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1. 发明授权

US09481608B2 Surface annealing of components for substrate processing chambers 有权
标题翻译：用于基板处理室的部件的表面退火
公开(公告)号：US09481608B2
公开(公告)日：2016-11-01
申请号：US14088216
申请日：2013-11-22
申请人： Applied Materials, Inc.
发明人： Ashish Bhatnagar , Laxman Murugesh , Padma Gopalakrishnan
IPC分类号： C04B41/00 , B23K26/00 , H01L21/67 , H01L21/683 , C03B25/02
CPC分类号： C04B41/0036 , B23K26/352 , C03B25/02 , H01L21/67115 , H01L21/6831 , Y10T428/131
摘要： A method of fabricating a processing chamber component comprises forming a processing chamber component having a structural body with surface regions having microcracks, and directing a laser beam onto the microcracks of the surface regions of the structural body for a sufficient time to heal and close off the microcracks by themselves.
摘要翻译：一种制造处理室部件的方法包括形成具有结构体的处理室部件，该结构体具有具有微裂纹的表面区域，并且将激光束引导到结构体的表面区域的微裂纹上足够的时间来愈合和闭合微裂纹自己

2. 发明授权

US08790499B2 Process kit components for titanium sputtering chamber 有权
标题翻译：钛溅射室的工艺套件组件
公开(公告)号：US08790499B2
公开(公告)日：2014-07-29
申请号：US11558928
申请日：2006-11-12
申请人： Donny Young , Alan Alexander Ritchie , Ilyoung (Richard) Hong , Kathleen A. Scheible
发明人： Donny Young , Alan Alexander Ritchie , Ilyoung (Richard) Hong , Kathleen A. Scheible
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , H01J37/32477 , H01J37/34 , H01J37/3408 , H01J37/3423 , H01J37/3426 , H01J37/3435 , H01J37/3497
摘要： A process kit for a sputtering chamber comprises a deposition ring, cover ring, and a shield assembly, for placement about a substrate support in a sputtering chamber. The deposition ring comprising an annular band with an inner lip extending transversely, a raised ridge substantially parallel to the substrate support, an inner open channel, and a ledge radially outward of the raised ridge. A cover ring at least partially covers the deposition ring, the cover ring comprising an annular plate comprising a footing which rests on a surface about the substrate support, and downwardly extending first and second cylindrical walls.
摘要翻译：用于溅射室的处理套件包括沉积环，盖环和屏蔽组件，用于放置在溅射室中的衬底支撑件周围。沉积环包括具有横向延伸的内唇缘的环形带，基本上平行于基底支撑件的凸脊，内开口通道和径向向外突出的凸缘。盖环至少部分地覆盖沉积环，盖环包括环形板，环形板包括搁置在基板支撑件周围的表面上的基脚以及向下延伸的第一和第二圆柱形壁。

3. 发明授权

US08501568B2 Method of forming flash memory with ultraviolet treatment 失效
标题翻译：用紫外线处理形成闪存的方法
公开(公告)号：US08501568B2
公开(公告)日：2013-08-06
申请号：US12256173
申请日：2008-10-22
申请人： Mihaela Balseanu , Vladimir Zubkov , Li-Qun Xia , Atif Noori , Reza Arghavani , Derek R. Witty , Amir Al-Bayati
发明人： Mihaela Balseanu , Vladimir Zubkov , Li-Qun Xia , Atif Noori , Reza Arghavani , Derek R. Witty , Amir Al-Bayati
IPC分类号： H01L21/326 , H01L21/8238 , H01L21/3205 , H01L21/4763 , H01L21/00 , H01L29/792
CPC分类号： H01L21/3185 , H01L21/28282 , H01L21/3105 , H01L21/3115 , H01L21/31155 , H01L29/42332 , H01L29/7881 , H01L29/792
摘要： A methods of forming a flash memory device are provided. The flash memory device comprises a silicon dioxide layer on a substrate and a silicon nitride layer that is formed on the silicon dioxide layer. The properties of the silicon nitride layer can be modified by any of: exposing the silicon nitride layer to ultraviolet radiation, exposing the silicon nitride layer to an electron beam, and by plasma treating the silicon nitride layer. A dielectric material is deposited on the silicon nitride layer and a conductive date is formed over the dielectric material. The flash memory device with modified silicon nitride layer provides an increase in charge holding capacity and charge retention time of the unit cell of a non-volatile memory device.
摘要翻译：提供了形成闪速存储器件的方法。闪存器件包括在衬底上的二氧化硅层和形成在二氧化硅层上的氮化硅层。氮化硅层的性质可以通过以下任何方式改变：将氮化硅层暴露于紫外线辐射，将氮化硅层暴露于电子束，以及通过等离子体处理氮化硅层。介电材料沉积在氮化硅层上，并且在电介质材料上形成导电日期。具有改进的氮化硅层的闪速存储器件提供了非易失性存储器件的单元电池的电荷保持容量和电荷保持时间的增加。

