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1. 发明申请

WO2008019362A2 METHODS AND SYSTEMS FOR CONTROLLING CRITICAL DIMENSIONS IN TRACK LITHOGRAPHY TOOLS 审中-公开
标题翻译：用于控制轨迹切削工具中关键尺寸的方法和系统
公开(公告)号：WO2008019362A2
公开(公告)日：2008-02-14
申请号：PCT/US2007/075344
申请日：2007-08-07
申请人： SOKUDO CO., LTD. , MICHAELSON, Tim , BEKIARIS, Nikolaos
发明人： MICHAELSON, Tim , BEKIARIS, Nikolaos
IPC分类号： B05C11/00 , H01L21/66
CPC分类号： H01L22/20 , H01L22/12
摘要： A method of controlling wafer critical dimension (CD) uniformity on a track lithography tool includes obtaining a CD map for a wafer. The CD map includes a plurality of CD data points correlated with a multi-zone heater geometry map. The multi-zone heater includes a plurality of heater zones. The method also includes determining a CD value for a first heater zone of the plurality of heater zones based on one or more of the CD data points and computing a difference between the determined CD value for the first heater zone and a target CD value for the first heater zone. The method further includes determining a temperature variation for the first heater zone based, in part, on the computed difference and a temperature sensitivity of a photoresist deposited on the wafer and modifying a temperature of the first heater zone based, in part, on the temperature variation.
摘要翻译：控制轨道光刻工具上的晶片临界尺寸（CD）均匀性的方法包括获得晶片的CD图。 CD映射包括与多区加热器几何图相关的多个CD数据点。多区加热器包括多个加热区。该方法还包括基于CD数据点中的一个或多个来确定多个加热器区域中的第一加热器区域的CD值，并且计算所确定的第一加热器区域的CD值与用于第一加热器区域的目标CD值之间的差值第一加热区。该方法还包括：部分地基于计算出的差异和沉积在晶片上的光致抗蚀剂的温度敏感度来确定第一加热器区域的温度变化，并且部分地基于温度改变第一加热器区域的温度变异。

2. 发明申请

WO2007127871A2 SYSTEMS AND METHODS FOR MONITORING AND CONTROLLING DISPENSE USING A DIGITAL OPTICAL SENSOR 审中-公开
标题翻译：使用数字光传感器监控和控制配置的系统和方法
公开(公告)号：WO2007127871A2
公开(公告)日：2007-11-08
申请号：PCT/US2007067549
申请日：2007-04-26
申请人： SOKUDO CO LTD , LIN Y SEAN
发明人： LIN Y SEAN
IPC分类号： B05C11/00 , B05C5/00
CPC分类号： H01L21/6715 , H01L21/67253
摘要： A device for detection of a semiconductor process liquid is provided. The device includes a light source adapted to generate a light beam and a digital optical sensor to detect the light beam. A nozzle is adapted to support the semiconductor process liquid and transmit the light beam. The nozzle and the source are arranged to refract the beam in a first direction while the beam passes through a gas disposed in the nozzle. The nozzle and source are arranged to refract the beam in a second direction while the beam passes through the liquid.
摘要翻译：提供了一种用于检测半导体工艺液体的装置。该装置包括适于产生光束的光源和用于检测光束的数字光学传感器。喷嘴适于支撑半导体工艺液体并透射光束。喷嘴和源被布置成当光束通过设置在喷嘴中的气体时沿第一方向折射光束。喷嘴和源被设置成在光束通过液体时沿第二方向折射光束。

