO2010126163A1 HETEROARYLTHIOMETHYL PYRIDINE DERIVATIVE 审中-公开
标题翻译：异丁基二甲基吡啶衍生物
公开(公告)号：WO2010126163A1
公开(公告)日：2010-11-04
申请号：PCT/JP2010/057847
申请日：2010-04-27
申请人： BANYU PHARMACEUTICAL CO.,LTD. , KAMEDA, Minoru , KOBAYASHI, Kensuke , NAKAMA, Chisato , ANDO, Makoto , SATO, Nagaaki
发明人： KAMEDA, Minoru , KOBAYASHI, Kensuke , NAKAMA, Chisato , ANDO, Makoto , SATO, Nagaaki
IPC分类号： C07D401/14 , A61K31/444 , A61K31/4545 , A61K31/541 , A61P3/04 , A61P3/10 , A61P5/00 , A61P9/00 , A61P9/10 , A61P9/12 , A61P13/12 , A61P25/02 , A61P25/08 , A61P25/22 , A61P25/24 , A61P25/28 , A61P43/00 , C07D413/14 , C07D417/14 , C07D451/04
CPC分类号： C07D401/14 , C07D413/14 , C07D417/14 , C07D451/04
摘要： The present invention relates to a compound represented by a formula (I): wherein X is a group represented by or the like; Y is a group represented by or the like; and Ar 1 is a group represented by or a pharmaceutically acceptable salt thereof.
摘要翻译：本发明涉及由式（I）表示的化合物：其中X是由等表示的基团; Y是由等表示的基团; 和Ar 1是由其表示的基团或其药学上可接受的盐。

10. 发明申请

WO2007018248A9 PYRIDONE COMPOUND 审中-公开
标题翻译：吡咯烷酮化合物
公开(公告)号：WO2007018248A9
公开(公告)日：2008-02-14
申请号：PCT/JP2006315775
申请日：2006-08-03
申请人： BANYU PHARMA CO LTD , ANDO MAKOTO , SEKINO ETSUKO , HAGA YUJI , OTAKE NORIKAZU , MORIYA MINORU
发明人： ANDO MAKOTO , SEKINO ETSUKO , HAGA YUJI , OTAKE NORIKAZU , MORIYA MINORU
IPC分类号： C07D213/64 , A61K31/407 , A61K31/4412 , A61K31/4418 , A61K31/4439 , A61K31/444 , A61K31/55 , A61P1/16 , A61P3/04 , A61P3/06 , A61P3/10 , A61P5/00 , A61P7/08 , A61P9/10 , A61P9/12 , A61P11/00 , A61P13/12 , A61P15/00 , A61P17/00 , A61P19/06 , A61P25/08 , A61P25/18 , A61P25/20 , A61P25/22 , A61P25/24 , A61P25/28 , A61P25/32 , A61P25/36 , A61P27/16 , A61P35/00 , A61P43/00 , C07D213/69 , C07D239/46 , C07D401/06 , C07D401/10 , C07D401/12 , C07D401/14 , C07D487/04
CPC分类号： C07D213/69 , C07D213/64 , C07D213/89 , C07D239/52 , C07D401/10 , C07D401/14 , C07D405/10 , C07D487/08
摘要： An active ingredient is a compound represented by the general formula [I]: [I] [wherein R 1 and R 2 represent a lower alkyl group, a C 3-8 cycloalkyl group or the like, X 1 and X 2 represent methine, an Ar-Y 1 -Y 2 -Y 3 -substituted methine or the like, however, either of them is an Ar-Y 1 -Y 2 -Y 3 -substituted methine, X 3 to X 8 represent methine, -N- or the like, Y 1 and Y 3 represent a single bond, -O- or the like, Y 2 represents a single bond, a lower alkylene group or the like, W represents -(O)-(CH 2 ) n -(O)- or the like, n represents an integer of 1 to 4, L and Z 2 represent a single bond or a methylene group, Z 1 represents a single bond, a C 1-4 alkylene group or the like, and Ar represents an aromatic carbocyclic group or the like]. The compound acts as a melanin-concentrating hormone receptor antagonist and is useful as a therapeutic agent for obesity or the like.
摘要翻译：活性成分是由通式[I]表示的化合物：[I] [其中R 1和R 2表示低级烷基，C 1〜 3-8环烷基等，X 1和X 2表示次甲基，Ar-Y 1 -Y 1，然而，它们中的任一个是Ar-Y 1 -Y 2 - 取代的次甲基等， N 3 -X 3 - 取代的次甲基，X 3至X 8表示次甲基，-N-等，Y 1 Y 3和Y 3表示单键，-O-等，Y 2表示单键，低级亚烷基等，W表示 - （O） - （CH 2）n - - （O） - 等，n表示1〜4的整数，L和Z 2 < / SUB>表示单键或亚甲基，Z 1表示单键，C 1-4 - 亚烷基等，Ar表示芳族碳环组等]。该化合物作为黑色素浓缩激素受体拮抗剂起作为肥胖症等的治疗剂的作用。

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