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    • 82. 发明申请
    • Semiconductor Light Emitting Device
    • 半导体发光装置
    • US20070257268A1
    • 2007-11-08
    • US11662541
    • 2005-09-12
    • Yukio ShakudaToshio NishidaMasayuki Sonobe
    • Yukio ShakudaToshio NishidaMasayuki Sonobe
    • H01L33/00
    • H01L27/156H01L33/62H01L2224/24H01L2924/12044H01L2924/00
    • There is provided a highly reliable semiconductor light emitting device even in using for street lamps or traffic signals, which can be used in place of electric lamps or fluorescent lamps by protecting from surges such as static electricity or the like. A plurality of light emitting units (1) are formed, by forming a semiconductor lamination portion by laminating semiconductor layers on a substrate so as to form a light emitting layer, by electrically separating the semiconductor lamination portion into a plurality, and by providing a pair of electrodes (19) and (20). The light emitting units (1) are respectively connected in series and/or in parallel with wiring films (3). An inductor (8) absorbing surges is connected, in series, to the plurality of light emitting units (1) connected in series between electrode pads (4a) and (4b) connected to an external power source. For an example, the inductor (8) is formed by arranging the plurality of light emitting units (1) in a whirl shape.
    • 提供了一种高可靠性的半导体发光装置,即使用于路灯或交通信号灯,也可以通过防止诸如静电等的浪涌而代替电灯或荧光灯。 通过在基板上层叠半导体层以形成发光层,通过将半导体层叠部分电分离成多个并通过提供一对形成半导体层叠部分而形成多个发光单元(1) 的电极(19)和(20)。 发光单元(1)分别与布线膜(3)串联和/或并联连接。 吸收浪涌的电感器(8)串联连接到串联连接到连接到外部电源的电极焊盘(4a)和(4b)之间的多个发光单元(1)。 例如,电感器(8)通过将多个发光单元(1)布置成旋转形状而形成。
    • 83. 发明授权
    • Method of manufacturing a semiconductor light emitting device
    • 制造半导体发光器件的方法
    • US06168962A
    • 2001-01-02
    • US09012193
    • 1998-01-23
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • H01L21302
    • H01L33/0095
    • Disclosed is a method of manufacturing a semiconductor light emitting device. Semiconductor overlying layers are formed on a substrate in a state of a wafer so that a light emitting area is provided therein. The semiconductor overlying layers includes first and second conductivity type layers. Part of the semiconductor overlying layers including the first conductivity type layer on a surface thereof is removed so as to expose part of the second conductivity type layer. Electrodes are formed, for each chip, respectively in connection with the surface of the first conductivity type layer and the surface of the exposed second conductivity type layer. The wafer is divided into individual chips. The exposed areas of the second conductivity type semiconductor layer is provided only part of a peripheral area of the chip so that the first conductivity type semiconductor layer is directly separated during dividing the wafer into individual chips. With such a method, when dividing a wafer into chips, the inefficiency of the space (etched areas do not contribute to light emission) is eliminated in etch-removing the semiconductor overlying layers at areas to be divided, thereby improving chip yield and hence reducing cost.
    • 公开了半导体发光器件的制造方法。 在晶片的状态下在基板上形成半导体覆盖层,以便在其中提供发光区域。 半导体覆盖层包括第一和第二导电类型层。 除去包括其表面上的第一导电类型的半导体覆盖层的一部分,以暴露部分第二导电类型层。 对于每个芯片,分别与第一导电类型层的表面和暴露的第二导电类型层的表面分别形成电极。 晶片分为单个芯片。 第二导电类型半导体层的暴露区域仅提供芯片的周边区域的一部分,使得在将晶片分成单个芯片期间,第一导电类型半导体层被直接分离。 通过这样的方法,当将晶片分成芯片时,在要分割的区域上的半导体覆盖层的蚀刻去除中消除了空间(蚀刻区域对光发射没有贡献)的低效率,从而提高了芯片产量并因此降低了 成本。
    • 88. 发明授权
    • Semiconductor light emitting element and manufacturing method therefor
    • 半导体发光元件及其制造方法
    • US5814533A
    • 1998-09-29
    • US509231
    • 1995-07-31
    • Yukio Shakuda
    • Yukio Shakuda
    • H01L21/205H01L33/00H01L33/32H01L21/203C30B25/22
    • H01L33/32H01L21/0242H01L21/02433H01L21/02458H01L21/0254H01L21/0262H01L21/02658H01L33/007H01L33/325
    • A manufacturing method of semiconductor light emitting element including the steps of: (a) laminating a gallium nitride compound semiconductor layer for forming a luminous part on a substrate including at least an n-type layer and a p-type layer, by organic metal compound vapor phase growth method, (b) forming the gallium nitride compound semiconductor layer in a nitrogen gas atmosphere after laminating, and lowering the ambient temperature to the temperature for growing a GaAs compound in vapor phase and annealing the p-type layer of the gallium nitride compound semiconductor, (c) forming a film of at least one type selected from the group consisting of GaAs, GaP, InAs, InP, all doped with Mg, and part of these group III elements replaces by Al. on the surface of the gallium nitride compound semiconductor layer, as a protective layer in the nitrogen atmosphere, and (d) annealing the p-type layer of gallium nitride compound semiconductor layer simultaneously with forming the protective film, and lowering to room temperature after annealing, and removing the protective film by etching.
    • 一种半导体发光元件的制造方法,包括以下步骤:(a)通过有机金属化合物将至少包含n型层和p型层的衬底层叠用于形成发光部的氮化镓系化合物半导体层 气相生长法,(b)层压后在氮气气氛中形成氮化镓系化合物半导体层,将环境温度降低至气相生长GaAs化合物的温度,退火氮化镓的p型层 化合物半导体,(c)形成选自GaAs,GaP,InAs,InP中的至少一种的全部掺杂的Mg,并且这些III族元素的一部分由Al代替。 在氮气氛中的氮化镓系化合物半导体层的表面作为保护层,(d)在形成保护膜的同时退火氮化镓系化合物半导体层的p型层,退火后降至室温 ,并通过蚀刻去除保护膜。