专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明授权

US4759789A Oxime ethers as herbicidal safeners 失效
标题翻译：肟醚作为除草安全剂
公开(公告)号：US4759789A
公开(公告)日：1988-07-26
申请号：US730512
申请日：1985-05-06
申请人： Henry Martin , Urs Fricker
发明人： Henry Martin , Urs Fricker
IPC分类号： A01N47/24 , A01N25/32 , A01N33/24 , A01N35/10 , A01N37/00 , A01N37/10 , A01N37/18 , A01N37/22 , A01N37/34 , A01N37/48 , A01N41/00 , A01N41/10 , A01N43/00 , A01N43/20 , A01N43/36 , A01N43/40 , A01N43/828 , A01N43/84 , A01N47/02 , A01N47/06 , A01N47/08 , A01N47/12 , A01N51/00 , C07C67/00 , C07C239/00 , C07C251/32 , C07C251/48 , C07C251/50 , C07C251/52 , C07C251/54 , C07C251/58 , C07C251/60 , C07C251/66 , C07C251/68 , C07C255/62 , C07C271/60 , C07C307/02 , C07C309/65 , C07C309/66 , C07C309/73 , C07C313/00 , C07C315/04 , C07C317/32 , C07C319/20 , C07C323/47 , C07C323/52 , C07C323/62 , C07C325/00 , C07C327/22 , C07C327/28 , C07C327/40 , C07C327/42 , C07C333/00 , C07C333/08 , C07D207/40 , C07D207/404 , C07D207/44 , C07D207/448 , C07D207/452 , C07D209/48 , C07D213/63 , C07D213/79 , C07D213/89 , C07D239/30 , C07D261/18 , C07D277/56 , C07D285/06 , C07D295/08 , C07D295/088 , C07D295/22 , C07D303/12 , C07D303/22 , C07D307/12 , C07D307/68 , C07D309/28 , C07D327/06 , C07D333/38 , C07C101/00 , A01N43/02
CPC分类号： C07D207/404 , A01N25/32 , C07D207/452 , C07D209/48 , C07D213/63 , C07D213/79 , C07D239/30 , C07D261/18 , C07D277/56 , C07D285/06 , C07D295/088 , C07D303/12 , C07D307/68 , C07D309/28 , C07D327/06 , C07D333/38
摘要： The invention relates to novel oxime ethers of the formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, lower alkyl, lower haloalkyl, lower alkoxy, lower haloalkoxy, lower alkylthio, lower haloalkylthio, lower alkylsulfinyl, lower alkylsulfonyl, lower haloalkylsulfinyl, lower haloalkylsulfonyl or nitro, each of R.sub.2 and R.sub.3 is hydrogen, halogen, lower alkyl, lower alkoxy or lower haloalkoxy, and Q is an unsubstituted or substituted lower alkyl, lower alkenyl, lower alkynyl or cycloalkyl group, a lower alkanoyl radical, an aliphatic, cycloaliphatic, aromatic or heterocyclic acyl radical which may be substituted or unsubstituted, a carbonyl or thiocarbonyl radical, an aryl or aralkyl radical, an acylimidomethyl radical, a phthalimidomethyl radical or a heterocyclic radical.These compounds are able to act as antidotes or safeners for protecting cultivated plants from the phytotoxic action of aggressive herbicides. Preferred crops are sorghum, cereals, maize and rice, and herbicides are chiefly chloroacetanilides and thiocarbamates.
摘要翻译：本发明涉及式Ⅰ的肟醚（Ⅰ）其中R1是氢，卤素，低级烷基，低级卤代烷基，低级烷氧基，低级卤代烷氧基，低级烷硫基，低级卤代烷硫基，低级烷基亚磺酰基，低级烷基磺酰基，低级卤代烷基亚硫酰基，低级卤代烷基磺酰基或硝基，R2和R3各自为氢，卤素，低级烷基，低级烷氧基或低级卤代烷氧基，Q为未取代或取代的低级烷基，低级烯基，低级炔基或环烷基，低级烷酰基，可以被取代或未取代的脂族，脂环族，芳族或杂环酰基，羰基或硫代羰基，芳基或芳烷基，酰亚胺基甲基，苯二甲酰亚氨基甲基或杂环基。这些化合物能够用作解毒剂或安全剂，以保护栽培植物免受侵蚀性除草剂的植物毒性作用。优选的作物是高粱，谷物，玉米和大米，除草剂主要是氯乙酰苯胺和硫代氨基甲酸盐。

