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    • 3. 发明专利
    • Polyimide film
    • 聚酰亚胺膜
    • JP2011208143A
    • 2011-10-20
    • JP2011076174
    • 2011-03-30
    • Kolon Industries Incコーロン インダストリーズ インク
    • JEONG YOUNG HANPARK HYO JUNJUNG HAK GEE
    • C08G73/10C08J5/18
    • C08L79/08C08G73/1039C08G73/1042
    • PROBLEM TO BE SOLVED: To provide a polyimide film having good transparency and also excellent thermal resistance so that it is useful in a transparent conductive film, TFT substrate, a flexible printing circuit substrate etc.SOLUTION: The polyimide film is obtained by casting an imidized product of a polyamic acid obtained from a polymerization of a diamine and an acid dianhydride, and has the polyimide content of not more than 70.0% based on the film weight, in which the absolute molecular weight of the polyimide is not more than 10×10g/mol as determined from following formula (1): R/K=MP(θ)-2AcMP(θ). Wherein the formula, Ris the excess Rayleigh ratio; and K=4πn(dn/dc)λN, in which nis a refractive index of a solvent; Nis Avogadro's number; and dn/dc is a specific refractive index increment, which is the value that the value of the change rate of refractive index according to the change rate of dilute solution concentration is differentiated and is measured within the range of 0.001 to 0.1 g/mL that is a section of concentration change when detecting a refractive index through injecting the polyimide film in a state of dilute solution in an organic solvent inside a flow cell of a differential refractometer; c is polymer concentration (g/mL) in the solution; M is a weight-average molecular weight (Mw) in the case of the polydisperse sample as a molar mass; Ais the second virial coefficient; and P(θ)=R/R.
    • 要解决的问题:提供具有良好的透明性和优异的耐热性的聚酰亚胺膜,使其可用于透明导电膜,TFT基板,柔性印刷电路基板等。解决方案:聚酰亚胺膜通过将酰亚胺化 由二胺和酸二酐的聚合获得的聚酰胺酸的产物,并且聚酰亚胺的绝对分子量不大于10×10g,其聚酰亚胺含量基于膜重量不超过70.0% / mol,由下式(1)确定:R / K = MP(θ)-2AcMP(θ)。 其中公式中,Ris为瑞利倍数; 和K =4πn(dn / dc)λN,其中n是溶剂的折射率; Nis Avogadro的号码 dn / dc是比折射率增量,其是根据稀溶液浓度变化率的折射率变化率的值被分化并在0.001〜0.1g / mL的范围内测定的值, 是通过在差示折光计的流动池内的有机溶剂中以稀溶液的状态注入聚酰亚胺膜来检测折射率的一部分浓度变化; c是溶液中的聚合物浓度(g / mL); M是多分散样品的摩尔质量时的重均分子量(Mw); 是第二维里系数; 和P(θ)= R / R。
    • 4. 发明专利
    • Optical sheet
    • 光学片
    • JP2013047814A
    • 2013-03-07
    • JP2012219241
    • 2012-10-01
    • Kolon Industries Incコーロン インダストリーズ インク
    • KIM TAE GYOUNGKIM KYOUNG JONG
    • G02B5/02F21V5/00F21V5/02
    • G02B5/02G02B6/0053
    • PROBLEM TO BE SOLVED: To provide an optical sheet which is not easily damaged by an external impact.SOLUTION: In an optical sheet which includes a structure layer that has a structured surface 10 and is a resin cured layer, a load is applied to the structured surface 10 by using a flat indenter 11 until the pressure becomes the maximum pressure 1 gf or 2 gf at a load application speed of 0.2031 mN/sec and is kept at the maximum pressure for 5 seconds, and then in the case where the load application is released, an elastic recovery rate expressed by the expression is 85% or more. In the expression, Drepresents a push-in depth by application of an external pressure, and Drepresents a difference between a height of an optical sheet in a state where the external pressure is not applied thereto and a height of the optical sheet after the external pressure has been removed and recovered.