3. 发明申请

WO2007127866A2 AN INTEGRATED THERMAL UNIT HAVING VERTICALLY ARRANGED BAKE AND CHILL PLATES 审中-公开
标题翻译：具有垂直安排的烘烤和冷冻板的集成热单元
公开(公告)号：WO2007127866A2
公开(公告)日：2007-11-08
申请号：PCT/US2007067544
申请日：2007-04-26
申请人： SOKUDO CO LTD , SALINAS MARTIN JEFF , NATARAJAN RAMANAN , VOLFOVSKI LEON
发明人： SALINAS MARTIN JEFF , NATARAJAN RAMANAN , VOLFOVSKI LEON
IPC分类号： G03B27/52 , H01L21/00
CPC分类号： H01L21/67098 , H01L21/67178 , H01L21/67207
摘要： An integrated thermal unit comprising a housing; a bake station positioned within the housing, the bake station comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill station positioned within the housing, the chill station comprising a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate receiving station positioned within the housing, the substrate receiving station configured to hold a substrate; wherein the bake station, chill station and substrate receiving station are arranged in a vertical stack within the housing. In some embodiments the integrated thermal unit further comprises a substrate transfer shuttle positioned within the housing and adapted to transfer substrates between the substrate receiving station, bake station and chill stations.
摘要翻译：一种集成热单元，包括壳体; 位于所述壳体内的烘烤站，所述烘焙站包括被配置为加热支撑在所述烤盘表面上的基底的烘烤板; 位于所述壳体内的冷却站，所述冷却站包括构造成冷却支撑在所述冷却板的表面上的基板的冷却板; 以及位于所述壳体内的基板接收台，所述基板接收台被配置为保持基板; 其中烘烤站，冷却站和衬底接收站被布置在壳体内的垂直堆叠中。在一些实施例中，集成热单元还包括位于壳体内并适于在衬底接收站，烘烤站和冷却站之间传送衬底的衬底传送梭。

4. 发明申请

WO2007127872A3 METHOD AND SYSTEM TO MEASURE FLOW VELOCITY AND VOLUME 审中-公开
标题翻译：测量流动速度和体积的方法和系统
公开(公告)号：WO2007127872A3
公开(公告)日：2008-09-04
申请号：PCT/US2007067550
申请日：2007-04-26
申请人： SOKUDO CO LTD , HERCHEN HARALD , PORRAS ERICA , ISHIKAWA TETSUYA
发明人： HERCHEN HARALD , PORRAS ERICA , ISHIKAWA TETSUYA
IPC分类号： H01L21/00 , H01L21/302
CPC分类号： G01F1/7086 , B05B12/082 , H01L21/6715 , H01L21/67225
摘要： Systems, devices and methods of measuring a flow of a liquid stream for a semiconductor process are provided. The liquid stream is delivered through a liquid delivery nozzle. The nozzle is adapted to deliver the liquid stream for the semiconductor process. The free stream extends from an upstream location near the nozzle to a downstream location. The stream is marked at the upstream location and measured at the downstream location to determine the flow.
摘要翻译：提供了测量用于半导体工艺的液体流的流量的系统，装置和方法。液体流通过液体输送喷嘴输送。喷嘴适于输送用于半导体工艺的液体流。自由流从喷嘴附近的上游位置延伸到下游位置。流在上游位置标记并在下游位置测量以确定流量。

5. 发明申请

WO2008088950A1 METHOD AND SYSTEM FOR DETECTION OF WAFER CENTERING IN A TRACK LITHOGRAPHY TOOL 审中-公开
标题翻译：用于检测轨迹扫描工具中的波浪中心的方法和系统
公开(公告)号：WO2008088950A1
公开(公告)日：2008-07-24
申请号：PCT/US2008/050284
申请日：2008-01-04
申请人： SOKUDO CO., LTD. , HERCHEN, Harald , PANG, Lily , PORRAS, Erica
发明人： HERCHEN, Harald , PANG, Lily , PORRAS, Erica
IPC分类号： H01L21/00
CPC分类号： G01D5/342
摘要： A system for measuring substrate concentricity includes a substrate support member adapted to rotate a substrate around a substantially vertical axis. The substrate includes a mounting surface and a process surface. The system also includes a spin cup positioned below the substrate and a translatable arm mounted a predetermined distance above the process surface of the substrate. The translatable arm is adapted to translate along a radius of the substrate. The system further includes an optical emitter mounted on the translatable arm and an optical detector mounted on the translatable arm.
摘要翻译：用于测量衬底同心度的系统包括适于围绕基本垂直轴线旋转衬底的衬底支撑构件。衬底包括安装表面和工艺表面。该系统还包括位于基底下方的旋转杯，以及安装在衬底的工艺表面上方预定距离的可平移臂。可平移臂适于沿着基底的半径平移。该系统还包括安装在可平移臂上的光发射器和安装在可平移臂上的光学探测器。