82. 发明授权

US4566901A Novel oxime ethers, the preparation thereof, compositions containing them and the use thereof 失效
标题翻译：新型肟醚，其制备方法，含有它们的组合物及其用途
公开(公告)号：US4566901A
公开(公告)日：1986-01-28
申请号：US490055
申请日：1983-04-29
申请人： Henry Martin , Urs Fricker
发明人： Henry Martin , Urs Fricker
IPC分类号： A01N47/24 , A01N25/32 , A01N33/24 , A01N35/10 , A01N37/00 , A01N37/10 , A01N37/18 , A01N37/22 , A01N37/34 , A01N37/48 , A01N41/00 , A01N41/10 , A01N43/00 , A01N43/20 , A01N43/36 , A01N43/40 , A01N43/828 , A01N43/84 , A01N47/02 , A01N47/06 , A01N47/08 , A01N47/12 , A01N51/00 , C07C67/00 , C07C239/00 , C07C251/32 , C07C251/48 , C07C251/50 , C07C251/52 , C07C251/54 , C07C251/58 , C07C251/60 , C07C251/66 , C07C251/68 , C07C255/62 , C07C271/60 , C07C307/02 , C07C309/65 , C07C309/66 , C07C309/73 , C07C313/00 , C07C315/04 , C07C317/32 , C07C319/20 , C07C323/47 , C07C323/52 , C07C323/62 , C07C325/00 , C07C327/22 , C07C327/28 , C07C327/40 , C07C327/42 , C07C333/00 , C07C333/08 , C07D207/40 , C07D207/404 , C07D207/44 , C07D207/448 , C07D207/452 , C07D209/48 , C07D213/63 , C07D213/79 , C07D213/89 , C07D239/30 , C07D261/18 , C07D277/56 , C07D285/06 , C07D295/08 , C07D295/088 , C07D295/22 , C07D303/12 , C07D303/22 , C07D307/12 , C07D307/68 , C07D309/28 , C07D327/06 , C07D333/38 , C07C121/66
CPC分类号： C07D207/404 , A01N25/32 , C07D207/452 , C07D209/48 , C07D213/63 , C07D213/79 , C07D239/30 , C07D261/18 , C07D277/56 , C07D285/06 , C07D295/088 , C07D303/12 , C07D307/68 , C07D309/28 , C07D327/06 , C07D333/38
摘要： The invention relates to novel oxime ethers of the formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, lower alkyl, lower haloalkyl, lower alkoxy, lower haloalkoxy, lower alkylthio, lower haloalkylthio, lower alkylsulfinyl, lower alkylsulfonyl, lower haloalkylsulfinyl, lower haloalkylsulfonyl or nitro, each of R.sub.2 and R.sub.3 is hydrogen, halogen, lower alkyl, lower alkoxy or lower haloalkoxy, and Q is an unsubstituted or substituted lower alkyl, lower alkenyl, lower alkynyl or cycloalkyl group, a lower alkanoyl radical, an aliphatic, cycloaliphatic, aromatic or heterocyclic acyl radical which may be substituted or unsubstituted, a carbonyl or thiocarbonyl radical, an aryl or aralkyl radical, an acylimidomethyl radical, a phthalimidomethyl radical or a heterocyclic radical.These compounds are able to act as antidotes or safeners for protecting cultivated plants from the phytotoxic action of aggressive herbicides. Preferred crops are sorghum, cereals, maize and rice, and herbicides are chiefly chloroacetanilides and thiocarbamates.
摘要翻译：本发明涉及式Ⅰ的肟醚（Ⅰ），其中R1是氢，卤素，低级烷基，低级卤代烷基，低级烷氧基，低级卤代烷氧基，低级烷硫基，低级卤代烷硫基，低级烷基亚磺酰基，低级烷基磺酰基，低级卤代烷基亚硫酰基，低级卤代烷基磺酰基或硝基，R2和R3各自为氢，卤素，低级烷基，低级烷氧基或低级卤代烷氧基，Q为未取代或取代的低级烷基，低级烯基，低级炔基或环烷基，低级烷酰基，可以被取代或未取代的脂族，脂环族，芳族或杂环酰基，羰基或硫代羰基，芳基或芳烷基，酰亚胺基甲基，苯二甲酰亚氨基甲基或杂环基。这些化合物能够用作解毒剂或安全剂，以保护栽培植物免受侵蚀性除草剂的植物毒性作用。优选的作物是高粱，谷物，玉米和大米，除草剂主要是氯乙酰苯胺和硫代氨基甲酸盐。