4. 发明授权

US08446032B2 Hydroelectric power generator and related methods 有权
标题翻译：水力发电机及相关方法
公开(公告)号：US08446032B2
公开(公告)日：2013-05-21
申请号：US12554874
申请日：2009-09-04
申请人： Phillip Lynn Chauvin
发明人： Phillip Lynn Chauvin
IPC分类号： F03B13/00 , H02P9/04
CPC分类号： F03B17/063 , F05B2240/932 , Y02E10/28
摘要： A hydroelectric power generator is capable of generating electrical power from a moving body of water. The power generator comprises a shell comprising a wall having interior and exterior surfaces, and an interior volume. A fixed gear is fixedly attached to the interior surface of the shell. A stationary shaft extends across the interior volume of the shell. A set of fins is attached to the exterior surface of the shell, and the fins are capable of rotating the shell about the stationary shaft from the force of the moving body of water. An electrical generator is mounted on the stationary shaft. The generator comprises a drive gear that engages the fixed gear to drive the electrical generator. An electrical connector transmits the generated electrical power to the external environment.
摘要翻译：水力发电机能够从水的移动体产生电力。发电机包括壳体，壳体包括具有内表面和外表面的壁以及内部体积。固定齿轮固定地附接到壳体的内表面。固定轴延伸穿过壳体的内部空间。一组翅片附接到外壳的外表面，并且翅片能够使壳体围绕静止轴线从运动的水体的力旋转。发电机安装在固定轴上。发电机包括与固定齿轮接合以驱动发电机的驱动齿轮。电连接器将产生的电力传送到外部环境。

5. 发明授权

US08414357B2 Chemical mechanical polisher having movable slurry dispensers and method 失效
标题翻译：具有可移动浆液分配器的化学机械抛光机和方法
公开(公告)号：US08414357B2
公开(公告)日：2013-04-09
申请号：US12196860
申请日：2008-08-22
申请人： Yulin Wang , Alpay Yilmaz
发明人： Yulin Wang , Alpay Yilmaz
IPC分类号： B24B7/22
CPC分类号： B24B57/02 , B24B37/04 , B24B37/042
摘要： A chemical mechanical polisher comprises a polishing platen capable of supporting a polishing pad, and first and second substrate carriers that are each capable of holding a substrate against the polishing pad. First and second slurry dispensers, each comprise (i) an arm comprising a pivoting end and a distal end, (ii) at least one slurry dispensing nozzle on the distal end, and (iii) a dispenser drive capable of rotating the arm about the pivoting end to swing the slurry dispensing nozzle at the distal end to dispense slurry across the polishing platen.
摘要翻译：化学机械抛光机包括能够支撑抛光垫的研磨台板，以及能够将基板保持在抛光垫上的第一和第二基板载体。第一和第二浆液分配器，每个包括（i）包括枢转端和远端的臂，（ii）在远端上的至少一个浆料分配喷嘴，以及（iii）能够围绕枢转端以使浆料分配喷嘴在远端摆动，以将浆料分配到抛光台板上。

