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    • 81. 发明申请
    • METHOD AND APPARATUS TO MOVE PAGE BETWEEN TIERS
    • 方法和装置移动页面之间的页面
    • US20130036250A1
    • 2013-02-07
    • US13195522
    • 2011-08-01
    • Shinichi Hayashi
    • Shinichi Hayashi
    • G06F12/08
    • G06F3/061G06F3/0647G06F3/0649G06F3/0665G06F3/0685
    • The thin provisioning storage system maintains migration history between the first and the second group which the unallocated pages of virtual volume would be allocated from, and updates on writes against storage areas of virtual volume having migration history. Before the storage controller determines to migrate data allocated in the first group to the second group, the storage controller checks the migration history and if the data stored in the first group has been previously migrated from the second group and is still maintained in the second group, the storage controller would change the allocation between the virtual volume and the first group to the second group for the data subject to migration and not perform the data migration.
    • 精简配置存储系统维护第一组和第二组之间的迁移历史记录,虚拟卷的未分配页面将被分配,以及对具有迁移历史的虚拟卷的存储区域的写入的更新。 在存储控制器确定将在第一组中分配的数据迁移到第二组之前,存储控制器检查迁移历史,并且存储在第一组中的数据是否先前已经从第二组迁移并且仍然保持在第二组中 ,存储控制器将将虚拟卷和第一组之间的分配更改为第二组以进行迁移的数据,而不执行数据迁移。
    • 83. 发明授权
    • Coating and developing apparatus, substrate processing method, and storage medium
    • 涂布显影装置,基板处理方法和存储介质
    • US08313257B2
    • 2012-11-20
    • US13103290
    • 2011-05-09
    • Nobuaki MatsuokaYasushi HayashidaShinichi Hayashi
    • Nobuaki MatsuokaYasushi HayashidaShinichi Hayashi
    • G03D5/04
    • H01L21/67745H01L21/67178
    • A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
    • 提供了一种涂覆和显影装置,即使当其包含基板检查单元时也需要较小的占用空间,同时消除不利的布局。 包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。 在载体块S1的一侧设置有处理块S2,多个垂直设置的传送单元TRS,用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间, 转印单元,用于在这些转印单元之间转印衬底。 涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。
    • 88. 发明申请
    • COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM
    • 涂料和开发设备,基板加工方法和储存介质
    • US20110211825A1
    • 2011-09-01
    • US13103290
    • 2011-05-09
    • Nobuaki MATSUOKAYasushi HayashidaShinichi Hayashi
    • Nobuaki MATSUOKAYasushi HayashidaShinichi Hayashi
    • G03D5/04
    • H01L21/67745H01L21/67178
    • A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
    • 提供了一种涂覆和显影装置,即使当其包含基板检查单元时也需要较小的占用空间,同时消除不利的布局。 包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。 在载体块S1的一侧设置有处理块S2,多个垂直设置的传送单元TRS,用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间, 转印单元,用于在这些转印单元之间转印衬底。 涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。
    • 90. 发明申请
    • COATING AND DEVELOPING APPARATUS
    • 涂料和开发设备
    • US20100300353A1
    • 2010-12-02
    • US12855534
    • 2010-08-12
    • Masami AKIMOTOShinichi HayashiYasushi HayashidaNobuaki MatsuokaYoshio KimuraIssei UedaHikaru Ito
    • Masami AKIMOTOShinichi HayashiYasushi HayashidaNobuaki MatsuokaYoshio KimuraIssei UedaHikaru Ito
    • B05C9/12
    • H01L21/67184H01L21/67173H01L21/67178H01L21/67207H01L21/67745
    • Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
    • 提供一种由多个单元块组成的涂层显影装置。 第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。 用于显影的单元块,每个包括多个处理单元,包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。 用于应用或涂布的单元块包括多个处理单元,包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置,布置在用于显影的单位块上方。 用于应用的单元块被布置在第一和第二单元块堆叠中。 根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。 暴露的晶片仅通过单元块进行开发,而不经过用于应用的单元块中的任何一个。