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    • 4. 发明申请
    • PLASMA CYCLING STERILIZING PROCESS
    • 等离子体循环灭菌过程
    • WO1992004057A1
    • 1992-03-19
    • PCT/US1991005678
    • 1991-08-09
    • ABTOX, INC.
    • ABTOX, INC.MOULTEN, Kern, A.CAMPBELL, Bryant, A.CAPUTO, Ross, A.
    • A61L02/00
    • H05H1/46A61L2/14Y10S422/906
    • A method for plasma sterilization within a controlled temperature range comprising exposing an article in a sterilizing chamber (4) to a gas plasma flowing from a plasma generating chamber (2) until the temperature in the sterilizing chamber (4) rises to a preselected maximum temperature. The flow of the plasma gas to the sterilizing chamber (4) is terminated until the temperature in the sterilizing chamber (4) falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3 DEG C below the preselected maximum temperature. The gas plasma can be generated from a mixture of gases consisting essentially of argon, helium, nitrogen or mixtures thereof. Preferably the pressure in the sterilizing chamber (4) rises to from 0.1 to 10 torr when the gas plasma is flowing into the chamber (4) and the pressure in the sterilizing chamber (4) falls to a lower pressure when the gas plasma flow into the sterilizing chamber (4) is terminated.
    • 一种用于在受控温度范围内等离子体灭菌的方法,包括将消毒室(4)中的物品暴露于从等离子体发生室(2)流出的气体等离子体直到灭菌室(4)中的温度升高至预选的最高温度 。 终止等离子体气体到灭菌室(4)的流动,直到灭菌室(4)中的温度降到低于预选的最高温度的温度。 重复这些步骤直到制品的灭菌。 当再次启动气体等离子体流时,低于预选最高温度的温度优选不超过预选最高温度3℃。 气体等离子体可以由基本上由氩,氦,氮或其混合物组成的气体的混合物产生。 当气体等离子体流入室(4)中时,当气体等离子体流入时,灭菌室(4)中的压力优选上升到0.1〜10乇 灭菌室(4)终止。
    • 6. 发明专利
    • PLASMA CYCLING STERILIZING PROCESS
    • CA2088995C
    • 2002-02-19
    • CA2088995
    • 1991-08-09
    • ABTOX INC
    • MOULTON KERN ACAMPBELL BRYANT ACAPUTO ROSS A
    • A61L2/14H05H1/46
    • A method for plasma sterilization within a controlled temperature range comprising exposing an article in a sterilizing chamber (4) to a gas plasma flowing from a plasma generating chamber (2) unt il the temperature in the sterilizing chamber (4) rises to a preselected maximum temperature. The flow of the plasma gas to th e sterilizing chamber (4) is terminated until the tem- perature in the sterilizing chamber (4) falls to a temperature below the preselected maximum temperature. These steps are repeat- ed until sterilization of the article is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree.C below the preselected maximum temperature. The gas plasma can be generated from a mixture of gases consisting essentially of argon, helium, nitrogen or mixtures thereof. Preferably the pressure in the steri- lizing chamber (4) rises to from 0.1 to 10 torr when the gas plasma is flowi ng into the chamber (4) and the pressure in the steriliz- ing chamber (4) falls to a lower pressure whan the gas plasma flow into the sterilizing chamber (4) is terminated.
    • 10. 发明申请
    • PLASMA GAS MIXTURE FOR STERILIZER AND METHOD
    • 用于灭菌器和方法的等离子体气体混合物
    • WO1995026121A1
    • 1995-09-28
    • PCT/US1995003603
    • 1995-03-21
    • ABTOX, INC.
    • ABTOX, INC.CAMPBELL, Bryant, A. +diMOULTON, Kern, A.FISHER, Jim
    • H05H01/24
    • A61L2/14H05H1/46
    • A method for plasma sterilization comprises exposing an article to be sterilized to a neutral active species of a plasma generated from a premixed gas mixture comprising oxygen, hydrogen, and a noble gas. The exposure of the article to the plasma is carried out at reduced pressures and a chamber temperature of less than 63 DEG C for a time period sufficient to effect sterilization. The apparatus for plasma sterilization of articles comprises a plasma generator (10, 12, 14), a sterilizing chamber (60), and a source of pressurized gas mixture in fluid communication with the plasma generator. The source of pressurized gas mixture has a noble gas and a substantially nonflammable mixture of hydrogen and oxygen, which is preferably between about 2.0 to 2.4 (v/v) percent hydrogen and between 2.6 to 3.0 (v/v) percent oxygen.
    • 用于等离子体灭菌的方法包括将待灭菌的物品暴露于由包含氧气,氢气和惰性气体的预混合气体混合物产生的等离子体活性物质。 将物品暴露于等离子体在减压和小于63℃的室温下进行足够时间以进行灭菌。 用于物品等离子体灭菌的装置包括等离子体发生器(10,12,14),灭菌室(60)以及与等离子体发生器流体连通的加压气体混合物源。 加压气体混合物的来源具有惰性气体和基本上不可燃的氢气和氧气的混合物,其优选在约2.0至2.4(v / v)%的氢气和2.6至3.0(v / v)%的氧气之间。