85. 发明专利

JP2017501218A 二環式アルキル化合物、および合成审中-公开
标题翻译：双环烷基的化合物，和合成
公开(公告)号：JP2017501218A
公开(公告)日：2017-01-12
申请号：JP2016558533
申请日：2014-12-10
申请人：カリーラファーマシューティカルズ,インク. , カリーラファーマシューティカルズ,インク.
发明人：デュアンバンカー，ケビン , デュアンバンカー，ケビン
IPC分类号： C07C17/093 , C07C23/24 , C07C29/50 , C07C35/24 , C07C201/00 , C07C207/02 , C07C209/42 , C07C211/38 , C07C249/12 , C07C251/68 , C07C253/00 , C07C255/47 , C07C255/61 , C07C263/00 , C07C265/10 , C07C331/06
CPC分类号： C07C331/06 , B01J27/128 , B01J31/04 , B01J31/2217 , B01J31/28 , B01J2231/482 , B01J2531/007 , B01J2531/845 , C07C17/013 , C07C17/10 , C07C23/24 , C07C29/50 , C07C35/24 , C07C201/00 , C07C207/02 , C07C209/42 , C07C211/38 , C07C247/14 , C07C249/12 , C07C251/42 , C07C251/48 , C07C253/30 , C07C255/47 , C07C255/62 , C07C255/64 , C07C263/16 , C07C265/10 , C07C2602/38
摘要：一般式(I)の化合物、および第7族または第9族遷移金属化合物を使用する置換型ビシクロ[1.1.1]ペンタンの合成方法が、本明細書に開示される。
摘要翻译：式（I）中，和第七组或取代的二环[1.1.1]戊烷合成使用第9族过渡本文所公开的金属的化合物。

87. 发明专利

JP4874659B2 Aniline compound and a method for producing the same, as well as, the photosensitive composition 有权
公开(公告)号：JP4874659B2
公开(公告)日：2012-02-15
申请号：JP2006015547
申请日：2006-01-24
申请人：富士フイルム株式会社
发明人：貴美池田 , 明徳藤田 , 正伸高島
IPC分类号： C07C251/66 , C07C221/00 , C07C225/22 , C07C249/08 , C07C251/62 , C07C251/68 , C07C319/20 , C07C323/37 , C07D209/86 , G03F7/004 , G03F7/031

