会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明专利
    • METHOD OF CLEANING LONG LENGTH BODY
    • JPH07303869A
    • 1995-11-21
    • JP30668094
    • 1994-12-09
    • AIR LIQUIDE AMERICAN
    • MARUKU JII ROBEERU
    • B08B7/04B08B7/00B08B11/00
    • PURPOSE: To clean elongated objects having contaminated surfaces while averting environmental pollution by exposing the elongated objects having the contaminated surfaces to a gaseous, liquid and/or solid inert gas to embrittle the contaminants, then drawing out the elongated objects through an orifice and removing the embrittled surface contaminants. CONSTITUTION: The elongated objects 11 the surfaces of which are contaminated by the contaminants including organic or inorganic substances containing oxides, filth, lubricants, lime, carbon-containing and graphite substances are exposed to the gaseous, liquid and/or solid inert gas of the amount suitable for embrittling the contaminants in a chamber 10. The elongated objects 11 are thereafter drawn out through the orifice 17 of a die 16 to remove the embrittled surface contaminants from the elongated objects 11. The inert gas is selected from the group consisting of liquid nitrogen, liquid argon and solid carbon dioxide. After the contaminants are removed, the elongated objects 11 are subjected to annealing in an inert atmosphere. This orifice 17 has a cross section substantially the same as the cross section of the elongated objects 11.
    • 8. 发明专利
    • SEPARATION AND PURIFICATION OF PERFLUORO COMPOUND AND SYSTEM
    • JPH11171807A
    • 1999-06-29
    • JP688298
    • 1998-01-16
    • AIR LIQUIDE AMERICANAIR LIQUID PROCESS CONSTR
    • HA BAOARCURI TIMOTHY
    • C07C17/38C07C17/383C07C19/08F25J3/02
    • PROBLEM TO BE SOLVED: To provide a new method for separating and purifying a mixture of perfluoro compounds(PFC's) to satisfy the requirement of a semiconductor manufacturing industry and overcome incompleteness of a related technique, especially a method for treating a discharged flow from a semiconductor-processing tool. SOLUTION: This method for separating and purifying a mixture of PFC's comprises (a) a step for introducing a perfluoro compound-containing gas flow into a first distillation column, (b) a step for taking out the light product from the first distillation column and taking out the heavy product from the first distillation column, (c) a step for introducing the light product from the first distillation column to a second distillation column, (d) a step for taking out the light product from the second distillation column and taking out the heavy product from the second distillation column, (e) a step for introducing the light product of the second distillation column to a third distillation column and (f) a step for taking out the light product from the third distillation column and taking out the heavy product from the third distillation column. The method is effectively used for treatment of a waste gas from a semiconductor processing tool, and the PCF is cyclically used without discharging the PCF to the environment.
    • 10. 发明专利
    • PURIFIER FOR COMPOUNDS IN LIQUID PHASE STATE
    • JPH10323501A
    • 1998-12-08
    • JP1873698
    • 1998-01-30
    • AIR LIQUIDEAIR LIQUIDE AMERICAN
    • BORZIO JOHNJACKSIER TRACEY
    • B01D3/00F25J3/08
    • PROBLEM TO BE SOLVED: To effectively remove metal impurities from corrosive liquefied gas by transferring the liquefied gas in a gas phase state when the corrosive liquefied gas is filled from a feed vessel to a receiver. SOLUTION: A feed vessel 102 is arranged in a heating tank 106 and is in an equilibrium state prior to start. A receiver 104 is cooled and is also in an equilibrium sate. The feed vessel 102 and the receiver 104 are connected each other through a gas line 116. A gas line 124 is connected to a gaseous nitrogen supply source 130. A gas line 134 is connected to an evacuating device 140 and a scrubber 146. A valve 138 is opened and a device 100 is purged in vacuum several times to completely remove air inside it. Then, the valve 138 is closed, a valve 144 is opened and a part of gas is sent to the scrubber 146 to regulate the condition inside the device 100. After that, the valve 144 is closed and corrosive gas is vaporized in the feed vessel 102 and is sent to the gas line 116. The corrosive gas enters the receiver 104 and is cooled and recondensed in the receiver 104.