6. 发明授权

US08343881B2 Silicon dioxide layer deposited with BDEAS 有权
标题翻译：沉积有BDEAS的二氧化硅层
公开(公告)号：US08343881B2
公开(公告)日：2013-01-01
申请号：US12794713
申请日：2010-06-04
申请人： Yong-Won Lee , Vladimir Zubkov , Mei-Yee Shek , Li-Qun Xia , Prahallad Iyengar , Sanjeev Baluja , Scott A Hendrickson , Juan Carlos Rocha-Alvarez , Thomas Nowak , Derek R Witty
发明人： Yong-Won Lee , Vladimir Zubkov , Mei-Yee Shek , Li-Qun Xia , Prahallad Iyengar , Sanjeev Baluja , Scott A Hendrickson , Juan Carlos Rocha-Alvarez , Thomas Nowak , Derek R Witty
IPC分类号： H01L29/06 , H01L21/31 , C23C16/448
CPC分类号： H01L21/02271 , C23C16/402 , H01L21/02164 , H01L21/0332 , H01L21/76898
摘要： A silicon dioxide layer is deposited onto a substrate using a process gas comprising BDEAS and an oxygen-containing gas such as ozone. The silicon dioxide layer can be part of an etch-resistant stack that includes a resist layer. In another version, the silicon dioxide layer is deposited into through holes to form an oxide liner for through-silicon vias.
摘要翻译：使用包含BDEAS和含氧气体如臭氧的工艺气体将二氧化硅层沉积到衬底上。二氧化硅层可以是包括抗蚀剂层的抗蚀刻堆叠的一部分。在另一个版本中，二氧化硅层被沉积到通孔中以形成用于通硅通孔的氧化物衬垫。

7. 发明授权

US08279577B2 Substrate support having fluid channel 有权
标题翻译：具有流体通道的基板支撑
公开(公告)号：US08279577B2
公开(公告)日：2012-10-02
申请号：US12849012
申请日：2010-08-02
申请人： Andrew Nguyen , Wing Lau Cheng , Hiroji Hanawa , Semyon Kats , Kartik Ramaswamy , Yan Ye , Kwok Manus Wong , Daniel J. Hoffman , Tetsuya Ishikawa , Brian C. Lue
发明人： Andrew Nguyen , Wing Lau Cheng , Hiroji Hanawa , Semyon Kats , Kartik Ramaswamy , Yan Ye , Kwok Manus Wong , Daniel J. Hoffman , Tetsuya Ishikawa , Brian C. Lue
IPC分类号： H01T23/00
CPC分类号： C23C14/564 , C23C16/4404 , H01J37/16 , H01J37/32504 , H01J37/32862 , H01J37/32871 , H01J2237/022 , H01L21/6875 , H01L21/68757 , Y10T428/24 , Y10T428/31678
摘要： A support for a substrate processing chamber comprises a chuck having a substrate receiving surface, and a base comprising an upper wall comprising a recessed trench having (i) an attachment face at a first depth, and (ii) a fluid channel at a second depth. A lower wall is seated in the recessed trench and attached to the attachment face of the upper wall, to close the fluid channel. A fluid inlet is provided to supply a heat transfer fluid to the fluid channel and a fluid outlet provided to discharge the heat transfer fluid from the fluid channel.
摘要翻译：用于衬底处理室的支撑件包括具有衬底接收表面的卡盘，以及包括上壁的基座，该上壁包括凹槽，所述凹槽具有（i）第一深度处的附接面，以及（ii）第二深度处的流体通道。下壁位于凹槽中并附着到上壁的附接面，以封闭流体通道。提供流体入口以将传热流体供应到流体通道和设置用于从流体通道排出传热流体的流体出口。