6. 发明申请

WO2008005871A2 ZONE CONTROL HEATER PLATE FOR TRACK LITHOGRAPHY SYSTEMS 审中-公开
标题翻译：用于轨道光刻系统的区域控制加热板
公开(公告)号：WO2008005871A2
公开(公告)日：2008-01-10
申请号：PCT/US2007072543
申请日：2007-06-29
申请人： SOKUDO CO LTD , SALINAS MARTIN JEFF , QUACH DAVID H
发明人： SALINAS MARTIN JEFF , QUACH DAVID H
IPC分类号： H05B3/68
CPC分类号： H05B3/143 , H01L21/67103 , H01L21/67248
摘要： A substrate heater comprising a bake plate having an upper surface, a lower surface and a peripheral side surface extending between the upper and lower surfaces, the bake plate including at least one heating element, at least one temperature sensor and a plurality of wires including at least one wire coupled to the heating element and at least one wire coupled to the temperature sensor; a shield spaced apart from and generally surrounding the lower and peripheral side surfaces of the bake plate, the shield having an interior upper surface facing the lower surface of the bake plate, an interior side surface facing the peripheral side surface of the bake plate and a lower surface opposite the interior upper surface; a patterned signal layer formed on the lower surface of the shield, wherein the plurality of wires are electrically coupled to a corresponding plurality of signal traces formed in the patterned signal layer; and a connector, electrically coupled to the plurality of signal traces in the patterned signal layer, adapted to facilitate electrical connections to the plurality of wires.
摘要翻译：一种基板加热器，包括具有上表面，下表面和在上表面和下表面之间延伸的周边表面的烘烤板，所述烘烤板包括至少一个加热元件，至少一个温度传感器和多个包括在耦合到所述加热元件的至少一个线和耦合到所述温度传感器的至少一个线; 与烘烤板的下部和外周侧表面间隔开并且通常围绕烘烤板的下部和外周侧表面的护罩，所述护罩具有面向烘烤板的下表面的内部上表面，面向烘烤板的周边侧表面的内侧表面和下表面与内部上表面相对; 形成在所述屏蔽的下表面上的图案化信号层，其中所述多个导线电耦合到形成在所述图案化信号层中的对应的多个信号迹线; 以及电连接到所述图案化信号层中的所述多个信号迹线的连接器，适于促进与所述多根电线的电连接。

7. 发明申请

WO2008019362A3 CONTROLLING CRITICAL DIMENSIONS IN TRACK LITHOGRAPHY TOOLS 审中-公开
标题翻译：控制跟踪算术工具中的关键尺寸
公开(公告)号：WO2008019362A3
公开(公告)日：2008-10-16
申请号：PCT/US2007075344
申请日：2007-08-07
申请人： SOKUDO CO LTD , MICHAELSON TIM , BEKIARIS NIKOLAOS
发明人： MICHAELSON TIM , BEKIARIS NIKOLAOS
IPC分类号： H01L21/00 , G01R31/26 , G06F19/00 , H01L21/66 , H05B3/68
CPC分类号： H01L22/20 , H01L22/12
摘要： A method of controlling wafer critical dimension (CD) uniformity on a track lithography tool includes obtaining a CD map for a wafer (432) The CD map includes a plurality of CD data points correlated with a multi-zone heater geometry map (434) The multi-zone heater includes a plurality of heater zones The method also includes determining a CD value for a first heater zone of the plurality of heater zones based on one or more of the CD data points and computing a difference between the determined CD value for the first heater zone and a target CD value for the first heater zone (438) The method further includes determining a temperature variation for the first heater zone based, in part, on the computed difference and a temperature sensitivity of a photoresist deposited on the wafer an modifying a temperature of the first heater zone based, in part, on the temperature variation (440)
摘要翻译：控制轨道光刻工具上的晶片临界尺寸（CD）均匀性的方法包括获得晶片的CD映射（432）.CD图包括与多区加热器几何图相关的多个CD数据点。多区加热器包括多个加热器区域。该方法还包括基于一个或多个CD数据点确定多个加热器区域中的第一加热器区域的CD值，并计算所确定的CD值第一加热器区域和用于第一加热器区域（438）的目标CD值。该方法还包括部分地基于计算出的差异和沉积在晶片上的光致抗蚀剂的温度敏感度来确定第一加热器区域的温度变化部分地基于温度变化（440）改变第一加热器区域的温度，

