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1. 发明申请

WO1997027515A1 RESIST COMPOSITION 审中-公开
标题翻译：耐腐蚀组合物
公开(公告)号：WO1997027515A1
公开(公告)日：1997-07-31
申请号：PCT/JP1997000175
申请日：1997-01-27
申请人： NIPPON ZEON CO., LTD. , ABE, Nobunori , TAKAHASHI, Nobukazu
发明人： NIPPON ZEON CO., LTD.
IPC分类号： G03F07/039
CPC分类号： G03F7/039 , G03F7/0045
摘要： A resist composition having improved sensitivity, resolution, and heat resistance and comprising (a) a polymer comprising structural units having a group instable against acids and (b) a radiation-sensitive compound capable of generating acids upon irradiation with an actinic radiation, wherein the polymer (a) is one prepared by polymerizing 10 to 100 % by weight of a (meth)acrylic ester (i) containing an allyl group having at least two substituents as an alcohol residue with 0 to 90 % by weight of a monomer (ii) copolymerizable with the (meth)acrylic ester, and a method for pattern formation using the resist composition.
摘要翻译：一种具有改进的灵敏度，分辨率和耐热性的抗蚀剂组合物，其包含（a）包含具有不可酸性基团的结构单元的聚合物和（b）能够在用光化辐射照射时产生酸的辐射敏感性化合物，其中聚合物（a）是通过使10〜100重量％的含有至少两个具有至少两个取代基的烯丙基作为醇残基的（甲基）丙烯酸酯（i）与0〜90重量％的单体（ii）聚合而制备的）可与（甲基）丙烯酸酯共聚，以及使用该抗蚀剂组合物的图案形成方法。

2. 发明申请

WO1996012216A1 RESIST COMPOSITION 审中-公开
标题翻译：耐腐蚀组合物
公开(公告)号：WO1996012216A1
公开(公告)日：1996-04-25
申请号：PCT/JP1995002114
申请日：1995-10-13
申请人： NIPPON ZEON CO., LTD. , ABE, Nobunori , MATSUNO, Shugo , TANAKA, Hideyuki , SUGIMOTO, Tatsuya , WADA, Yasumasa
发明人： NIPPON ZEON CO., LTD.
IPC分类号： G03F07/039
CPC分类号： G03F7/039 , G03F7/0045
摘要： A resist composition containing a polymer (a) having acid-cleavable groups and a compound (b) capable of yielding an acid when irradiated with active rays of light, wherein the polymer (a) has groups containing an allyloxy group having at least two substituents as the acid-cleavable group; and another resist composition containing a resin binder (A), a compound (B) capable of yielding an acid when irradiated with active rays of light, and a compound (C) having an acid-cleavable group, wherein the compound (C) has a group containing an allyloxy group having at least one substituent as the acid-cleavable group. These compositions are excellent in sensitivity, resolution, heat resistance, and pattern formation.
摘要翻译：含有具有酸可分解基团的聚合物（a）和当用活性光线照射时能够产生酸的化合物（b））的抗蚀剂组合物，其中聚合物（a）具有含有至少两个取代基的烯丙氧基的基团作为酸可裂解基团; 和含有树脂粘合剂（A）的抗蚀剂组合物，当用活性光线照射时能够产生酸的化合物（B）和具有酸可分解基团的化合物（C），其中化合物（C）具有含有至少一个取代基的烯丙氧基作为酸可裂解基团的基团。这些组合物的灵敏度，分辨率，耐热性和图案形成优异。

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