8. 发明授权

US08203791B2 Image capturing unit and lens assembly 失效
标题翻译：图像拍摄单元和镜头组件
公开(公告)号：US08203791B2
公开(公告)日：2012-06-19
申请号：US12899501
申请日：2010-10-06
申请人： Jean-Pierre Lusinchi , Xiao-Yun Kui
发明人： Jean-Pierre Lusinchi , Xiao-Yun Kui
IPC分类号： G02B27/10 , G02B7/02
CPC分类号： H04N5/2254 , G02B13/001 , H04N5/2257
摘要： A lens module array comprising a spacer plate comprising (i) first and second surfaces, and (ii) an array of lens barrels, each lens barrel comprising (1) a lens opening extending inward from the first surface of the spacer plate, and (2) a sensor cavity extending inward from the second surface of the spacer plate to meet the lens opening; and (b) at least one lens positioned over each lens opening of a lens barrel, the outer circumference of the lens being attached to the spacer plate.
摘要翻译： 1.一种透镜模块阵列，包括间隔板，其包括（i）第一和第二表面，以及（ii）透镜筒阵列，每个透镜镜筒包括（1）从所述间隔板的第一表面向内延伸的透镜开口和 2）从间隔板的第二表面向内延伸以与透镜开口相接的传感器腔; 和（b）位于透镜镜筒的每个透镜开口上方的至少一个透镜，透镜的外周附接到间隔板。

9. 发明授权

US08187416B2 Interior antenna for substrate processing chamber 有权
标题翻译：用于衬底处理室的内部天线
公开(公告)号：US08187416B2
公开(公告)日：2012-05-29
申请号：US11134033
申请日：2005-05-20
申请人： Keith A. Miller , Genhua Xu , Shengde Zhong , Mahendra Bhagwat Lokhande
发明人： Keith A. Miller , Genhua Xu , Shengde Zhong , Mahendra Bhagwat Lokhande
IPC分类号： C23C16/00 , H01L21/306
CPC分类号： H01J37/3408 , B08B7/0035 , H01J37/321 , H01J37/32495
摘要： An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.
摘要翻译：用于将RF能量耦合到具有壁的处理室中的等离子体的天线包括具有暴露于腔室中的等离子体的面的线圈。多个支座以距离处理室的壁一定距离的方式支撑线圈，至少一个支架包括端子，通过从外部电源向线圈施加电力的端子。端子包括具有第一长度L1的导体插座和围绕导体插座的护套，护套具有第二长度L2。长度L1大于长度L2。围绕具有端子的支座设置导体杯。

10. 发明授权

US08168223B1 Engineered particles and methods of use 有权
标题翻译：工程粒子和使用方法
公开(公告)号：US08168223B1
公开(公告)日：2012-05-01
申请号：US09886296
申请日：2001-06-21
申请人： Thomas E. Tarara , Jeffry G. Weers , Alexey Kabalnov , Ernest G. Schutt , Luis A. Dellamary
发明人： Thomas E. Tarara , Jeffry G. Weers , Alexey Kabalnov , Ernest G. Schutt , Luis A. Dellamary
IPC分类号： A61K9/14 , A61K9/127
CPC分类号： A61K9/008 , A61K9/0073 , A61K9/0075 , A61K9/0078 , A61K9/1611 , A61K9/1617 , A61K9/1635 , A61K9/1641 , A61K9/1652 , A61K9/1694 , A61K31/685 , Y02A50/41 , Y02A50/466 , Y02A50/472 , Y10S514/937 , Y10S977/904 , Y10S977/906 , Y10S977/926
摘要： Engineered particles are provided may be used for the delivery of a bioactive agent to the respiratory tract of a patient. The particles may be used in the form of dry powders or in the form of stabilized dispersions comprising a nonaqueous continuous phase. In particularly preferred embodiments the particles may be used in conjunction with an inhalation device such as a dry powder inhaler, metered dose inhaler or a nebulizer.
摘要翻译：提供的工程颗粒可用于将生物活性剂递送到患者的呼吸道。颗粒可以以干粉形式或以包含非水连续相的稳定分散体的形式使用。在特别优选的实施方案中，颗粒可以与吸入装置如干粉吸入器，计量剂量吸入器或喷雾器结合使用。

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