    • 要解决的问题:提供不容易被外部冲击损坏的光学片。 解决方案:在包括具有结构化表面10并且是树脂固化层的结构层的光学片中,通过使用扁平压头11将负载施加到结构化表面10,直到压力变为最大压力1 gf或2gf,负载施加速度为0.2031mN / sec,并保持在最大压力5秒,然后在释放负荷的情况下,由表达式表示的弹性回复率为85%以上 。 在表达式中,D 1 表示通过施加外部压力的推入深度,并且D 2 表示 在不施加外部压力的状态下的光学片的高度以及在外部压力被去除和恢复之后的光学片的高度。 版权所有(C)2013,JPO&INPIT
    • 6. 发明专利
    • Seamless belt and method of manufacturing the same
    • 无缝带及其制造方法
    • JP2011070199A
    • 2011-04-07
    • JP2010213376
    • 2010-09-24
    • Kolon Industries Incコーロン インダストリーズ インク
    • KWAK KI NAMKIM YE SEUKIM JEONG HANKIM JI SUNG
    • G03G15/16G03G15/00G03G15/20
    • PROBLEM TO BE SOLVED: To provide a seamless belt which satisfies charging prevention function, semiconductivity, excellent resistance uniformity and heat resistance and provides an excellent image when the seamless belt is applied to a transfer belt. SOLUTION: The seamless belt includes polyimide resin or polyamide-imide resin, has a starting temperature of 5% weight reduction measured by thermo-gravimetric analysis that is present at a temperature of 300°C or higher, has a surface resistivity value of 10 7 to 10 13 Ω/square, has a surface resistance deviation of 1.0 or less that is defined as a difference between the maximum value and the minimum value obtained by replacing the surface resistance measured in optional ten places in one product with common log; and includes maximum 1 pts.wt. of carbon nanotube based on 100 pts.wt. of the resin. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种无缝带,其满足防止充电功能,半导体性,优异的电阻均匀性和耐热性,并且当将无缝带应用于转印带时提供优异的图像。 解决方案:无缝带包括聚酰亚胺树脂或聚酰胺酰亚胺树脂,其具有通过存在于300℃或更高温度的热重分析测量的5%重量减少的起始温度,具有表面电阻率值 的10 7 至10 13 Ω/正方形,其表面电阻偏差为1.0或更小,其定义为通过替换获得的最大值和最小值之间的差值 在一个产品中可选十个地方测量表面电阻,具有通用对数; 并且包括最大1重量 的碳纳米管基于100重量份 的树脂。 版权所有(C)2011,JPO&INPIT
    • 7. 发明专利
    • Film-like photodegradable transfer material
    • 电影类似的可转换转印材料
    • JP2010020321A
    • 2010-01-28
    • JP2009165069
    • 2009-07-13
    • Kolon Industries Incコーロン インダストリーズ,インコーポレイテッド
    • MOON HEE WANLEE BYEONG IL
    • G03F7/004G03F7/022G03F7/023H01L21/027
    • PROBLEM TO BE SOLVED: To provide a film-like photodegradable transfer material which, when a photolithography process is applied, prior to exposure, avoids a phenomenon that residues of a photoresist layer adhere after removal of a support film and can enhance resolution.
      SOLUTION: The film-like photodegradable transfer material includes a support film, a photodegradable photoresist layer and a protective film, wherein first adhesive power defined below is ≤0.1 kg/100×100 mm
      2 , second adhesive power is ≤0.1 kg/100×100 mm
      2 , and the second adhesive power is smaller than the first adhesive power. The first adhesive power is the one necessary for peeling the support film from the photoresist layer after the film-like transfer material is laminated on a glass substrate coated with ITO in a thickness of 2,000 Å and a width of 100×100 mm
      2 , under the conditions of a velocity of 2.0 m/min, a temperature of 110°C and a heat roll pressure of 10-90 psi. The second adhesive power is the one necessary for peeling only the protective film from the photoresist layer after the film-like transfer material is cut to a width of 100×100 mm
      2 .
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种膜状光可降解转印材料,其在施加光刻工艺时,在曝光之前避免在去除支撑膜之后光致抗蚀剂层的残留物粘附并且可以提高分辨率的现象 。 < P>解决方案:膜状光可降解转印材料包括支撑膜,可光降解光致抗蚀剂层和保护膜,其中下面限定的第一粘合力≤0.1kg/ 100×100mm 2 第二粘合力≤0.1kg/ 100×100mm 2 ,第二粘合力小于第一粘合力。 第一粘合力是将膜状转印材料层压在涂覆有ITO的玻璃基板上,厚度为2000埃,宽度为100×100毫米的情况下,将支撑膜从光致抗蚀剂层剥离的粘合力是第一粘合力。 2,在速度为2.0m / min,温度为110℃,热辊压力为10-90psi的条件下。 第二粘合力是将膜状转印材料切割成宽度为100×100mm 2 之后仅从光致抗蚀剂层剥离保护膜所需的粘合力。 版权所有(C)2010,JPO&INPIT