88. 发明专利

JP2010037215A Resist composition, method for forming resist pattern, new compound, and photobase generator 有权
标题翻译：耐蚀组合物，形成耐蚀图案的方法，新化合物和光致发色剂发生器
公开(公告)号：JP2010037215A
公开(公告)日：2010-02-18
申请号：JP2008198480
申请日：2008-07-31
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： UTSUMI YOSHIYUKI , MATSUZAWA KENSUKE , NAKAMURA TAKESHI , SHIMIZU HIROAKI
IPC分类号： C07C251/66 , C07C251/68 , G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition improving lithographic characteristics and forming a resist pattern of an excellent shape, a method for forming a resist pattern, a photobase generator for use in the resist composition, and a new compound useful as the photobase generator. SOLUTION: The resist composition comprising a base material component that changes its solubility to an alkali developer by the action of an acid, an acid generator component that generates an acid upon exposure to light, and a photobase generator component (F) that generates an alkali upon exposure to light, is characterized in that the photobase generator component (F) contains a photobase generator (F1) comprised of a compound represented by formula (f1) [in the formula, R and R" each represents a hydrogen atom or a 1-30C hydrocarbon group that may contain a substituent (provided that R and R" are bound to each other to form a ring in case R and R" both are 1-30C hydrocarbon groups that may contain a substituent); and R' represents an aryl group that may contain a substituent, or an alicyclic group]. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供改进光刻特性并形成具有优异形状的抗蚀剂图案的抗蚀剂组合物，形成抗蚀剂图案的方法，用于抗蚀剂组合物的光碱产生剂和用作光产生器。解决方案：抗蚀剂组合物包括通过酸的作用改变其对碱显影剂的溶解度的基材成分，以及在曝光时产生酸的酸产生剂组分和光碱产生剂组分（F），其中在光照下产生碱，其特征在于，所述光产物成分（F）含有由式（f1）表示的化合物构成的光碱产生剂（F1）[式中，R和R“各自表示氢原子或可以含有取代基的1-30℃烃基（条件是R和R“在R和R”的情况下彼此结合形成环，均为含有取代基的1-30C烃基）; R '表示可以含有取代基的芳基或脂环基]。版权所有（C）2010，JPO＆INPIT

89. 发明专利

JP2783130B2 失效
公开(公告)号：JP2783130B2
公开(公告)日：1998-08-06
申请号：JP24519793
申请日：1993-09-30
申请人： MITSUBISHI KAGAKU KK
发明人： ODA MASAJI , KATSURADA MANABU , TOMITA TAKAFUMI
IPC分类号： A01N37/50 , A01N43/10 , A01N43/30 , A01N43/40 , A01N43/78 , C07C251/48 , C07C251/50 , C07C251/52 , C07C251/54 , C07C251/58 , C07C251/68 , C07C251/88 , C07C255/32 , C07C255/54 , C07C255/62 , C07C255/66 , C07C309/65 , C07C323/19 , C07D213/30 , C07D213/61 , C07D277/20 , C07D277/22 , C07D277/24 , C07D277/32 , C07D317/54 , C07D319/18 , C07D333/16 , C07D333/28

90. 发明专利

JPH04112891A NEW OXIME DERIVATIVE AND ANTIMICROBIAL AGENT CONTAINING THE SAME DERIVATIVE 失效
公开(公告)号：JPH04112891A
公开(公告)日：1992-04-14
申请号：JP23398590
申请日：1990-09-04
申请人： AJINOMOTO KK
发明人： NAKANISHI EIJI , IKEMURA OSAMU , HATSUYA SATORU , SHIMAMURA NORIKO , OKUNISHI MASAHIKO
IPC分类号： C07D519/06 , A61K31/545 , A61K31/546 , A61P31/04 , C07C251/48 , C07C251/50 , C07C251/68 , C07D501/20 , C07D501/22 , C07D501/36 , C07D501/59 , C07D519/00
摘要： NEW MATERIAL:A compound shown by formula I (R is H or OR ; R , R and R are alkyl, acyl, etc.; R is H, alkyl, etc.; R is H, ester residue, etc.; X is H, halogen, etc.) or a salt thereof. EXAMPLE:3-[[2-(Diphenylmethoxycarbonyl)-5-methyl-[1,2,4]triazo-[1,5- a]pyrimidin-7-yl]thiomethyl]-7beta[(Z)-2-methxovimino-2-(3, 4-O- isopropylidenedioxyphenyl)acetamido]-3-cephem-4-carboxylic acid diphenyl methyl. USE:An antitumor agent. PREPARATION:First, a compound shown by formula II is reacted with a compound shown by formula III in the presence of a condensation agent such as N,N'-dichlorocarbodiimide in a solvent such as THF and acylated. Then, the formed compound shown by formula IV is reacted with a compound shown by formula R OH in the presence of a base such as pyridine in a solvent such as THF and alkylated.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式