8. 发明申请

WO2007127871A3 SYSTEMS AND METHODS FOR MONITORING AND CONTROLLING DISPENSE USING A DIGITAL OPTICAL SENSOR 审中-公开
公开(公告)号：WO2007127871A3
公开(公告)日：2007-11-08
申请号：PCT/US2007/067549
申请日：2007-04-26
申请人： SOKUDO CO., LTD. , LIN, Y. Sean
发明人： LIN, Y. Sean
IPC分类号： B05C11/10
摘要： A device for detection of a semiconductor process liquid is provided. The device includes a light source adapted to generate a light beam and a digital optical sensor to detect the light beam. A nozzle is adapted to support the semiconductor process liquid and transmit the light beam. The nozzle and the source are arranged to refract the beam in a first direction while the beam passes through a gas disposed in the nozzle. The nozzle and source are arranged to refract the beam in a second direction while the beam passes through the liquid.

9. 发明申请

WO2007127866A3 AN INTEGRATED THERMAL UNIT HAVING VERTICALLY ARRANGED BAKE AND CHILL PLATES 审中-公开
公开(公告)号：WO2007127866A3
公开(公告)日：2007-11-08
申请号：PCT/US2007/067544
申请日：2007-04-26
申请人： SOKUDO CO., LTD. , SALINAS, Martin, Jeff , NATARAJAN, Ramanan , VOLFOVSKI, Leon
发明人： SALINAS, Martin, Jeff , NATARAJAN, Ramanan , VOLFOVSKI, Leon
IPC分类号： H01L21/00
摘要： An integrated thermal unit comprising a housing; a bake station positioned within the housing, the bake station comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill station positioned within the housing, the chill station comprising a chill plate configured to cool a substrate supported on a surface of the chill plate; and a substrate receiving station positioned within the housing, the substrate receiving station configured to hold a substrate; wherein the bake station, chill station and substrate receiving station are arranged in a vertical stack within the housing. In some embodiments the integrated thermal unit further comprises a substrate transfer shuttle positioned within the housing and adapted to transfer substrates between the substrate receiving station, bake station and chill stations.

10. 发明申请

WO2010068597A1 MULTI-CHANNEL DEVELOPER SYSTEM 审中-公开
标题翻译：多通道开发系统
公开(公告)号：WO2010068597A1
公开(公告)日：2010-06-17
申请号：PCT/US2009/067038
申请日：2009-12-07
申请人： SOKUDO CO., LTD. , BRITCHER, Eric B. , RABINOVICH, Yevgeniy , SHERMAN, Svetlana , OTANI, Masami
发明人： BRITCHER, Eric B. , RABINOVICH, Yevgeniy , SHERMAN, Svetlana , OTANI, Masami
IPC分类号： H01L21/66 , B05C11/00
CPC分类号： H01L21/6719 , G03F7/162 , H01L21/67051 , H01L21/68771 , Y10T29/41
摘要： An apparatus for dispensing fluid during semiconductor substrate processing operations comprises an enclosure having a first side and a second side. The enclosure comprises a first processing station and a second processing station. The second processing station is positioned adjacent to the first processing station. In addition, the substrate processing apparatus includes a first dispense arm configured to deliver a fluid to the first processing station wherein the first dispense arm is positioned between the first side and the first processing station and a second dispense arm configured to deliver the fluid to the second processing station wherein the second dispense arm is positioned between the second side and the second processing station. The substrate processing apparatus also comprises a first rinse arm configured to deliver a rinsing fluid to the first processing station and a second rinse arm configured to deliver the rinsing fluid to the second processing station.
摘要翻译：在半导体衬底处理操作期间用于分配流体的设备包括具有第一侧和第二侧的外壳。外壳包括第一处理站和第二处理站。第二处理站位于第一处理站附近。此外，基板处理装置包括：第一分配臂，被配置为将流体输送到第一处理站，其中第一分配臂位于第一侧和第一处理站之间，第二分配臂被配置为将流体输送到第二处理站，其中第二分配臂位于第二侧和第二处理站之间。衬底处理设备还包括构造成将冲洗流体输送到第一处理站的第一冲洗臂和被构造成将冲洗流体输送到第二处理站的第二冲洗臂。

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