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1. 发明申请

US20040125325A1 Method of manufacturing semitransparent display device and semitransparent display device 有权
标题翻译：制造半透明显示装置和半透明显示装置的方法
公开(公告)号：US20040125325A1
公开(公告)日：2004-07-01
申请号：US10464772
申请日：2003-06-19
申请人： MITSUBISHI DENKI KABUSHIKI KAISHA; ADVANCED DISPLAY INC.
发明人： Hiroyuki Murai , Yasushi Matsui
IPC分类号： G02F001/136
CPC分类号： G02F1/133555 , G02F2201/48
摘要： A method of manufacturing a semitransparent display device includes the steps of forming a light shield film over a transparent display region on a transparent substrate, applying a photosensitive organic film over the transparent substrate coated with the light shield film, exposing and developing the photosensitive organic film to form a through hole extending through the photosensitive organic film in the transparent display region, removing the light shield film exposed through the through hole after forming the through hole, and forming a reflective film above the photosensitive organic film to form a reflective display region. Thereby, such a situation can be prevented that light reflected by a stage after passing through a TFT array substrate causes visible irregularities in thickness of an organic flattening film during exposure processing for forming the organic flattening film.
摘要翻译：一种制造半透明显示装置的方法包括以下步骤：在透明基板上的透明显示区域上形成遮光膜，将光敏有机膜涂覆在涂有遮光膜的透明基板上，曝光和显影感光有机膜在透明显示区域中形成延伸穿过感光有机膜的通孔，在形成通孔之后去除通过通孔暴露的遮光膜，并在感光有机膜上方形成反射膜以形成反射显示区域。由此，可以防止在通过TFT阵列基板的反射层之后反射的光在形成有机平坦化膜的曝光处理期间引起有机平坦化膜的厚度的可见的不规则性。

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